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Abnormal strain in suspended GeSn microstructures
2018-03
发表期刊MATERIALS RESEARCH EXPRESS (IF:1.8[JCR-2023],1.9[5-Year])
ISSN2053-1591
卷号5期号:3
发表状态已发表
DOI10.1088/2053-1591/aaafec
摘要A suspended GeSn microstructure is realized by a two-step selective wet etching technique with the aim of fully relaxing the compressive strain, promoting the indirect to direct bandgap transition and improving the optical property of GeSn thin films grown on Ge. The compressive strain was found efficiently relaxed, and even unexpected large tensile strain was displayed on regions of the microstructure by micro-Raman spectroscopy. Residual Ge patches under the suspended GeSn microstructure were found by scanning electron microscopy and proved to be the origin of the tensile strain by finite element method simulations. The tensile strain on the surface is beneficial for direct bandgap conversion and carrier accumulation. Significant enhancement of photoluminescence was obtained in the GeSn microstructures than the original thin film.
关键词GeSn microstructure FEM mu-Raman strain engineering silicon photonics PL
收录类别SCI ; SCIE ; EI
语种英语
资助项目Chinese Academy of Sciences[KGZD-EW-804]
WOS研究方向Materials Science
WOS类目Materials Science, Multidisciplinary
WOS记录号WOS:000426742100001
出版者IOP PUBLISHING LTD
EI入藏号20191306681412
EI主题词Energy gap ; Finite element method ; Microstructure ; Optical properties ; Scanning electron microscopy ; Semiconductor alloys ; Silicon photonics ; Thin films ; Tin alloys ; Wet etching
EI分类号Tin and Alloys:546.2 ; Light/Optics:741.1 ; Numerical Methods:921.6 ; Mechanics:931.1 ; Materials Science:951
WOS关键词RAMAN-SCATTERING ; WAVE-GUIDES ; GERMANIUM ; SI ; INTERCONNECTS ; FABRICATION ; ROUTE
原始文献类型Article
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文献类型期刊论文
条目标识符https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/18296
专题物质科学与技术学院
信息科学与技术学院_特聘教授组_王庶民组
物质科学与技术学院_硕士生
物质科学与技术学院_博士生
通讯作者Li, Yaoyao; Wang, Shumin
作者单位
1.Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
2.Univ Chinese Acad Sci, Beijing 100190, Peoples R China
3.ShanghaiTech Univ, Sch Phys Sci & Technol, Shanghai 201210, Peoples R China
4.Chinese Acad Sci, Shanghai Inst Tech Phys, State Key Lab Infrared Phys, 500 Yutian Rd, Shanghai 200083, Peoples R China
5.Chalmers Univ Technol, Dept Microtechnol & Nanosci, S-41296 Gothenburg, Sweden
通讯作者单位物质科学与技术学院
推荐引用方式
GB/T 7714
Han, Yi,Song, Yuxin,Chen, Xiren,et al. Abnormal strain in suspended GeSn microstructures[J]. MATERIALS RESEARCH EXPRESS,2018,5(3).
APA Han, Yi.,Song, Yuxin.,Chen, Xiren.,Zhang, Zhenpu.,Liu, Juanjuan.,...&Wang, Shumin.(2018).Abnormal strain in suspended GeSn microstructures.MATERIALS RESEARCH EXPRESS,5(3).
MLA Han, Yi,et al."Abnormal strain in suspended GeSn microstructures".MATERIALS RESEARCH EXPRESS 5.3(2018).
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