Effect of solvent film and zeta potential on interfacial interactions during optical glass polishing

doi:10.1364/AO.57.005657

	Effect of solvent film and zeta potential on interfacial interactions during optical glass polishing
	Liang, Shangjuan1,2,3 ; Jiao, Xiang 1; Tan, Xiaohong 1; Zhu, Jianqiang1,3
	2018-07-10
发表期刊	APPLIED OPTICS (IF:1.7[JCR-2023],1.7[5-Year])
ISSN	1559-128X
卷号	57 期号:20 页码:5657-5665
发表状态	已发表
DOI	10.1364/AO.57.005657
摘要	The deployment of polishing slurry is one of the important research topics in the field of chemical-mechanical polishing. It is expected that technological breakthroughs in this process will lead to an improvement of the surface quality of fabricated optical components. In this investigation, we added several types of electrolytes into cerium oxide polishing slurries and evaluated their influence on the material removal rate (MRR) and surface roughness (Sa) during K9 glass polishing. Furthermore, we investigated their influence on the zeta potential, particle size distribution, and suspension stability of the slurries. The results show that the introduction of an electrolyte into the polishing slurry changes not only the zeta potential of the ceria particle surface, but also the type and thickness of the deposited solvent film. The presence of a hydrophilic solvent film results in repulsion between individual particles and between the particles and the glass surface. However, a hydrophobic solvent film enhances the attraction between individual particles and between the particles and the glass surface. Moreover, thicker solvation films correspond to a greater force. This has a great impact on the interfacial interaction between the particles and the glass surface during the polishing process. The presence of the hydrophobic solvent film results in a high MRR, while the hydrophilic solvent film is associated with low Sa. In this paper, the interaction mechanisms of the abrasive particles and the glass interface during the polishing process are elucidated by considering the zeta potential and the solvent film type. In addition, a method for reducing the resulting Sa after glass polishing is proposed. (C) 2018 Optical Society of America
收录类别	SCI ; SCIE ; EI
语种	英语
资助项目	International Partnership Program of Chinese Academy of Sciences (CAS)[GJHZ1871]
WOS研究方向	Optics
WOS类目	Optics
WOS记录号	WOS:000438315500016
出版者	OPTICAL SOC AMER
EI入藏号	20183105617667
EI主题词	Cerium oxide ; Chemical mechanical polishing ; Electrolytes ; Hydrophilicity ; Hydrophobicity ; Optical glass ; Particle size ; Particle size analysis ; Slurries ; Solvents ; Surface roughness ; Zeta potential
EI分类号	Machining Operations:604.2 ; Optical Devices and Systems:741.3 ; Colloid Chemistry:801.3 ; Chemical Agents and Basic Industrial Chemicals:803 ; Physical Properties of Gases, Liquids and Solids:931.2 ; Materials Science:951
WOS关键词	CMP SLURRY ; PERFORMANCE ; SUBSTRATE ; STABILITY ; REMOVAL ; COPPER ; SALTS
原始文献类型	Article
引用统计	正在获取...
文献类型	期刊论文
条目标识符	https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/27427
专题	物质科学与技术学院物质科学与技术学院_特聘教授组_朱健强组物质科学与技术学院_硕士生
通讯作者	Zhu, Jianqiang
作者单位	1.Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Natl Lab High Power Laser & Phys, Shanghai 201800, Peoples R China 2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China 3.ShanghaiTech Univ, Sch Phys Sci & Technol, Shanghai 201210, Peoples R China
第一作者单位	物质科学与技术学院
通讯作者单位	物质科学与技术学院
推荐引用方式 GB/T 7714	Liang, Shangjuan,Jiao, Xiang,Tan, Xiaohong,et al. Effect of solvent film and zeta potential on interfacial interactions during optical glass polishing[J]. APPLIED OPTICS,2018,57(20):5657-5665.
APA	Liang, Shangjuan,Jiao, Xiang,Tan, Xiaohong,&Zhu, Jianqiang.(2018).Effect of solvent film and zeta potential on interfacial interactions during optical glass polishing.APPLIED OPTICS,57(20),5657-5665.
MLA	Liang, Shangjuan,et al."Effect of solvent film and zeta potential on interfacial interactions during optical glass polishing".APPLIED OPTICS 57.20(2018):5657-5665.