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The study and optimization of ICP deep etching at a low-temperature for InP solid-immersion metalens fabrication
期刊论文
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2023, 卷号: 166
作者:
Zhu, Yicheng
;
Wang, Wenjuan
;
Zhou, Min
;
Qu, Huidan
;
Li, Guanhai
Adobe PDF(6984Kb)
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收藏
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浏览/下载:476/1
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提交时间:2023/07/28
Aspect ratio
Chlorine compounds
Etching
Fabrication
III-V semiconductors
Inductively coupled plasma
Optimization
Photodetectors
Photons
Semiconducting indium
Semiconducting indium gallium arsenide
Semiconducting indium phosphide
Temperature
Deep etching
Etching process
High aspect ratio structure fabrication
High aspect ratio structures
Inductively coupled plasma deep etching
Inductively-coupled plasma
InP based
Lows-temperatures
MetaLens
Structure fabrication
300 mm integration of a scalable phase change material spacer by inductively coupled plasma etching
期刊论文
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2023, 卷号: 164
作者:
Fang, Wencheng
;
Zheng, Jia
;
Zhang, Jiarui
;
Li, Chengxing
;
Wang, Ruobing
Adobe PDF(9718Kb)
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收藏
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浏览/下载:324/1
|
提交时间:2023/07/07
Efficiency
Inductively coupled plasma
Phase change materials
Phase change memory
Physical vapor deposition
Plasma etching
Anisotropic plasma etching
Aspect-ratio
Confined structures
Conformal deposition
Deposition technique
Heating efficiencies
Inductively coupled plasma etching
Phase-change memory
Physical vapour deposition
Reset currents
Lamb Wave Resonators based on Co-sputtered Al0.78Sc0.22N Thin Film
会议论文
IEEE INTERNATIONAL ULTRASONICS SYMPOSIUM, IUS, Virtual, Online, China, September 11, 2011 - September 16, 2011
作者:
Luo, Zhifang
;
Shao, Shuai
Adobe PDF(1170Kb)
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浏览/下载:389/2
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提交时间:2022/07/01
Aluminum compounds
Electromechanical coupling
Etching
Inductively coupled plasma
Magnetrons
MEMS
Resonators
Thin films
Ultrasonic waves
Etching profile
Finite element analyse
High quality
Inductively coupled plasma etching
Lamb wave resonators
Magnetron co-sputtering
Perfectly Matched Layer
Quality factors
Thin-films
Vertical etching
Characterization of AlN and AlScN film ICP etching for micro/ nano fabrication
期刊论文
MICROELECTRONIC ENGINEERING, 2021, 卷号: 242
作者:
Luo, Zhifang
;
Shao, Shuai
;
Wu, Tao
Adobe PDF(3189Kb)
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收藏
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浏览/下载:460/0
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提交时间:2021/06/04
ICP etching
Etching model
AlN
AlScN
Micro
Nano fabrication
Piezoelectric resonators
Aluminum nitride
Etching
Fabrication
III
V semiconductors
Inductively coupled plasma
Nitrides
Photoresists
Piezoelectricity
Resonators
Scandium compounds
Surface waves
AlN thin films
Aluminum nitride (AlN)
Contour
mode resonators
Lamb wave resonators
Micro /nano fabrications
Photoresist mask
Piezoelectric thin films
Quality factors
Optimization of AlN and AlScN Film ICP Etching
会议论文
2021 34TH IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS (MEMS 2021), ELECTR NETWORK, JAN 25-29, 2021
作者:
Zhifang Luo
;
Shuai Shao
;
Tao Wu
Adobe PDF(1221Kb)
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收藏
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浏览/下载:479/1
|
提交时间:2021/07/23
Aluminum nitride
Etching
III
V semiconductors
Inductively coupled plasma
Mechanics
MEMS
Nitrides
Piezoelectricity
Resonators
Scandium compounds
Surface waves
Thin films
AlN films
Aluminum nitride (AlN)
Contour
mode resonators
Etching rate
ICP etching
Lamb wave resonators
Piezoelectric thin films
Quality factors
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