Density Modulation of a plasma slab in advanced coaxial plasma guns developed as drivers for PJMIF

doi:10.1109/ICOPS58192.2024.10626522

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	Density Modulation of a plasma slab in advanced coaxial plasma guns developed as drivers for PJMIF
	Thio, Y.C.F.; Mu, J.; Xu, M.
	2024
会议录名称	IEEE INTERNATIONAL CONFERENCE ON PLASMA SCIENCE
ISSN	0730-9244
发表状态	已发表
DOI	10.1109/ICOPS58192.2024.10626522
摘要	The baseline plasma accelerator chosen for PJMIF is the coaxial plasma gun operated in the slab mode [1]. The plasma gun consists of two coaxial cylindrical electrodes connected to a pulsed power supply. The currents in the electrodes produce a large magnetic field which interacts with the current in the plasma to produce the Lorentz force accelerating the plasma. If the plasma slab has a radial density profile that does not match the magnetic pressure profile, the acceleration of the plasma slab is uneven and is prone to the blow-by instability [2]. © 2024 IEEE.
会议录编者/会议主办者	China Electrotechnical Society ; et al. ; IEEE Nuclear and Plasma Sciences Society (NPSS) ; Institute of Electrical Engineering, Chinese Academy of Sciences ; Laboratory of Gas Discharge and Plasma, Department of Electrical Engineering, Tsinghua University ; School of Electrical and Electronic Engineering, Huazhong University of Science and Technology
关键词	Magnetoplasma Particle accelerators Plasma accelerators Plasma density 'current Coaxial cylindrical electrodes Density modulation Lorentz Magnetic pressure Magnetic-field Plasma slab Pressure profiles Pulsed-power supplies Radial density profile
会议名称	51st IEEE International Conference on Plasma Science, ICOPS 2024 and 4th Asia-Pacific Conference on Plasma and Terahertz Science, APCOPTS 2024
会议地点	Beijing, China
会议日期	June 16, 2024 - June 20, 2024
收录类别	EI
语种	英语
出版者	Institute of Electrical and Electronics Engineers Inc.
EI入藏号	20243616987726
EI主题词	Plasma guns
EI分类号	1301.2 ; 1301.2.1.1 ; 1301.2.3 ; 301.2.1 ; 701.2 Magnetism: Basic Concepts and Phenomena
原始文献类型	Conference article (CA)
文献类型	会议论文
条目标识符	https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/421448
专题	高能量密度物理实验室_PI研究组_赵永正组生命科学与技术学院_硕士生
通讯作者	Thio, Y.C.F.
作者单位	Shanghai Tech University, Center for Ultimate Energy (CUE), Shanghai, China
第一作者单位	上海科技大学
通讯作者单位	上海科技大学
第一作者的第一单位	上海科技大学
推荐引用方式 GB/T 7714	Thio, Y.C.F.,Mu, J.,Xu, M.. Density Modulation of a plasma slab in advanced coaxial plasma guns developed as drivers for PJMIF[C]//China Electrotechnical Society, et al., IEEE Nuclear and Plasma Sciences Society (NPSS), Institute of Electrical Engineering, Chinese Academy of Sciences, Laboratory of Gas Discharge and Plasma, Department of Electrical Engineering, Tsinghua University, School of Electrical and Electronic Engineering, Huazhong University of Science and Technology:Institute of Electrical and Electronics Engineers Inc.,2024.