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| UV-enhanced photorefractive response rate in a thin-film lithium niobate microdisk | |
| 2024-06-15 | |
| 发表期刊 | OPTICS LETTERS (IF:3.1[JCR-2023],3.1[5-Year]) |
| ISSN | 0146-9592 |
| EISSN | 1539-4794 |
| 卷号 | 49期号:12页码:3456-3459 |
| 发表状态 | 已发表 |
| DOI | 10.1364/OL.527579 |
| 摘要 | The photorefractive (PR) effect plays a critical role in emerging photonic technologies, including dynamic volume holography and on-chip all-optical functionalities. Nevertheless, its slow response rate has posed a significant obstacle to its practical application. Here, we experimentally demonstrate the enhancement of the PR response rate in a high-Q thin-film lithium niobate (TFLN) microdisk under UV light irradiation. At an irradiation intensity of 30 mW/cm2, the PR effect achieves a high response bandwidth of approximately 256 kHz. By employing this UV-assisted PR effect, we have achieved rapid laser-cavity locking and self-stabilization, where perturbations are automatically compensated. This technique paves the way toward real-time dynamic holography, editable photonic devices on a lithium niobate platform, and high-speed all-optical information processing. © 2024 Optica Publishing Group. |
| 关键词 | Holography Irradiation Lithium Niobium compounds Photonic devices Photoreactivity Thin films All optical Lithium niobate Microdisks On chips Photonics technology Photorefractive effects Photorefractive response Response rate Thin-films Volume holography |
| URL | 查看原文 |
| 收录类别 | EI ; SCI |
| 语种 | 英语 |
| 资助项目 | National Key Research and Development Program of China["2023YFA1407200","2023YFB3906400"] ; National Science Foun-dation of China["12274295","92050113"] |
| WOS研究方向 | Optics |
| WOS类目 | Optics |
| WOS记录号 | WOS:001254874200005 |
| 出版者 | Optica Publishing Group (formerly OSA) |
| EI入藏号 | 20242616303348 |
| EI主题词 | Optical data processing |
| EI分类号 | 542.4 Lithium and Alloys ; 549.1 Alkali Metals ; 723.2 Data Processing and Image Processing ; 741.1 Light/Optics ; 741.3 Optical Devices and Systems ; 743 Holography ; 746 Imaging Techniques |
| 原始文献类型 | Journal article (JA) |
| 文献类型 | 期刊论文 |
| 条目标识符 | https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/395977 |
| 专题 | 信息科学与技术学院 信息科学与技术学院_硕士生 信息科学与技术学院_博士生 信息科学与技术学院_PI研究组_陆娟娟组 |
| 通讯作者 | Wan, Wenjie |
| 作者单位 | 1.University of Michigan, Shanghai Jiao Tong University Joint Institute, Shanghai Jiao Tong University, Shanghai; 200240, China 2.School of Information Science and Technology, Shanghai Tech University, Shanghai; 201210, China 3.School of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai; 200240, China |
| 推荐引用方式 GB/T 7714 | Hou, Jiankun,Xue, Boyi,Ma, Ruixin,et al. UV-enhanced photorefractive response rate in a thin-film lithium niobate microdisk[J]. OPTICS LETTERS,2024,49(12):3456-3459. |
| APA | Hou, Jiankun.,Xue, Boyi.,Ma, Ruixin.,Yu, Simin.,Zhu, Yicheng.,...&Wan, Wenjie.(2024).UV-enhanced photorefractive response rate in a thin-film lithium niobate microdisk.OPTICS LETTERS,49(12),3456-3459. |
| MLA | Hou, Jiankun,et al."UV-enhanced photorefractive response rate in a thin-film lithium niobate microdisk".OPTICS LETTERS 49.12(2024):3456-3459. |
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