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Improve the On-Resistance for 80V NLDMOS with STI Technology in 0.18 UM BCD Process 会议论文
2022 CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE, CSTIC 2022, Shanghai, China, June 20, 2022 - June 21, 2022
作者:  Xiaoming Zhang;  Donghua Liu;  Haiyang Ling;  Wensheng Qian
Adobe PDF(3354Kb)  |  收藏  |  浏览/下载：220/0  |  提交时间：2022/09/30
Silicon Phosphorus Process Uniformity Improvement Study in Advanced Node 会议论文
2022 CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE, CSTIC 2022, Shanghai, China, June 20, 2022 - June 21, 2022
作者:  Huojin Tu;  Hui Wang;  Li Peng;  Jiaqi Hong;  Wangxin Nie
Adobe PDF(3557Kb)  |  收藏  |  浏览/下载：270/0  |  提交时间：2022/09/30
Study of the Degradation in LDMOS with STI Technology and Improve the Reliability with Several Methods 会议论文
2022 CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE, CSTIC 2022, Shanghai, China, June 20, 2022 - June 21, 2022
作者:  Xiaoming Zhang;  Donghua Liu;  Wensheng Qian
Adobe PDF(2459Kb)  |  收藏  |  浏览/下载：285/0  |  提交时间：2022/09/30
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