Device Design Assessment of GaN Merged P-i-N Schottky Diodes
2019-12
发表期刊ELECTRONICS
ISSN/
EISSN2079-9292
卷号8期号:12
发表状态已发表
DOI10.3390/electronics8121550
摘要

Device characteristics of GaN merged P-i-N Schottky (MPS) diodes were evaluated and studied via two-dimensional technology computer-aided design (TCAD) after calibrating model parameters and critical electrical fields with experimental proven results. The device's physical dimensions and drift layer concentration were varied to study their influence on the device's performance. Extending the inter-p-GaN region distance or the Schottky contact portion could enhance the forward conduction capability; however, this leads to compromised electrical field screening effects from neighboring PN junctions, as well as reduced breakdown voltage. By reducing the drift layer background concentration, a higher breakdown voltage was expected for MPSs, as a larger portion of the drift layer itself could be depleted for sustaining vertical reverse voltage. However, lowering the drift layer concentration would also result in a reduction in forward conduction capability. The method and results of this study provide a guideline for designing MPS diodes with target blocking voltage and forward conduction at a low bias.

关键词GaN P-i-N diodes Schottky diodes blocking voltage forward characteristics merged P-i-N Schottky diodes
收录类别SCI ; SCIE
语种英语
资助项目Shanghai Pujiang Program[18PJ1408200]
WOS研究方向Engineering
WOS类目Engineering, Electrical & Electronic
WOS记录号WOS:000506678200175
出版者MDPI
WOS关键词RECTIFIERS ; SILICON
原始文献类型Article
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文献类型期刊论文
条目标识符https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/105319
专题信息科学与技术学院_硕士生
信息科学与技术学院_PI研究组_邹新波组
通讯作者Zou, Xinbo
作者单位
1.ShanghaiTech Univ, Sch Informat Sci & Technol, Shanghai 201210, Peoples R China
2.Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China
3.Univ Chinese Acad Sci, Beijing 100049, Peoples R China
4.Sun Yat Sen Univ, Sch Elect & Informat Technol, State Key Lab Optoelect Mat & Technol, Guangzhou 510275, Guangdong, Peoples R China
第一作者单位信息科学与技术学院
通讯作者单位信息科学与技术学院
第一作者的第一单位信息科学与技术学院
推荐引用方式
GB/T 7714
Zhang, Yuliang,Lu, Xing,Zou, Xinbo. Device Design Assessment of GaN Merged P-i-N Schottky Diodes[J]. ELECTRONICS,2019,8(12).
APA Zhang, Yuliang,Lu, Xing,&Zou, Xinbo.(2019).Device Design Assessment of GaN Merged P-i-N Schottky Diodes.ELECTRONICS,8(12).
MLA Zhang, Yuliang,et al."Device Design Assessment of GaN Merged P-i-N Schottky Diodes".ELECTRONICS 8.12(2019).
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