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Dynamic Characteristics of Neutral Beam Etching Enabled Normally-off Recessed-gate GaN MOSHEMT
期刊论文
POWER ELECTRONIC DEVICES AND COMPONENTS, 2025, 卷号: 11
作者:
Yitai zhu
;
Haitao Du
;
Yu Zhang
;
Haolan Qu
;
Haodong Jiang
Microsoft Word(2182Kb)
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收藏
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浏览/下载:90/1
|
提交时间:2025/03/07
Aluminum gallium nitride
Deep level transient spectroscopy
Gates (transistor)
High electron mobility transistors
Indium phosphide
Junction gate field effect transistors
MOS devices
MOSFET devices
Semiconducting aluminum compounds
Semiconducting gallium compounds
Semiconducting indium phosphide
Surface discharges
Threshold voltage
AlGaN
Dynamic performance
Dynamics characteristic
Enhancement mode
GaN metal oxide semiconductor high electron mobility transistor
Interface traps
Metal-oxide-semiconductor high-electron mobility transistors
Neutral beam etching
Normally off
Recessed gate
Effect of 5 MeV proton irradiation on electrical and trap characteristics of β-Ga
2
O
3
power diode
期刊论文
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2025, 卷号: 187
作者:
Qu, Haolan
;
Huang, Wei
;
Zhang, Yu
;
Sui, Jin
Adobe PDF(6465Kb)
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浏览/下载:327/4
|
提交时间:2024/11/29
Proton irradiation
Static characteristics
Trap characteristics
Dynamic characteristics
Dynamic Reliability Assessment of Vertical GaN Trench MOSFETs With Thick Bottom Dielectric
期刊论文
IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY, 2024, 卷号: 24, 期号: 3, 页码: 358-364
作者:
Yu Zhang
;
Renqiang Zhu
;
Haolan Qu
;
Yitian Gu
;
Huaxing Jiang
Adobe PDF(1470Kb)
|
收藏
|
浏览/下载:308/0
|
提交时间:2024/06/11
Activation energy
Deep level transient spectroscopy
Dielectric materials
Drain current
Electric fields
Gallium nitride
High electron mobility transistors
III-V semiconductors
MOSFET devices
Stability
Threshold voltage
Current collapse
Dynamic reliability assessment
Dynamics characteristic
Dynamics stability
MOS-FET
MOSFETs
Reference devices
Time resolved measurement
Trench MOSFET
Vertical trench MOSFET
ZrO2/β-Ga2O3 MOS器件的界面态和体陷阱物性研究
会议论文
第一届氧化镓技术与产业研讨会
作者:
陈嘉祥
;
屈昊岚
;
睢金
;
卢星
;
邹新波
收藏
|
浏览/下载:43/0
|
提交时间:2025/04/02
AlGaN/GaN MOS-HEMT Enabled Optoelectronic Artificial Synaptic Devices for Neuromorphic Computing
期刊论文
APL MACHINE LEARNING, 2024, 卷号: 2, 期号: 2
作者:
Chen JX(陈嘉祥)
;
Du HT(杜海涛)
;
Qu HL(屈昊岚)
;
Gao H(高涵)
;
Gu YT(顾怡恬)
Adobe PDF(8964Kb)
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浏览/下载:202/10
|
提交时间:2024/09/13
Suppressed current collapse and improved threshold voltage stability of AlGaN/GaN HEMT via O2 plasma treatment
期刊论文
MICROELECTRONICS JOURNAL, 2024, 卷号: 148
作者:
Zhu, Yitai
;
Zhang, Yu
;
Qu, Haolan
;
Gao, Han
;
Du, Haitao
Adobe PDF(4805Kb)
|
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|
浏览/下载:329/3
|
提交时间:2024/06/11
AlGaN/GaN HEMT
O 2 plasma treatment
Current collapse
Threshold voltage shift
Dynamic characteristic
Emission and capture characteristics of deep hole trap in n-GaN by optical deep level transient spectroscopy
期刊论文
JOURNAL OF SEMICONDUCTORS, 2024, 卷号: 45, 期号: 3
作者:
Jin Sui
;
Jiaxiang Chen
;
Haolan Qu
;
Yu Zhang
;
Xing Lu
Adobe PDF(4177Kb)
|
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浏览/下载:300/0
|
提交时间:2024/04/06
GaN
deep level transient spectroscopy
minority carrier trap
time constant
trap concentration
Activation energy
Deep level transient spectroscopy
Electric fields
Hole concentration
III-V semiconductors
Laser beams
Schottky barrier diodes
Semiconductor diodes
Wide band gap semiconductors
Activation energy E
Carrier traps
Deep hole trap
Deep levels transient spectroscopy
Emission process
Minority carrier
Minority carrier trap
Optical-
Time-constants
Trap concentration
Reliable electrical performance of β-Ga2O3 Schottky barrier diode at cryogenic temperatures
期刊论文
JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A: VACUUM, SURFACES AND FILMS, 2024, 卷号: 42, 期号: 2
作者:
Qu, Haolan
;
Huang, Wei
;
Zhang, Yu
;
Sui, Jin
;
Chen, Jiaxiang
Adobe PDF(3333Kb)
|
收藏
|
浏览/下载:359/4
|
提交时间:2024/02/23
Carrier concentration
Cryogenics
Gallium compounds
Semiconductor metal boundaries
Temperature distribution
Blocking performance
Cryogenic temperatures
Dynamic performance
Electrical performance
Ideality factors
Lows-temperatures
Off state
Schottky characteristics
Temperature dependence
Temperature rise
Relaxation kinetics of interface states and bulk traps in atomic layer deposited ZrO2/β-Ga2O3 metal-oxide-semiconductor capacitors
期刊论文
JOURNAL OF APPLIED PHYSICS, 2024, 卷号: 135, 期号: 8
作者:
Chen, Jiaxiang
;
Qu, Haolan
;
Sui, Jin
Adobe PDF(3256Kb)
|
收藏
|
浏览/下载:426/55
|
提交时间:2024/03/22
Atomic layer deposition
Capacitance
Electric fields
Gallium compounds
MOS capacitors
Oxide semiconductors
Transistors
Zirconia
Atomic layer deposited
Bulk traps
Comprehensive analysis
Device instabilities
Emission behavior
Forward bias
Interfaces state
Metal-oxide semiconductor devices
Metal-oxide- semiconductorcapacitors
Relaxation kinetics
Electrical Characterization of β-Ga2O3 Power Diodes for Cryogenic Temperature Applications
会议论文
2024 THE 18TH NATIONAL CONFERENCE ON MOCVD (MOCVD)
作者:
Qu, Haolan
;
Chen, Jiaxiang
;
Zhu, Yitai
;
Lu, Xing
;
Zhang, David Wei
收藏
|
浏览/下载:186/0
|
提交时间:2024/12/01
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