Optimization of AlN and AlScN Film ICP Etching

doi:10.1109/MEMS51782.2021.9375464

	Optimization of AlN and AlScN Film ICP Etching
	Zhifang Luo; Shuai Shao; Tao Wu
	2021-01
会议录名称	2021 34TH IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS (MEMS 2021)
ISSN	1084-6999
卷号	2021-January
页码	638-641
发表状态	已发表
DOI	10.1109/MEMS51782.2021.9375464
摘要	We present the inductively coupled plasma (ICP) etching characteristics of (0002) oriented Aluminum Nitride (AlN) and Aluminum Scandium Nitride (Al0.94Sc0.06N) piezoelectric thin films and implementation in AlN piezoelectric lamb wave resonators. A profile of 84 degrees with an etching rate of about 230nm/min using Cl-2/BCl3/N-2 mixed gas is achieved at AlN film, and a profile of 77 degrees using same mixed gas is obtained at Al0.94Sc0.06N film. Finally, we demonstrate the fabrication and characteristics of AlN contour mode resonators (CMRs), and report a CMR operating at approximately 400MHz with the quality factor exceeding 1600.
会议录编者/会议主办者	IEEE, IEEE MEMS Tech Community ; IEEE ; IEEE MEMS Technical Community
关键词	Aluminum nitride Etching III V semiconductors Inductively coupled plasma Mechanics MEMS Nitrides Piezoelectricity Resonators Scandium compounds Surface waves Thin films AlN films Aluminum nitride (AlN) Contour mode resonators Etching rate ICP etching Lamb wave resonators Piezoelectric thin films Quality factors
会议名称	34th IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
会议地点	ELECTR NETWORK
会议日期	JAN 25-29, 2021
URL	查看原文
收录类别	EI ; CPCI ; CPCI-S
语种	英语
WOS研究方向	Engineering ; Science & Technology - Other Topics
WOS类目	Engineering, Electrical & Electronic ; Engineering, Mechanical ; Nanoscience & Nanotechnology
WOS记录号	WOS:000667731600157
出版者	IEEE
EI入藏号	20211410171385
EI主题词	Chlorine compounds
EI分类号	701.1 Electricity: Basic Concepts and Phenomena ; 704.2 Electric Equipment ; 802.2 Chemical Reactions ; 804.2 Inorganic Compounds ; 931.1 Mechanics ; 932.3 Plasma Physics
原始文献类型	Proceedings Paper
来源库	IEEE
引用统计	正在获取...
文献类型	会议论文
条目标识符	https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/127748
专题	信息科学与技术学院信息科学与技术学院_PI研究组_吴涛组信息科学与技术学院_博士生
作者单位	School of Information Science and Technology, ShanghaiTech University
第一作者单位	信息科学与技术学院
第一作者的第一单位	信息科学与技术学院
推荐引用方式 GB/T 7714	Zhifang Luo,Shuai Shao,Tao Wu. Optimization of AlN and AlScN Film ICP Etching[C]//IEEE, IEEE MEMS Tech Community, IEEE, IEEE MEMS Technical Community:IEEE,2021:638-641.