Precision fabrication of diamond micro-optic elements with hybrid SiO2/Cr etching masks

doi:10.1016/j.mee.2022.111818

	Precision fabrication of diamond micro-optic elements with hybrid SiO2/Cr etching masks
	Yang, Zhiqi1 ; Zhu, Ruixue1 ; Zhang, Kaiyu 2; Yang, Xiaowei1 ; Liu, Xing 2; Weng, Tsu-chien1
	2022-06-01
发表期刊	MICROELECTRONIC ENGINEERING (IF:2.6[JCR-2023],2.5[5-Year])
ISSN	0167-9317
EISSN	1873-5568
卷号	262
发表状态	已发表
DOI	10.1016/j.mee.2022.111818
摘要	Diamond is opted for high-power optical systems due to excellent optical transparency, radiation, and thermal resistance, while the fabrication of micro-structures on diamond falls behind. Here we report a reliable fabri-cation method of diamond and fabricate a laminar grating with 2.90 mu m period and 3.08 mu m groove depth by directly laser writing(DLW) and reactive ions etching (RIE). We presented a micro-masks-less and high-temperature hybrid masks of diamond etching with dielectric SiO2 mask and Cr adhesive layer. We developed a statistical analysis method using Hough transform on SEM images, which could provide the quantitative results and monitor the variation of structures during fabrication process. The grating presents 28% diffraction efficiency in the 0th order and 9% in the +/- 1st order at 405 nm wavelength. The results of diffraction experiment are in close agreement with the rigorous coupled wave (RCWA) simulation.
关键词	Diamong micro-optic element Plasma etching Dielectric etching mask Hough line detection Directly laser writing
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收录类别	SCI ; EI ; SCIE
语种	英语
资助项目	National Natural Science Foundation of China[21727801,11805127] ; Fundamental Research Funds for the Central Universities[2019F0201-000-10] ; Shanghai Municipal Science and Technology Major Project[2017SHZDZX02] ; Shanghai Sailing Program[22YF1454600]
WOS研究方向	Engineering ; Science & Technology - Other Topics ; Optics ; Physics
WOS类目	Engineering, Electrical & Electronic ; Nanoscience & Nanotechnology ; Optics ; Physics, Applied
WOS记录号	WOS:000811475100001
出版者	ELSEVIER
引用统计	正在获取...
文献类型	期刊论文
条目标识符	https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/183402
专题	物质科学与技术学院物质科学与技术学院_硕士生大科学中心_PI研究组_翁祖谦组大科学中心大科学中心_公共科研平台_大科学装置建设部
通讯作者	Liu, Xing; Weng, Tsu-chien
作者单位	1.ShanghaiTech Univ, Sch Phys Sci & Technol, Shanghai 201210, Peoples R China 2.Shanghai Adv Res Inst, Photon Sci Joint Lab, Shanghai 201210, Peoples R China
第一作者单位	物质科学与技术学院
通讯作者单位	物质科学与技术学院
第一作者的第一单位	物质科学与技术学院
推荐引用方式 GB/T 7714	Yang, Zhiqi,Zhu, Ruixue,Zhang, Kaiyu,et al. Precision fabrication of diamond micro-optic elements with hybrid SiO2/Cr etching masks[J]. MICROELECTRONIC ENGINEERING,2022,262.
APA	Yang, Zhiqi,Zhu, Ruixue,Zhang, Kaiyu,Yang, Xiaowei,Liu, Xing,&Weng, Tsu-chien.(2022).Precision fabrication of diamond micro-optic elements with hybrid SiO2/Cr etching masks.MICROELECTRONIC ENGINEERING,262.
MLA	Yang, Zhiqi,et al."Precision fabrication of diamond micro-optic elements with hybrid SiO2/Cr etching masks".MICROELECTRONIC ENGINEERING 262(2022).