Effect of As2 flux on the growth of InAs/InGaAs dot-in-well structure by molecular beam epitaxy
2025-08-01
发表期刊JOURNAL OF CRYSTAL GROWTH (IF:1.7[JCR-2023],1.7[5-Year])
ISSN0022-0248
EISSN1873-5002
卷号663
发表状态已发表
DOI10.1016/j.jcrysgro.2025.128193
摘要

This study systematically investigates the growth of InAs/InGaAs dot-in-well (DWELL) structure with a wide range of As2 flux employed during the growth of InAs dot layer. It is found that As2 flux plays a very important role in the growth of the DWELL structure, which fundamentally affects the migration length and the desorption rate of In atoms. A non-monotonic variation in the density of InAs quantum dots (QDs) has been observed with varying As2 flux. In addition, the average width and height of QDs also depends on the As2 flux. The photoluminescence (PL) peak intensity from the DWELL structure exhibits a remarkable relationship with the As2 flux, where a maximum intensity enhancement of 90 % was achieved by using the optimized As2 flux. A total redshift of 58 nm in the peak emission wavelength has been observed within the As2 flux range studied. Moreover, it has been the first experimental evidence for a distinctive phenomenon that the QDs in the DWELL structure might not be fully capped by the InGaAs layer when the QDs were grown with low As2 fluxes. Therefore, decomposition of the uncapped portion of QD may occur, resulting in a large blueshift of the PL emission peak from the DWELL structure.

关键词InAs quantum dot Dot-in-well structure Arsenic flux Molecular beam epitaxy
URL查看原文
收录类别SCI
语种英语
资助项目National Key Research and Devel-opment Program of China[2021YFB2800500]
WOS研究方向Crystallography ; Materials Science ; Physics
WOS类目Crystallography ; Materials Science, Multidisciplinary ; Physics, Applied
WOS记录号WOS:001471113500001
出版者ELSEVIER
文献类型期刊论文
条目标识符https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/523890
专题信息科学与技术学院
信息科学与技术学院_特聘教授组_龚谦组
信息科学与技术学院_硕士生
信息科学与技术学院_博士生
通讯作者Gong, Qian
作者单位
1.Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Natl Key Lab Mat Integrated Circuits, Shanghai 200050, Peoples R China
2.Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
3.Shanghai Tech Univ, Sch Informat Sci & Technol, Shanghai 201210, Peoples R China
通讯作者单位信息科学与技术学院
推荐引用方式
GB/T 7714
Liu, Ruo-Tao,Wang, Kun,Wu, Jian-Chu,et al. Effect of As2 flux on the growth of InAs/InGaAs dot-in-well structure by molecular beam epitaxy[J]. JOURNAL OF CRYSTAL GROWTH,2025,663.
APA Liu, Ruo-Tao.,Wang, Kun.,Wu, Jian-Chu.,Yang, Chen.,Huang, Hua.,...&Gong, Qian.(2025).Effect of As2 flux on the growth of InAs/InGaAs dot-in-well structure by molecular beam epitaxy.JOURNAL OF CRYSTAL GROWTH,663.
MLA Liu, Ruo-Tao,et al."Effect of As2 flux on the growth of InAs/InGaAs dot-in-well structure by molecular beam epitaxy".JOURNAL OF CRYSTAL GROWTH 663(2025).
条目包含的文件
文件名称/大小 文献类型 版本类型 开放类型 使用许可
个性服务
查看访问统计
谷歌学术
谷歌学术中相似的文章
[Liu, Ruo-Tao]的文章
[Wang, Kun]的文章
[Wu, Jian-Chu]的文章
百度学术
百度学术中相似的文章
[Liu, Ruo-Tao]的文章
[Wang, Kun]的文章
[Wu, Jian-Chu]的文章
必应学术
必应学术中相似的文章
[Liu, Ruo-Tao]的文章
[Wang, Kun]的文章
[Wu, Jian-Chu]的文章
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。