Efficient Bilevel Source Mask Optimization

doi:10.1145/3649329.3656252

	Efficient Bilevel Source Mask Optimization
	Chen, Guojin 1; He, Hongquan2 ; Xu, Peng 1; Geng, Hao2 ; Yu, Bei 1
	2024-11-07
会议录名称	PROCEEDINGS - DESIGN AUTOMATION CONFERENCE
ISSN	0738-100X
发表状态	正式接收
DOI	10.1145/3649329.3656252
摘要	Resolution Enhancement Techniques (RETs) are critical to meet the demands of advanced technology nodes. Among RETs, Source Mask Optimization (SMO) is pivotal, concurrently optimizing both the source and the mask to expand the process window. Traditional SMO methods, however, are limited by sequential and alternating optimizations, leading to extended runtimes without performance guarantees. This paper introduces a unified SMO framework utilizing the accelerated Abbe forward imaging to enhance precision and efficiency. Further, we propose the innovative BiSMO framework, which reformulates SMO through a bilevel optimization approach, and present three gradient-based methods to tackle the challenges of bilevel SMO. Our experimental results demonstrate that BiSMO achieves a remarkable 40% reduction in error metrics and 8× increase in runtime efficiency, signifying a major leap forward in SMO. © 2024 Copyright held by the owner/author(s).
会议录编者/会议主办者	ACM Special Interest Group on Design Automation (SIGDA) ; ACM Special Interest Group on Embedded Systems (SIGBED) ; IEEE-CEDA
关键词	Advanced technology Alternating optimizations Bilevel Mask optimization Optimization method Process window Resolution enhancement technique Runtimes Sequential optimization Technology nodes
会议名称	61st ACM/IEEE Design Automation Conference, DAC 2024
会议地点	San Francisco, CA, United states
会议日期	June 23, 2024 - June 27, 2024
URL	查看原文
收录类别	EI
语种	英语
出版者	Institute of Electrical and Electronics Engineers Inc.
EI入藏号	20245017501551
EI主题词	Photomasks
EI分类号	745.1 Printing
原始文献类型	Conference article (CA)
文献类型	会议论文
条目标识符	https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/461532
专题	信息科学与技术学院_硕士生信息科学与技术学院_PI研究组_耿浩
通讯作者	Chen, Guojin
作者单位	1.Chinese University of Hong Kong, Hong Kong; 2.ShanghaiTech University, China
推荐引用方式 GB/T 7714	Chen, Guojin,He, Hongquan,Xu, Peng,et al. Efficient Bilevel Source Mask Optimization[C]//ACM Special Interest Group on Design Automation (SIGDA), ACM Special Interest Group on Embedded Systems (SIGBED), IEEE-CEDA:Institute of Electrical and Electronics Engineers Inc.,2024.