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Characterization of AlN and AlScN film ICP etching for micro/ nano fabrication 期刊论文
MICROELECTRONIC ENGINEERING, 2021, 卷号: 242
作者:  Luo, Zhifang;  Shao, Shuai;  Wu, Tao
Adobe PDF(3189Kb)  |  收藏  |  浏览/下载:453/0  |  提交时间:2021/06/04
Optimization of AlN and AlScN Film ICP Etching 会议论文
2021 34TH IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS (MEMS 2021), ELECTR NETWORK, JAN 25-29, 2021
作者:  Zhifang Luo;  Shuai Shao;  Tao Wu
Adobe PDF(1221Kb)  |  收藏  |  浏览/下载:472/1  |  提交时间:2021/07/23
Morphology improvement of SiC trench by inductively coupled plasma etching using Ni/Al2O3 bilayer mask 期刊论文
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2017, 卷号: 67, 页码: 104-109
作者:  Li, Jingjie;  Cheng, Xinhong;  Wang, Qian;  Zheng, Li;  Shen, Lingyan
Adobe PDF(915Kb)  |  收藏  |  浏览/下载:721/3  |  提交时间:2017/08/26
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