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ShanghaiTech University Knowledge Management System
Large Photomultiplication by Charge-Self-Trapping for High-Response Quantum Dot Infrared Photodetectors | |
2022-03-30 | |
发表期刊 | ACS APPLIED MATERIALS AND INTERFACES (IF:8.3[JCR-2023],8.7[5-Year]) |
ISSN | 1944-8244 |
EISSN | 1944-8252 |
卷号 | 14期号:12 |
发表状态 | 已发表 |
DOI | 10.1021/acsami.2c01046 |
摘要 | PbS colloidal quantum dots (CQDs) are emerging as promising candidates for next-generation, low-cost, and high-performance infrared photodetectors. Recently, photomultiplication has been explored to improve the detectivity of CQD infrared photodetectors by doping charge-trapping material into a matrix. However, this relies on remote doping that could influence carrier transfer giving rise to limited photomultiplication. Herein, a charge-self-trapped ZnO layer is prepared by a surface reaction between acid and ZnO. Photogenerated electrons trapped by oxygen vacancy defects at the ZnO surface generate a strong interfacial electrical field and induce large photomultiplication at extremely low bias. A PbS CQD infrared photodiode based on this structure shows a response (R) of 77.0 A·W-1 and specific detectivity of 1.5 × 1011 Jones at 1550 nm under a -0.3 V bias. This self-trapped ZnO layer can be applied to other photodetectors such as perovskite-based devices. © 2022 American Chemical Society. All rights reserved. |
关键词 | II-VI semiconductors Infrared detectors IV-VI semiconductors Lead compounds Nanocrystals Oxygen Perovskite Photons Semiconductor quantum dots Surface reactions Zinc oxide Colloidal quantum dots High response Infrared photodetector Low-high PbS quantum dots Photomultiplication Quantum dots infrared photodetectors Self-trapping ZnO layers ZnO nanocrystal |
学科领域 | 材料科学 |
收录类别 | SCI ; EI ; SCIE |
语种 | 英语 |
资助项目 | National Key Research and Development Program of China[2021YFA0715502] ; National Natural Science Foundation of China[92056119,61935016,62004125, |
WOS研究方向 | Science & Technology - Other Topics ; Materials Science |
WOS类目 | Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary |
WOS记录号 | WOS:000787374700078 |
出版者 | American Chemical Society |
EI入藏号 | 20221411906529 |
EI主题词 | Oxygen vacancies |
EI分类号 | 482.2 Minerals ; 712.1 Semiconducting Materials ; 714.2 Semiconductor Devices and Integrated Circuits ; 761 Nanotechnology ; 802.2 Chemical Reactions ; 804 Chemical Products Generally ; 804.2 Inorganic Compounds ; 931.3 Atomic and Molecular Physics ; 933.1 Crystalline Solids ; 944.7 Radiation Measuring Instruments |
原始文献类型 | Article in Press |
引用统计 | 正在获取...
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文献类型 | 期刊论文 |
条目标识符 | https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/169314 |
专题 | 物质科学与技术学院 物质科学与技术学院_PI研究组_宁志军组 物质科学与技术学院_PI研究组_薛加民组 信息科学与技术学院_PI研究组_陈佰乐组 物质科学与技术学院_硕士生 物质科学与技术学院_博士生 大科学中心_PI研究组_翁祖谦组 |
共同第一作者 | Ke, Liang; Dou, Hongbin; Xu, Rui |
通讯作者 | Li, Lin; Ning, Zhijun |
作者单位 | 1.School of Physical Science and Technology, ShanghaiTech University, 393 Middle Huaxia Road, Pudong, Shanghai; 201210, China; 2.Center for Transformative Science, ShanghaiTech University, 393 Middle Huaxia, Pudong, Shanghai; 201210, China; 3.School of Information Science and Technology, ShanghaiTech University, 393 Middle Huaxia Road, Pudong, Shanghai; 201210, China; 4.State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai; 200050, China |
第一作者单位 | 物质科学与技术学院 |
通讯作者单位 | 物质科学与技术学院; 上海科技大学 |
第一作者的第一单位 | 物质科学与技术学院 |
推荐引用方式 GB/T 7714 | Xu, Kaimin,Ke, Liang,Dou, Hongbin,et al. Large Photomultiplication by Charge-Self-Trapping for High-Response Quantum Dot Infrared Photodetectors[J]. ACS APPLIED MATERIALS AND INTERFACES,2022,14(12). |
APA | Xu, Kaimin.,Ke, Liang.,Dou, Hongbin.,Xu, Rui.,Zhou, Wenjia.,...&Ning, Zhijun.(2022).Large Photomultiplication by Charge-Self-Trapping for High-Response Quantum Dot Infrared Photodetectors.ACS APPLIED MATERIALS AND INTERFACES,14(12). |
MLA | Xu, Kaimin,et al."Large Photomultiplication by Charge-Self-Trapping for High-Response Quantum Dot Infrared Photodetectors".ACS APPLIED MATERIALS AND INTERFACES 14.12(2022). |
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