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ShanghaiTech University Knowledge Management System
Approaching Charge Compensation Limit for Promoting Magnetoresistance in 2D Nonlayered MoO2 via Surface Hydrogen Passivation | |
2025 | |
发表期刊 | ADVANCED FUNCTIONAL MATERIALS (IF:18.5[JCR-2023],19.6[5-Year]) |
ISSN | 1616-301X |
EISSN | 1616-3028 |
发表状态 | 已发表 |
DOI | 10.1002/adfm.202422024 |
摘要 | Large non-saturated magnetoresistances of semimetals are dominated by charge compensation due to their unique electronic structure. However, the dramatic magnetoresistance deteriorations are often observed in low-dimensional system resulting from high-density surface defects, where the suppression of charge scattering or concentration unbalance with highly maintained magnetoresistance is still challenging. Herein, a hydrogen annealing strategy is developed for surface defects passivation of 2D MoO2 nanoflakes. Systematical characterization for H-MoO2 nanoflakes reveals the formation of hydrogen chemical bonds that reduce surface defect density and slightly change Fermi level with unchanged bulk structures. An obviously enhanced magnetoresistance of 9.2% is demonstrated for H-MoO2 nanoflakes compared to Ar-MoO2 of 3.9% at 10 K and 9 T. The analysis of the nonlinearity Hall resistivity unravels the concentration of electrons and holes in H-MoO2 approaches a more balanced equilibrium, which is attributed to surface defects passivation resulting in the suppression of self-doping effects for enhanced magnetoresistance rather than the reduced charge scattering with slightly enhanced carrier mobility. The research not only provides a universal surface passivation strategy on 2D nonlayered semimetals for approaching the charge compensation limit with the preserved magnetoresistance but also underscores the significance of surface passivation in tuning electronic structures of 2D nonlayered materials. |
关键词 | 2D nonlayered semi-metallic MoO2 charge compensation enhanced magnetoresistance surface hydrogen passivation |
URL | 查看原文 |
收录类别 | SCI ; EI |
语种 | 英语 |
资助项目 | National Natural Science Foundation of China[ |
WOS研究方向 | Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics |
WOS类目 | Chemistry, Multidisciplinary ; Chemistry, Physical ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter |
WOS记录号 | WOS:001399677200001 |
出版者 | WILEY-V C H VERLAG GMBH |
EI入藏号 | 20250417733282 |
EI主题词 | Hydrogen bonds |
EI分类号 | 1301.4 Solid State Physics - 1301.4.1 Crystalline Solids and Crystallography - 701 Electricity and Magnetism - 701.1 Electricity: Basic Concepts and Phenomena - 701.2 Magnetism: Basic Concepts and Phenomena - 712.1 Semiconducting Materials - 712.1.2 Compound Semiconducting Materials - 801.3 Physical Chemistry - 802.2 Chemical Reactions - 804.2 Inorganic Compounds |
原始文献类型 | Article in Press |
文献类型 | 期刊论文 |
条目标识符 | https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/483885 |
专题 | 信息科学与技术学院_PI研究组_杨雨梦组 |
通讯作者 | Zhou, Yuqi; Peng, Zheng; Zhou, Yu |
作者单位 | 1.Cent South Univ, Sch Phys, Hunan Key Lab Nanophoton & Devices, Changsha 410083, Hunan, Peoples R China 2.ShanghaiTech Univ, Shanghai Engn Res Ctr Energy Efficient & Custom AI, Sch Informat Sci & Technol, Shanghai, Peoples R China 3.Cent South Univ, State Key Lab Powder Met, Changsha 410083, Hunan, Peoples R China |
推荐引用方式 GB/T 7714 | Chen, Huanzhi,Tian, Zongkui,Zhou, Xilong,et al. Approaching Charge Compensation Limit for Promoting Magnetoresistance in 2D Nonlayered MoO2 via Surface Hydrogen Passivation[J]. ADVANCED FUNCTIONAL MATERIALS,2025. |
APA | Chen, Huanzhi.,Tian, Zongkui.,Zhou, Xilong.,Fan, Xiulian.,Li, Zian.,...&Zhou, Yu.(2025).Approaching Charge Compensation Limit for Promoting Magnetoresistance in 2D Nonlayered MoO2 via Surface Hydrogen Passivation.ADVANCED FUNCTIONAL MATERIALS. |
MLA | Chen, Huanzhi,et al."Approaching Charge Compensation Limit for Promoting Magnetoresistance in 2D Nonlayered MoO2 via Surface Hydrogen Passivation".ADVANCED FUNCTIONAL MATERIALS (2025). |
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