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Effect of As2 flux on the growth of InAs/InGaAs dot-in-well structure by molecular beam epitaxy | |
2025-08-01 | |
发表期刊 | JOURNAL OF CRYSTAL GROWTH (IF:1.7[JCR-2023],1.7[5-Year]) |
ISSN | 0022-0248 |
EISSN | 1873-5002 |
卷号 | 663 |
发表状态 | 已发表 |
DOI | 10.1016/j.jcrysgro.2025.128193 |
摘要 | This study systematically investigates the growth of InAs/InGaAs dot-in-well (DWELL) structure with a wide range of As2 flux employed during the growth of InAs dot layer. It is found that As2 flux plays a very important role in the growth of the DWELL structure, which fundamentally affects the migration length and the desorption rate of In atoms. A non-monotonic variation in the density of InAs quantum dots (QDs) has been observed with varying As2 flux. In addition, the average width and height of QDs also depends on the As2 flux. The photoluminescence (PL) peak intensity from the DWELL structure exhibits a remarkable relationship with the As2 flux, where a maximum intensity enhancement of 90 % was achieved by using the optimized As2 flux. A total redshift of 58 nm in the peak emission wavelength has been observed within the As2 flux range studied. Moreover, it has been the first experimental evidence for a distinctive phenomenon that the QDs in the DWELL structure might not be fully capped by the InGaAs layer when the QDs were grown with low As2 fluxes. Therefore, decomposition of the uncapped portion of QD may occur, resulting in a large blueshift of the PL emission peak from the DWELL structure. |
关键词 | InAs quantum dot Dot-in-well structure Arsenic flux Molecular beam epitaxy |
URL | 查看原文 |
收录类别 | SCI |
语种 | 英语 |
资助项目 | National Key Research and Devel-opment Program of China[2021YFB2800500] |
WOS研究方向 | Crystallography ; Materials Science ; Physics |
WOS类目 | Crystallography ; Materials Science, Multidisciplinary ; Physics, Applied |
WOS记录号 | WOS:001471113500001 |
出版者 | ELSEVIER |
文献类型 | 期刊论文 |
条目标识符 | https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/523890 |
专题 | 信息科学与技术学院 信息科学与技术学院_特聘教授组_龚谦组 信息科学与技术学院_硕士生 信息科学与技术学院_博士生 |
通讯作者 | Gong, Qian |
作者单位 | 1.Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Natl Key Lab Mat Integrated Circuits, Shanghai 200050, Peoples R China 2.Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China 3.Shanghai Tech Univ, Sch Informat Sci & Technol, Shanghai 201210, Peoples R China |
通讯作者单位 | 信息科学与技术学院 |
推荐引用方式 GB/T 7714 | Liu, Ruo-Tao,Wang, Kun,Wu, Jian-Chu,et al. Effect of As2 flux on the growth of InAs/InGaAs dot-in-well structure by molecular beam epitaxy[J]. JOURNAL OF CRYSTAL GROWTH,2025,663. |
APA | Liu, Ruo-Tao.,Wang, Kun.,Wu, Jian-Chu.,Yang, Chen.,Huang, Hua.,...&Gong, Qian.(2025).Effect of As2 flux on the growth of InAs/InGaAs dot-in-well structure by molecular beam epitaxy.JOURNAL OF CRYSTAL GROWTH,663. |
MLA | Liu, Ruo-Tao,et al."Effect of As2 flux on the growth of InAs/InGaAs dot-in-well structure by molecular beam epitaxy".JOURNAL OF CRYSTAL GROWTH 663(2025). |
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