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Dynamic Characteristics of Neutral Beam Etching Enabled Normally-off Recessed-gate GaN MOSHEMT 期刊论文
POWER ELECTRONIC DEVICES AND COMPONENTS, 2025, 卷号: 11
作者:  Yitai zhu;  Haitao Du;  Yu Zhang;  Haolan Qu;  Haodong Jiang
Microsoft Word(2182Kb)  |  收藏  |  浏览/下载:67/1  |  提交时间:2025/03/07
Generic Cryogenic CMOS Device Modeling and EDA-Compatible Platform for Reliable Cryogenic IC Design 期刊论文
IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY, 2025, 卷号: 13, 页码: 117-127
作者:  Zhidong Tang;  Zewei Wang;  Yumeng Yuan;  Chang He;  Xin Luo
Adobe PDF(10435Kb)  |  收藏  |  浏览/下载:73/1  |  提交时间:2025/03/03
Simultaneous improvement of high-frequency and Baliga figures of merit of 1.7 kV 4H-SiC MOSFET with retrograded JFET doping 期刊论文
JOURNAL OF PHYSICS D: APPLIED PHYSICS, 2024, 卷号: 57, 期号: 25
作者:  Wang, Qian;  Hua, Hao;  Zheng, Li;  Feng, Junhong;  Zhang, Cheng
Adobe PDF(2608Kb)  |  收藏  |  浏览/下载:1629/2  |  提交时间:2024/04/12
A High-Boost Ratio Isolated Current-Fed DC/DC Converter Based on Constant Off Time Control 会议论文
2024 IEEE 10TH INTERNATIONAL POWER ELECTRONICS AND MOTION CONTROL CONFERENCE (IPEMC2024-ECCE ASIA), Chengdu, China, 17-20 May 2024
作者:  Yihan Wu;  Mingde Zhou;  Haoyu Wang
Adobe PDF(2556Kb)  |  收藏  |  浏览/下载:346/2  |  提交时间:2024/07/08
Dynamic Reliability Assessment of Vertical GaN Trench MOSFETs With Thick Bottom Dielectric 期刊论文
IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY, 2024, 卷号: PP, 期号: 99, 页码: 1-1
作者:  Yu Zhang;  Renqiang Zhu;  Haolan Qu;  Yitian Gu;  Huaxing Jiang
Adobe PDF(1470Kb)  |  收藏  |  浏览/下载:291/0  |  提交时间:2024/06/11
Compensation of Hot Carrier Degradation Enabled by Forward Back Bias in π-GAA-π MOSFET 期刊论文
IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY, 2023, 卷号: 11, 页码: 319-324
作者:  Yijun Qian;  Qiang Liu;  Jialun Yao;  Xiaowei Wang;  Amit Kumar Shukla
Adobe PDF(4964Kb)  |  收藏  |  浏览/下载:446/2  |  提交时间:2023/06/30
Novel Void Embedded Design for Total Ionizing Dose Hardening of Silicon-on-Insulator MOSFET 期刊论文
IEEE ELECTRON DEVICE LETTERS, 2022, 卷号: 43, 期号: 11, 页码: 1-1
作者:  
Adobe PDF(2468Kb)  |  收藏  |  浏览/下载:271/0  |  提交时间:2022/11/04
Silicon Phosphorus Process Uniformity Improvement Study in Advanced Node 会议论文
2022 CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE, CSTIC 2022, Shanghai, China, June 20, 2022 - June 21, 2022
作者:  Huojin Tu;  Hui Wang;  Li Peng;  Jiaqi Hong;  Wangxin Nie
Adobe PDF(3557Kb)  |  收藏  |  浏览/下载:259/0  |  提交时间:2022/09/30
Modeling of Hot Carrier Injection on Gate-Induced Drain Leakage in PDSOI nMOSFET 会议论文
2021 IEEE INTERNATIONAL CONFERENCE ON INTEGRATED CIRCUITS, TECHNOLOGIES AND APPLICATIONS, ICTA 2021, Zhuhai, China, November 24, 2021 - November 26, 2021
作者:  Qian, Yijun;  Gao, Yuan;  Shukla, Amit Kumar;  Wu, Tao;  Wei, Xing
Adobe PDF(2430Kb)  |  收藏  |  浏览/下载:392/1  |  提交时间:2022/07/01
Total ionizing dose effects on nanosheet gate-all-around MOSFETs built on void embedded silicon on insulator substrate 期刊论文
IEEE ELECTRON DEVICE LETTERS, 2021, 卷号: 42, 期号: 10, 页码: 1428-1431
作者:  Lantian Zhao;  Qiang Liu;  Chenhe Liu;  Lingli Chen;  Yumeng Yang
Adobe PDF(1065Kb)  |  收藏  |  浏览/下载:249/0  |  提交时间:2021/12/03
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