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Tuning phase transitions in FeSe thin flakes by field-effect transistor with solid ion conductor as the gate dielectric | |
2017-01-30 | |
发表期刊 | PHYSICAL REVIEW B |
ISSN | 2469-9950 |
卷号 | 95期号:2 |
发表状态 | 已发表 |
DOI | 10.1103/PhysRevB.95.020503 |
摘要 | We have developed a field-effect transistor (FET) device using a solid ion conductor (SIC) as the gate dielectric, which can tune the carrier density of FeSe by driving lithium ions in and out of the FeSe thin flakes and consequently control the physical properties and phase transitions. A dome-shaped superconducting phase diagram was mapped out with increasing Li content, with T-c similar to 46.6 K for optimal doping, and an insulating phase was reached at the extremely overdoped regime. Our study suggests that, by using a solid ion conductor as the gate dielectric, the SIC-FET device is able to induce much higher carrier doping in the bulk, suit many surface-sensitive experimental probes, and stabilize structural phases that are inaccessible in ordinary conditions. |
收录类别 | SCI ; EI |
语种 | 英语 |
资助项目 | Hefei Science Center CAS[2016HSC-IU001] |
WOS研究方向 | Materials Science ; Physics |
WOS类目 | Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter |
WOS记录号 | WOS:000400593700001 |
出版者 | AMER PHYSICAL SOC |
EI入藏号 | 20191906872216 |
EI主题词 | Gate dielectrics ; Ions ; Iron compounds ; Phase diagrams ; Power field effect transistors |
EI分类号 | Semiconductor Devices and Integrated Circuits:714.2 |
WOS关键词 | SINGLE-LAYER FESE ; HIGH-TEMPERATURE SUPERCONDUCTIVITY ; INSULATOR-TRANSITION ; ELECTRONIC ORIGIN ; GROUND-STATE ; FILMS ; METAL ; MOS2 |
原始文献类型 | Article |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/1527 |
专题 | 大科学中心_PI研究组_刘志组 物质科学与技术学院 |
通讯作者 | Zhang, Y. B. |
作者单位 | 1.Univ Sci & Technol China, Hefei Natl Lab Phys Sci Microscale, Hefei 230026, Anhui, Peoples R China 2.Univ Sci & Technol China, Dept Phys, Hefei 230026, Anhui, Peoples R China 3.Univ Sci & Technol China, CAS Key Lab Strongly Coupled Quantum Matter Phys, Hefei 230026, Anhui, Peoples R China 4.Nanjing Univ, Collaborat Innovat Ctr Adv Microstruct, Nanjing 210093, Jiangsu, Peoples R China 5.Univ Sci & Technol China, Natl Synchrotron Radiat Lab, Hefei 230026, Anhui, Peoples R China 6.Chinese Acad Sci, Shanghai Inst Appl Phys, Shanghai 201204, Peoples R China 7.Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China 8.Shanghai Tech Univ, Sch Phys Sci & Technol, Shanghai 200031, Peoples R China 9.Fudan Univ, State Key Lab Surface Phys, Shanghai 200433, Peoples R China 10.Fudan Univ, Dept Phys, Shanghai 200433, Peoples R China 11.Chinese Acad Sci, High Field Magnet Lab, Hefei 230031, Anhui, Peoples R China |
推荐引用方式 GB/T 7714 | Lei, B.,Wang, N. Z.,Shang, C.,et al. Tuning phase transitions in FeSe thin flakes by field-effect transistor with solid ion conductor as the gate dielectric[J]. PHYSICAL REVIEW B,2017,95(2). |
APA | Lei, B..,Wang, N. Z..,Shang, C..,Meng, F. B..,Ma, L. K..,...&Chen, X. H..(2017).Tuning phase transitions in FeSe thin flakes by field-effect transistor with solid ion conductor as the gate dielectric.PHYSICAL REVIEW B,95(2). |
MLA | Lei, B.,et al."Tuning phase transitions in FeSe thin flakes by field-effect transistor with solid ion conductor as the gate dielectric".PHYSICAL REVIEW B 95.2(2017). |
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