Review of 3D topological insulator thin-film growth by molecular beam epitaxy and potential applications

doi:10.1002/pssr.201307003

	Review of 3D topological insulator thin-film growth by molecular beam epitaxy and potential applications
	He, Liang; Kou, Xufeng; Wang, Kang L.
	2013
发表期刊	PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS
ISSN	1862-6254
卷号	7 期号:1-2 页码:50-63
发表状态	已发表
DOI	10.1002/pssr.201307003
关键词	Topological Insulators Molecular Beam Epitaxy Thin Films
学科领域	Physics, Condensed Matter
URL	查看原文
收录类别	SCI
语种	英语
WOS记录号	WOS:000318068800006
出版者	WILEY-V C H VERLAG GMBH
引用统计
文献类型	期刊论文
条目标识符	https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/1236
专题	个人在本单位外知识产出
作者单位	Univ Calif Los Angeles, Dept Elect Engn, Los Angeles, CA 90095 USA
推荐引用方式 GB/T 7714	He, Liang,Kou, Xufeng,Wang, Kang L.. Review of 3D topological insulator thin-film growth by molecular beam epitaxy and potential applications[J]. PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS,2013,7(1-2):50-63.
APA	He, Liang,Kou, Xufeng,&Wang, Kang L..(2013).Review of 3D topological insulator thin-film growth by molecular beam epitaxy and potential applications.PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS,7(1-2),50-63.
MLA	He, Liang,et al."Review of 3D topological insulator thin-film growth by molecular beam epitaxy and potential applications".PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS 7.1-2(2013):50-63.