ShanghaiTech University Knowledge Management System
Progress of ARPES study on topological semimetals | |
2019-11-20 | |
发表期刊 | 物理学报 |
ISSN | 1000-3290 |
卷号 | 68期号:22 |
发表状态 | 已发表 |
DOI | 10.7498/aps.68.20191544 |
摘要 | Topological semimetal, known as a type of topological quantum materials without energy gap, has attracted lots of research interests due to its unique physical properties such as novel quasiparticles, giant magnetoresistance and large carrier mobility. Topological semimetal can be further classified into topological Dirac semimetal, topological Weyl semimetal, topological nodal-line semimetal and topological semimetals with "new fermions". The high-resolution angle-resolved photoemission spectroscopy (ARPES) has emerged as a powerful experimental technique to directly visualize the electronic structure and identify the characteristic topological electronic states in topological semimetals. Here we would briefly introduce the ARPES technique and review some of the recent progress of ARPES study on the electronic structures of typical topological semimetals. We would focus mostly on the physics origin and ARPES signature of topological electronic structures and hope the readers would find it interesting and useful in the understanding of this material class which both is important in physics and has promising application potentials. |
关键词 | topological semimetal electronic structure quantum materials angle-resolved photoemission spectroscopy |
收录类别 | SCI ; SCIE ; EI ; 北大核心 |
语种 | 中文 |
资助项目 | National Natural Science Foundation of China[11774190] ; National Natural Science Foundation of China[11674229] |
WOS研究方向 | Physics |
WOS类目 | Physics, Multidisciplinary |
WOS记录号 | WOS:000499091000021 |
出版者 | CHINESE PHYSICAL SOC |
WOS关键词 | DIRAC SEMIMETAL ; SURFACE-STATES ; FERMI ARCS ; DISCOVERY ; PHASE ; RADIATION ; INSULATOR |
原始文献类型 | Article |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/104531 |
专题 | 物质科学与技术学院_硕士生 物质科学与技术学院_PI研究组_柳仲楷组 物质科学与技术学院_特聘教授组_陈宇林 物质科学与技术学院_博士生 物质科学与技术学院_公共科研平台_拓扑物理实验室 |
通讯作者 | Liu Zhong-Kai; Chen Yu-Lin |
作者单位 | 1.Chinese Acad Sci, CAS Ctr Excellence Superconducting Elect CENSE, Shanghai Inst Microsyst & Informat Technol SIMIT, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China 2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China 3.Shanghai Tech Univ, Sch Phys Sci & Technol, Shanghai Tech Lab Topol Phys, Shanghai 201210, Peoples R China 4.Univ Oxford, Dept Phys, Oxford OX1 3PU, England 5.Tsinghua Univ, Dept Phys, Beijing 100084, Peoples R China |
第一作者单位 | 物质科学与技术学院 |
通讯作者单位 | 物质科学与技术学院 |
推荐引用方式 GB/T 7714 | Deng Tao,Yang Hai-Feng,Zhang Jing,et al. Progress of ARPES study on topological semimetals[J]. 物理学报,2019,68(22). |
APA | Deng Tao.,Yang Hai-Feng.,Zhang Jing.,Li Yi-Wei.,Yang Le-Xian.,...&Chen Yu-Lin.(2019).Progress of ARPES study on topological semimetals.物理学报,68(22). |
MLA | Deng Tao,et al."Progress of ARPES study on topological semimetals".物理学报 68.22(2019). |
条目包含的文件 | ||||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 |
修改评论
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。