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Intrinsically shunted Josephson junctions with high characteristic voltage based on epitaxial NbN/TaN/NbN trilayer | |
2021-10-11 | |
发表期刊 | APPLIED PHYSICS LETTERS (IF:3.5[JCR-2023],3.5[5-Year]) |
ISSN | 0003-6951 |
EISSN | 1077-3118 |
卷号 | 119期号:15 |
发表状态 | 已发表 |
DOI | 10.1063/5.0064733 |
摘要 | We investigate the current-voltage characteristics and the interface properties of epitaxial NbN/TaN/NbN Josephson junctions in this study. The crystal structure and interface properties of the NbN/TaN/NbN junctions are determined using x-ray diffraction and cross-sectional scanning transmission electron microscopy, and the epitaxial growth of the NbN/TaN/NbN trilayer exhibited a smooth and clear interface. The characteristic voltage can be easily tuned over more than one or two orders of magnitude by precisely and independently controlling the barrier thickness and resistivity. For the barrier resistivity of 79 m omega cm, the junctions show excellent Josephson properties with a characteristic voltage of 2.04 & PLUSMN; 0.08 mV at 4.2 K, corresponding to a large normal metal coherence length of 2.51 & PLUSMN; 0.03 nm and a fast diffusion rate of 24.9 & PLUSMN; 0.4 mm(2)/s. A high junction quality was also confirmed by the large characteristic voltage of 0.88 & PLUSMN; 0.03 mV at 10.0 K, making the intrinsically shunted NbN junctions promising for use in higher speed and temperature-superconducting devices and circuits.
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收录类别 | SCIE ; EI |
语种 | 英语 |
WOS研究方向 | Physics |
WOS类目 | Physics, Applied |
WOS记录号 | WOS:000710468000003 |
出版者 | AIP Publishing |
原始文献类型 | Article |
引用统计 | 正在获取...
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文献类型 | 期刊论文 |
条目标识符 | https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/128518 |
专题 | 物质科学与技术学院_博士生 物质科学与技术学院_特聘教授组_王镇组 物质科学与技术学院_硕士生 |
通讯作者 | Zhang, Lu |
作者单位 | 1.Chinese Acad Sci, Shanghai Inst Microsytem & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China; 2.Chinese Acad Sci, Ctr Excellence Superconducting Elect, Shanghai 200050, Peoples R China; 3.ShanghaiTech Univ, Sch Phys Sci & Technol, Shanghai 201210, Peoples R China; 4.Univ Chinese Acad Sci, Beijing 100049, Peoples R China |
第一作者单位 | 物质科学与技术学院 |
推荐引用方式 GB/T 7714 | Yan, Kaixin,Zhang, Lu,Wang, Huiwu,et al. Intrinsically shunted Josephson junctions with high characteristic voltage based on epitaxial NbN/TaN/NbN trilayer[J]. APPLIED PHYSICS LETTERS,2021,119(15). |
APA | Yan, Kaixin.,Zhang, Lu.,Wang, Huiwu.,Tao, Yuanhe.,Shi, Jiasheng.,...&Wang, Zhen.(2021).Intrinsically shunted Josephson junctions with high characteristic voltage based on epitaxial NbN/TaN/NbN trilayer.APPLIED PHYSICS LETTERS,119(15). |
MLA | Yan, Kaixin,et al."Intrinsically shunted Josephson junctions with high characteristic voltage based on epitaxial NbN/TaN/NbN trilayer".APPLIED PHYSICS LETTERS 119.15(2021). |
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