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Approaching Charge Compensation Limit for Promoting Magnetoresistance in 2D Nonlayered MoO2 via Surface Hydrogen Passivation
2025
发表期刊ADVANCED FUNCTIONAL MATERIALS (IF:18.5[JCR-2023],19.6[5-Year])
ISSN1616-301X
EISSN1616-3028
发表状态已发表
DOI10.1002/adfm.202422024
摘要

Large non-saturated magnetoresistances of semimetals are dominated by charge compensation due to their unique electronic structure. However, the dramatic magnetoresistance deteriorations are often observed in low-dimensional system resulting from high-density surface defects, where the suppression of charge scattering or concentration unbalance with highly maintained magnetoresistance is still challenging. Herein, a hydrogen annealing strategy is developed for surface defects passivation of 2D MoO2 nanoflakes. Systematical characterization for H-MoO2 nanoflakes reveals the formation of hydrogen chemical bonds that reduce surface defect density and slightly change Fermi level with unchanged bulk structures. An obviously enhanced magnetoresistance of 9.2% is demonstrated for H-MoO2 nanoflakes compared to Ar-MoO2 of 3.9% at 10 K and 9 T. The analysis of the nonlinearity Hall resistivity unravels the concentration of electrons and holes in H-MoO2 approaches a more balanced equilibrium, which is attributed to surface defects passivation resulting in the suppression of self-doping effects for enhanced magnetoresistance rather than the reduced charge scattering with slightly enhanced carrier mobility. The research not only provides a universal surface passivation strategy on 2D nonlayered semimetals for approaching the charge compensation limit with the preserved magnetoresistance but also underscores the significance of surface passivation in tuning electronic structures of 2D nonlayered materials.

关键词2D nonlayered semi-metallic MoO2 charge compensation enhanced magnetoresistance surface hydrogen passivation
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收录类别SCI ; EI
语种英语
资助项目National Natural Science Foundation of China[
WOS研究方向Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics
WOS类目Chemistry, Multidisciplinary ; Chemistry, Physical ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter
WOS记录号WOS:001399677200001
出版者WILEY-V C H VERLAG GMBH
EI入藏号20250417733282
EI主题词Hydrogen bonds
EI分类号1301.4 Solid State Physics - 1301.4.1 Crystalline Solids and Crystallography - 701 Electricity and Magnetism - 701.1 Electricity: Basic Concepts and Phenomena - 701.2 Magnetism: Basic Concepts and Phenomena - 712.1 Semiconducting Materials - 712.1.2 Compound Semiconducting Materials - 801.3 Physical Chemistry - 802.2 Chemical Reactions - 804.2 Inorganic Compounds
原始文献类型Article in Press
文献类型期刊论文
条目标识符https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/483885
专题信息科学与技术学院_PI研究组_杨雨梦组
通讯作者Zhou, Yuqi; Peng, Zheng; Zhou, Yu
作者单位
1.Cent South Univ, Sch Phys, Hunan Key Lab Nanophoton & Devices, Changsha 410083, Hunan, Peoples R China
2.ShanghaiTech Univ, Shanghai Engn Res Ctr Energy Efficient & Custom AI, Sch Informat Sci & Technol, Shanghai, Peoples R China
3.Cent South Univ, State Key Lab Powder Met, Changsha 410083, Hunan, Peoples R China
推荐引用方式
GB/T 7714
Chen, Huanzhi,Tian, Zongkui,Zhou, Xilong,et al. Approaching Charge Compensation Limit for Promoting Magnetoresistance in 2D Nonlayered MoO2 via Surface Hydrogen Passivation[J]. ADVANCED FUNCTIONAL MATERIALS,2025.
APA Chen, Huanzhi.,Tian, Zongkui.,Zhou, Xilong.,Fan, Xiulian.,Li, Zian.,...&Zhou, Yu.(2025).Approaching Charge Compensation Limit for Promoting Magnetoresistance in 2D Nonlayered MoO2 via Surface Hydrogen Passivation.ADVANCED FUNCTIONAL MATERIALS.
MLA Chen, Huanzhi,et al."Approaching Charge Compensation Limit for Promoting Magnetoresistance in 2D Nonlayered MoO2 via Surface Hydrogen Passivation".ADVANCED FUNCTIONAL MATERIALS (2025).
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