消息
×
loading..
中文版 | English

在结果中检索

KMS

浏览/检索结果: 共9条，第1-9条 帮助

已选(0)清除 条数/页：   排序方式：
Effect of 5 MeV proton irradiation on electrical and trap characteristics of β-Ga2O3 power diode 期刊论文
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2025, 卷号: 187
作者:  Qu, Haolan;  Huang, Wei;  Zhang, Yu;  Sui, Jin;  Yang, Ge
Adobe PDF(6465Kb)  |  收藏  |  浏览/下载：327/4  |  提交时间：2024/11/29
The study and optimization of ICP deep etching at a low-temperature for InP solid-immersion metalens fabrication 期刊论文
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2023, 卷号: 166
作者:  Zhu, Yicheng;  Wang, Wenjuan;  Zhou, Min;  Qu, Huidan;  Li, Guanhai
Adobe PDF(6984Kb)  |  收藏  |  浏览/下载：481/1  |  提交时间：2023/07/28
300 mm integration of a scalable phase change material spacer by inductively coupled plasma etching 期刊论文
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2023, 卷号: 164
作者:  Fang, Wencheng;  Zheng, Jia;  Zhang, Jiarui;  Li, Chengxing;  Wang, Ruobing
Adobe PDF(9718Kb)  |  收藏  |  浏览/下载：327/1  |  提交时间：2023/07/07
Secondary defects of as-grown oxygen precipitates in nitrogen doped Czochralski single crystal silicon 期刊论文
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2023, 卷号: 163
作者:  Tuo, Huan;  Liu, Yun;  Li, Minghao;  Dai, Rongwang;  Wang, Hao
Adobe PDF(9508Kb)  |  收藏  |  浏览/下载：302/2  |  提交时间：2023/06/02
Investigation of microscale and nanoscale twin lamellae in monocrystalline silicon grown by Czochralski method 期刊论文
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2022, 卷号: 149
作者:  Liu, Yun;  Liu, Wenkai;  Wei, Tao;  Li, Zhan;  Li, Minghao
Adobe PDF(12328Kb)  |  收藏  |  浏览/下载：304/4  |  提交时间：2022/07/04
Effect of post-deposition annealing on atomic layer deposited SiO2 film for silicon surface passivation 期刊论文
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2020, 卷号: 106
作者:  Li, Shizheng;  Xu, Jiahui;  Wang, Liangxing;  Yang, Ning;  Ye, Xiaojun
Adobe PDF(1189Kb)  |  收藏  |  浏览/下载：531/10  |  提交时间：2019/11/22
Plasma-induced damage and annealing repairing in ALD-Al2O3/PECVD-SiNx stacks 期刊论文
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2019, 卷号: 100, 页码: 214-219
作者:  Li, Shizheng;  Yang, Ning;  Yuan, Xiao;  ye, Xiaojun;  Wang, Liangxing
Adobe PDF(2081Kb)  |  收藏  |  浏览/下载：538/11  |  提交时间：2019/07/01
RESET current optimization for phase change memory based on the sub-threshold slope 期刊论文
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2019, 卷号: 97, 页码: 11-16
作者:  Wu, Lei;  Chen, Yi-Feng;  Cai, Dao-Lin;  Lu, Yao-Yao;  Guo, Tian-Qi
Adobe PDF(1536Kb)  |  收藏  |  浏览/下载：527/7  |  提交时间：2019/05/05
Morphology improvement of SiC trench by inductively coupled plasma etching using Ni/Al2O3 bilayer mask 期刊论文
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2017, 卷号: 67, 页码: 104-109
作者:  Li, Jingjie;  Cheng, Xinhong;  Wang, Qian;  Zheng, Li;  Shen, Lingyan
Adobe PDF(915Kb)  |  收藏  |  浏览/下载：735/3  |  提交时间：2017/08/26
  • 首页
  • 上一页
  • 1
  • 下一页
  • 末页