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Interfacial Resonance States-Induced Negative Tunneling Magneto-resistance in Orthogonally-Magnetized CoFeB/MgO/CoFeB
2023-07-27
状态已发表
摘要

Magnetic tunneling junctions (MTJs) are essential for non-volatile magneto-resistive random access memory (MRAM) applications. Here, we report the observation of a large negative tunneling magneto-resistance (TMR) in the CoFeB/MgO/CoFeB system with an orthogonally-magnetized configuration. Through the thickness modulation of the MgO barrier, the negative TMR component can be enhanced up to 20% under a negative voltage bias. Moreover, the tunnel anisotropic magneto-resistance measurements unveil that the negative TMR component likely arises from the interfacial resonance states (IRS) in the minority band of the bottom ferromagnetic layer. Complementary first principle calculations further quantify the IRS location and strength with respect to the Fermi level position. Our work not only confirm the vital role of IRS in the electrical transport of MTJ, but also provide valuable insights for the design of new-generation voltage-controlled MRAM and related spintronic applications.

DOIarXiv:2307.14807
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出处Arxiv
WOS记录号PPRN:74129824
WOS类目Physics, Applied
资助项目National Key R&D Program of China[
文献类型预印本
条目标识符https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/381336
专题信息科学与技术学院
信息科学与技术学院_PI研究组_寇煦丰组
物质科学与技术学院_博士生
信息科学与技术学院_硕士生
信息科学与技术学院_博士生
通讯作者Zhang, Xi-Xiang
作者单位
1.ShanghaiTech Univ, Sch Informat Sci & Technol, Shanghai 201210, Peoples R China
2.King Abdullah Univ Sci & Technol, Phys Sci & Engn Div, Thuwal 239556900, Saudi Arabia
3.Huazhong Univ Sci & Technol, Wuhan Natl High Magnet Field Ctr, Sch Phys, Wuhan 430074, Peoples R China
4.Suzhou Inston Technol Co Ltd, Suzhou 215121, Peoples R China
5.ShanghaiTech Univ, ShanghaiTech Lab Topol Phys, Shanghai 201210, Peoples R China
推荐引用方式
GB/T 7714
Huang, Puyang,Chen, Aitian,Dong, Jianting,et al. Interfacial Resonance States-Induced Negative Tunneling Magneto-resistance in Orthogonally-Magnetized CoFeB/MgO/CoFeB. 2023.
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