×
验证码:
换一张
忘记密码？
记住我
×
统一认证登录
登录
中文版
|
English
上海科技大学知识管理系统
ShanghaiTech University Knowledge Management System
统一认证登录
登录
注册
ALL
ORCID
题名
作者
发表日期
关键词
文献类型
DOI
出处
存缴日期
收录类别
出版者
学习讨论厅
图片搜索
粘贴图片网址
首页
研究单元&专题
作者
文献类型
学科分类
知识图谱
知识整合
学习讨论厅
在结果中检索
研究单元&专题
物质科学与技术学院 [4]
信息科学与技术学院 [3]
大科学中心 [1]
作者
吴涛 [3]
罗智方 [3]
邵率 [3]
陆卫 [1]
张青 [1]
杨帆 [1]
更多...
文献类型
期刊论文 [5]
会议论文 [2]
发表日期
2023 [3]
2022 [1]
2021 [3]
出处
MATERIALS ... [2]
2021 34TH ... [1]
ACS CATALY... [1]
IEEE INTER... [1]
MICROELECT... [1]
NANO RESEA... [1]
更多...
语种
英语 [7]
资助项目
Analytical... [1]
National N... [1]
National N... [1]
National N... [1]
Natural Sc... [1]
School of ... [1]
更多...
资助机构
收录类别
EI [7]
SCI [3]
CPCI [2]
CPCI-S [2]
SCIE [1]
×
知识图谱
KMS
反馈留言
浏览/检索结果:
共7条，第1-7条
帮助
已选(
0
)
清除
条数/页：
5
10
15
20
25
30
35
40
45
50
55
60
65
70
75
80
85
90
95
100
排序方式：
请选择
作者升序
作者降序
发表日期升序
发表日期降序
题名升序
题名降序
WOS被引频次升序
WOS被引频次降序
提交时间升序
提交时间降序
期刊影响因子升序
期刊影响因子降序
The study and optimization of ICP deep etching at a low-temperature for InP solid-immersion metalens fabrication
期刊论文
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2023, 卷号: 166
作者:
Zhu, Yicheng
;
Wang, Wenjuan
;
Zhou, Min
;
Qu, Huidan
;
Li, Guanhai
Adobe PDF(6984Kb)
|
收藏
|
浏览/下载：459/1
|
提交时间：2023/07/28
Aspect ratio
Chlorine compounds
Etching
Fabrication
III-V semiconductors
Inductively coupled plasma
Optimization
Photodetectors
Photons
Semiconducting indium
Semiconducting indium gallium arsenide
Semiconducting indium phosphide
Temperature
Deep etching
Etching process
High aspect ratio structure fabrication
High aspect ratio structures
Inductively coupled plasma deep etching
Inductively-coupled plasma
InP based
Lows-temperatures
MetaLens
Structure fabrication
300 mm integration of a scalable phase change material spacer by inductively coupled plasma etching
期刊论文
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2023, 卷号: 164
作者:
Fang, Wencheng
;
Zheng, Jia
;
Zhang, Jiarui
;
Li, Chengxing
;
Wang, Ruobing
Adobe PDF(9718Kb)
|
收藏
|
浏览/下载：296/1
|
提交时间：2023/07/07
Efficiency
Inductively coupled plasma
Phase change materials
Phase change memory
Physical vapor deposition
Plasma etching
Anisotropic plasma etching
Aspect-ratio
Confined structures
Conformal deposition
Deposition technique
Heating efficiencies
Inductively coupled plasma etching
Phase-change memory
Physical vapour deposition
Reset currents
A hybrid nickel/iron-pyromellitic acid electrocatalyst for oxygen evolution reaction
期刊论文
NANO RESEARCH, 2023, 卷号: 17, 期号: 4, 页码: 2481-2491
作者:
Li, Guoqi
;
Li, Lin
;
Li, Wenlong
;
Li, Fusheng
;
Yuan, Chunze
Adobe PDF(4130Kb)
|
收藏
|
浏览/下载：229/1
|
提交时间：2023/11/10
Carboxylation
Cost effectiveness
Electrochemical deposition
Electronic structure
Fourier transform infrared spectroscopy
High resolution transmission electron microscopy
Inductively coupled plasma
Isotopes
Metal ions
Nickel
Optical emission spectroscopy
Oxygen
Reduction
Scanning electron microscopy
X ray absorption spectroscopy
X ray photoelectron spectroscopy
Electrochemical deposition methods
Key factors
Kinetic isotopes effects
Nickel irons
Nickel/iron-pyromellitic acid
Overpotential
Performance
Pyromellitic acids
X-ray absorption spectroscopy
]+ catalyst
Interstitial B-Doping in Pt Lattice to Upgrade Oxygen Electroreduction Performance
期刊论文
ACS CATALYSIS, 2022, 卷号: 12, 期号: 15, 页码: 8848-8856
作者:
Mao, Zijie
;
Ding, Chen
;
Liu, Xuan
;
Zhang, Qing
;
Qin, Xianxian
Adobe PDF(4444Kb)
|
收藏
|
浏览/下载：254/0
|
提交时间：2022/09/02
Aberrations
Atomic emission spectroscopy
Binding sites
Carbon black
Design for testability
Durability
Electrolytic reduction
Electronic structure
Ethylene
High resolution transmission electron microscopy
Inductively coupled plasma
Nanocatalysts
Oxygen
Platinum alloys
Proton exchange membrane fuel cells (PEMFC)
X ray diffraction analysis
B-doping
Dimethylamine Borane
Interstitial B doping
Interstitials
Oxygen electro reductions
Oxygen reduction reaction
Performance
Proton-exchange membranes fuel cells
Pt catalysts
]+ catalyst
Lamb Wave Resonators based on Co-sputtered Al0.78Sc0.22N Thin Film
会议论文
IEEE INTERNATIONAL ULTRASONICS SYMPOSIUM, IUS, Virtual, Online, China, September 11, 2011 - September 16, 2011
作者:
Luo, Zhifang
;
Shao, Shuai
;
Wu, Tao
Adobe PDF(1170Kb)
|
收藏
|
浏览/下载：374/2
|
提交时间：2022/07/01
Aluminum compounds
Electromechanical coupling
Etching
Inductively coupled plasma
Magnetrons
MEMS
Resonators
Thin films
Ultrasonic waves
Etching profile
Finite element analyse
High quality
Inductively coupled plasma etching
Lamb wave resonators
Magnetron co-sputtering
Perfectly Matched Layer
Quality factors
Thin-films
Vertical etching
Characterization of AlN and AlScN film ICP etching for micro/ nano fabrication
期刊论文
MICROELECTRONIC ENGINEERING, 2021, 卷号: 242
作者:
Luo, Zhifang
;
Shao, Shuai
;
Wu, Tao
Adobe PDF(3189Kb)
|
收藏
|
浏览/下载：441/0
|
提交时间：2021/06/04
ICP etching
Etching model
AlN
AlScN
Micro
Nano fabrication
Piezoelectric resonators
Aluminum nitride
Etching
Fabrication
III
V semiconductors
Inductively coupled plasma
Nitrides
Photoresists
Piezoelectricity
Resonators
Scandium compounds
Surface waves
AlN thin films
Aluminum nitride (AlN)
Contour
mode resonators
Lamb wave resonators
Micro /nano fabrications
Photoresist mask
Piezoelectric thin films
Quality factors
Optimization of AlN and AlScN Film ICP Etching
会议论文
2021 34TH IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS (MEMS 2021), ELECTR NETWORK, JAN 25-29, 2021
作者:
Zhifang Luo
;
Shuai Shao
;
Tao Wu
Adobe PDF(1221Kb)
|
收藏
|
浏览/下载：462/1
|
提交时间：2021/07/23
Aluminum nitride
Etching
III
V semiconductors
Inductively coupled plasma
Mechanics
MEMS
Nitrides
Piezoelectricity
Resonators
Scandium compounds
Surface waves
Thin films
AlN films
Aluminum nitride (AlN)
Contour
mode resonators
Etching rate
ICP etching
Lamb wave resonators
Piezoelectric thin films
Quality factors
首页
上一页
1
下一页
末页
