ShanghaiTech University Knowledge Management System
Device Design Assessment of GaN Merged P-i-N Schottky Diodes | |
2019-12 | |
发表期刊 | ELECTRONICS
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ISSN | / |
EISSN | 2079-9292 |
卷号 | 8期号:12 |
发表状态 | 已发表 |
DOI | 10.3390/electronics8121550 |
摘要 | Device characteristics of GaN merged P-i-N Schottky (MPS) diodes were evaluated and studied via two-dimensional technology computer-aided design (TCAD) after calibrating model parameters and critical electrical fields with experimental proven results. The device's physical dimensions and drift layer concentration were varied to study their influence on the device's performance. Extending the inter-p-GaN region distance or the Schottky contact portion could enhance the forward conduction capability; however, this leads to compromised electrical field screening effects from neighboring PN junctions, as well as reduced breakdown voltage. By reducing the drift layer background concentration, a higher breakdown voltage was expected for MPSs, as a larger portion of the drift layer itself could be depleted for sustaining vertical reverse voltage. However, lowering the drift layer concentration would also result in a reduction in forward conduction capability. The method and results of this study provide a guideline for designing MPS diodes with target blocking voltage and forward conduction at a low bias. |
关键词 | GaN P-i-N diodes Schottky diodes blocking voltage forward characteristics merged P-i-N Schottky diodes |
收录类别 | SCI ; SCIE |
语种 | 英语 |
资助项目 | Shanghai Pujiang Program[18PJ1408200] |
WOS研究方向 | Engineering |
WOS类目 | Engineering, Electrical & Electronic |
WOS记录号 | WOS:000506678200175 |
出版者 | MDPI |
WOS关键词 | RECTIFIERS ; SILICON |
原始文献类型 | Article |
引用统计 | 正在获取...
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文献类型 | 期刊论文 |
条目标识符 | https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/105319 |
专题 | 信息科学与技术学院_硕士生 信息科学与技术学院_PI研究组_邹新波组 |
通讯作者 | Zou, Xinbo |
作者单位 | 1.ShanghaiTech Univ, Sch Informat Sci & Technol, Shanghai 201210, Peoples R China 2.Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China 3.Univ Chinese Acad Sci, Beijing 100049, Peoples R China 4.Sun Yat Sen Univ, Sch Elect & Informat Technol, State Key Lab Optoelect Mat & Technol, Guangzhou 510275, Guangdong, Peoples R China |
第一作者单位 | 信息科学与技术学院 |
通讯作者单位 | 信息科学与技术学院 |
第一作者的第一单位 | 信息科学与技术学院 |
推荐引用方式 GB/T 7714 | Zhang, Yuliang,Lu, Xing,Zou, Xinbo. Device Design Assessment of GaN Merged P-i-N Schottky Diodes[J]. ELECTRONICS,2019,8(12). |
APA | Zhang, Yuliang,Lu, Xing,&Zou, Xinbo.(2019).Device Design Assessment of GaN Merged P-i-N Schottky Diodes.ELECTRONICS,8(12). |
MLA | Zhang, Yuliang,et al."Device Design Assessment of GaN Merged P-i-N Schottky Diodes".ELECTRONICS 8.12(2019). |
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