The impact of P-type doping level and profile on performance of InAs quantum dot lasers
2024-12-14
发表期刊JOURNAL OF APPLIED PHYSICS (IF:2.7[JCR-2023],2.6[5-Year])
ISSN0021-8979
EISSN1089-7550
卷号136期号:22
发表状态已发表
DOI10.1063/5.0229071
摘要

The impact of P-type doping level on InAs quantum dot (QD) lasers grown on GaAs (001) was investigated through the device performance characterization, i.e., measurements of threshold current, output slope efficiency, and temperature characteristics of lasers. The lasers are characterized under continuous wave operation with a ridge waveguide of 6 x 4000 mu m(2). In comparison to un-doped lasers, it has been demonstrated that an appropriate P-type doping level in the entire spacer can reduce the threshold current density of lasers from 215 to 86.8 A/cm(2) for a doping concentration of 10 holes per QD at room temperature. Additionally, an improvement in output power slope efficiency from 0.108 to 0.191 W/A has been obtained, along with an enhanced characteristic temperature from 34.4 to 67.5 K (20-100 degrees C). Moreover, modulation doping has been explored to further reduce the threshold current density down to 77.9 A/cm(2) at room -temperature and raise the output power, while entire spacer doping may enhance device performance at high operating temperatures. By optimization of P-type doping, remarkable enhancements in the performance of QD lasers can be achieved, which might have potential applications in cost-effective high-performance photonic integrated circuits.

关键词Aluminum arsenide Continuous wave lasers Gallium arsenide Gallium phosphide Indium antimonides Indium arsenide Indium phosphide Nanocrystals Photonic integrated circuits Photonic integration technology Q switched lasers Quantum dot lasers Semiconducting indium phosphide Semiconductor doping Semiconductor quantum dots System-on-chip Threshold current density Device performance Doping levels Doping profiles InAs quantum dots Output power P-type doping Performance Quantum-dot lasers Slope efficiencies Threshold-current density
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收录类别SCI ; EI
语种英语
资助项目National Key Research and Development Program of China10.13039/501100012166[2021YFB2800500]
WOS研究方向Physics
WOS类目Physics, Applied
WOS记录号WOS:001374746100001
出版者AIP Publishing
EI入藏号20245117545978
EI主题词Ridge waveguides
EI分类号1102.3.1 ; 1301.4.1 ; 701.1 Electricity: Basic Concepts and Phenomena ; 712.1 Semiconducting Materials ; 712.1.2 Compound Semiconducting Materials ; 714.2 Semiconductor Devices and Integrated Circuits ; 714.3 Waveguides ; 741.3 Optical Devices and Systems ; 744 Lasers ; 744.2.1 ; 761 Nanotechnology ; 804 Chemical Products Generally ; 804.2 Inorganic Compounds
原始文献类型Journal article (JA)
文献类型期刊论文
条目标识符https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/461491
专题信息科学与技术学院
信息科学与技术学院_特聘教授组_龚谦组
信息科学与技术学院_博士生
通讯作者Gong, Qian
作者单位
1.Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Natl Key Lab Mat Integrated Circuits, Shanghai 200050, Peoples R China
2.Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
3.Shanghai Tech Univ, Sch Informat Sci & Technol, Shanghai 201210, Peoples R China
通讯作者单位信息科学与技术学院
推荐引用方式
GB/T 7714
Liu, Ruo-Tao,Du, An-Tian,Cao, Chun-Fang,et al. The impact of P-type doping level and profile on performance of InAs quantum dot lasers[J]. JOURNAL OF APPLIED PHYSICS,2024,136(22).
APA Liu, Ruo-Tao.,Du, An-Tian.,Cao, Chun-Fang.,Yang, Jin.,Wu, Jian-Chu.,...&Gong, Qian.(2024).The impact of P-type doping level and profile on performance of InAs quantum dot lasers.JOURNAL OF APPLIED PHYSICS,136(22).
MLA Liu, Ruo-Tao,et al."The impact of P-type doping level and profile on performance of InAs quantum dot lasers".JOURNAL OF APPLIED PHYSICS 136.22(2024).
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