Investigation of microscale and nanoscale twin lamellae in monocrystalline silicon grown by Czochralski method

doi:10.1016/j.mssp.2022.106895

	Investigation of microscale and nanoscale twin lamellae in monocrystalline silicon grown by Czochralski method
	Liu, Yun 1,2; Liu, Wenkai1,3 ; Wei, Tao 1,2; Li, Zhan 1,2; Li, Minghao 1,2; Dai, Rongwang 1,2; Xue, Zhongying 1,2; Wei, Xing 1,2,4
	2022-10
发表期刊	MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING (IF:4.2[JCR-2023],3.9[5-Year])
ISSN	1369-8001
卷号	149
发表状态	已发表
DOI	10.1016/j.mssp.2022.106895
摘要	In this paper, twin lamellae with microscale and nanoscale in 300 mm (001) Czochralski monocrystalline silicon were characterized by nanotopography (NT), X-ray topography (XRT), scanning infrared depolarization (SIRD), and localized light scattering (LLS). The structure of twin lamellae was investigated via scanning electron microscopy (SEM) and transmission electron microscopy (TEM). According to the characterization results, the geometry of micro-scale and nano-scale twin lamellae are reconstructed and the starting points of twinning were located. It is found that the two types of twin lamellae are both on {111} plane and identified as Σ3 twin. Furthermore, the formation mechanism and origins of twin lamellae in this work were discussed.
关键词	Microscale twin lamellae Monocrystalline silicon Nanoscale twin lamellae
URL	查看原文
收录类别	SCIE ; EI
语种	英语
Scopus 记录号	2-s2.0-85132350498
来源库	Scopus
引用统计	被引频次：2[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/197858
专题	物质科学与技术学院_硕士生物质科学与技术学院_博士生
通讯作者	Xue, Zhongying; Wei, Xing
作者单位	1.State Key Laboratory of Functional Materials for Informatics,Shanghai Institute of Microsystem and Information Technology,Chinese Academy of Sciences,Shanghai,200050,China 2.University of Chinese Academy of Sciences,Beijing,100049,China 3.School of Physical Science and Technology,ShanghaiTech University,Shanghai,201210,China 4.Zing Semiconductor Corporation,Shanghai,201306,China
推荐引用方式 GB/T 7714	Liu, Yun,Liu, Wenkai,Wei, Tao,et al. Investigation of microscale and nanoscale twin lamellae in monocrystalline silicon grown by Czochralski method[J]. MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING,2022,149.
APA	Liu, Yun.,Liu, Wenkai.,Wei, Tao.,Li, Zhan.,Li, Minghao.,...&Wei, Xing.(2022).Investigation of microscale and nanoscale twin lamellae in monocrystalline silicon grown by Czochralski method.MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING,149.
MLA	Liu, Yun,et al."Investigation of microscale and nanoscale twin lamellae in monocrystalline silicon grown by Czochralski method".MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING 149(2022).