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ShanghaiTech University Knowledge Management System
Grain boundary boosting the thermal stability of Pt/CeO2 thin films | |
2022 | |
发表期刊 | NANO RESEARCH (IF:9.5[JCR-2023],9.0[5-Year]) |
ISSN | 1998-0124 |
EISSN | 1998-0000 |
卷号 | 16期号:2页码:3278-3286 |
发表状态 | 已发表 |
DOI | 10.1007/s12274-022-4899-9 |
摘要 | Understanding how defect chemistry of oxide material influences the thermal stability of noble metal dopant ions plays an important role in designing high-performance heterogeneous catalytic systems. Here we use in-situ ambient-pressure X-ray photoemission spectroscopy (APXPS) to experimentally determine the role of grain boundary in the thermal stability of platinum doped cerium oxide (Pt/CeO2). The grain boundaries were introduced in Pt/CeO2 thin films by pulsed laser deposition without significantly change of the surface microstructure. The defect level was tuned by the strain field obtained using a highly/low mismatched substrate. The Pt/CeO2 thin film models having well defined crystallographic properties but different grain boundary structural defect levels provide an ideal platform for exploring the evolution of Pt-O-Ce bond with changing the temperature in reducing conditions. We have direct demonstration and explanation of the role of Ce3+ induced by grain boundaries in enhancing Pt2+ stability. We observe that the Pt2+-O-Ce3+ bond provides an ideal coordinated site for anchoring of Pt2+ ions and limits the further formation of oxygen vacancies during the reduction with H-2. Our findings demonstrate the importance of grain boundary in the atomic-scale design of thermally stable catalytic active sites. |
关键词 | platinum doped cerium oxide (Pt/CeO2) pulsed laser deposition epitaxial thin films grain boundaries defect engineering in-situ ambient-pressure X-ray photoemission spectroscopy |
URL | 查看原文 |
收录类别 | SCI ; SCOPUS ; SCIE ; EI |
语种 | 英语 |
资助项目 | Natural Science Foundation of China[11227902] ; Shanghai Key Research Program[20ZR1436700] |
WOS研究方向 | Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics |
WOS类目 | Chemistry, Physical ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied |
WOS记录号 | WOS:000853447000004 |
出版者 | TSINGHUA UNIV PRESS |
EI入藏号 | 20223812769590 |
EI主题词 | Cerium oxide |
EI分类号 | 531 Metallurgy and Metallography ; 547.1 Precious Metals ; 641.1 Thermodynamics ; 741.3 Optical Devices and Systems ; 744.1 Lasers, General ; 744.9 Laser Applications ; 801 Chemistry ; 804.2 Inorganic Compounds ; 933.1 Crystalline Solids ; 951 Materials Science |
原始文献类型 | Journal article (JA) |
引用统计 | 正在获取...
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文献类型 | 期刊论文 |
条目标识符 | https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/231973 |
专题 | 物质科学与技术学院_博士生 物质科学与技术学院_PI研究组_杨永组 物质科学与技术学院_PI研究组_杨波组 物质科学与技术学院_PI研究组_杨楠组 物质科学与技术学院_PI研究组_于奕组 物质科学与技术学院_硕士生 |
通讯作者 | Aruta, Carmela; Yang, Nan |
作者单位 | 1.ShanghaiTech Univ, Sch Phys Sci & Technol, Electrochem Thin Film Grp, Shanghai 201210, Peoples R China 2.Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China 3.ShanghaiTech Univ, Sch Phys Sci & Technol, Shanghai 201210, Peoples R China 4.TASC Natl Lab, CNR IOM, I-34149 Trieste, Italy 5.UOS Roma, CNR Spin, Area Ric Tor Vergata, I-00133 Rome, Italy |
第一作者单位 | 物质科学与技术学院 |
通讯作者单位 | 物质科学与技术学院 |
第一作者的第一单位 | 物质科学与技术学院 |
推荐引用方式 GB/T 7714 | Wang, Luyao,Li, Xiaobao,Hu, Xiangcheng,et al. Grain boundary boosting the thermal stability of Pt/CeO2 thin films[J]. NANO RESEARCH,2022,16(2):3278-3286. |
APA | Wang, Luyao.,Li, Xiaobao.,Hu, Xiangcheng.,Chen, Shuyue.,Qiu, Zhehao.,...&Yang, Nan.(2022).Grain boundary boosting the thermal stability of Pt/CeO2 thin films.NANO RESEARCH,16(2),3278-3286. |
MLA | Wang, Luyao,et al."Grain boundary boosting the thermal stability of Pt/CeO2 thin films".NANO RESEARCH 16.2(2022):3278-3286. |
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