An ultrasensitive molybdenum-based double-heterojunction phototransistor
2021-07-02
发表期刊NATURE COMMUNICATIONS
ISSN2041-1723
EISSN2041-1723
卷号12期号:1
发表状态已发表
DOI10.1038/s41467-021-24397-x
摘要

Two-dimensional (2D) materials are promising for next-generation photo detection because of their exceptional properties such as a strong interaction with light, electronic and optical properties that depend on the number of layers, and the ability to form hybrid structures. However, the intrinsic detection ability of 2D material-based photodetectors is low due to their atomic thickness. Photogating is widely used to improve the responsivity of devices, which usually generates large noise current, resulting in limited detectivity. Here, we report a molybdenum-based phototransistor with MoS2 channel and alpha -MoO3-x contact electrodes. The device works in a photo-induced barrier-lowering (PIBL) mechanism and its double heterojunctions between the channel and the electrodes can provide positive feedback to each other. As a result, a detectivity of 9.8x10(16)cm Hz(1/2) W-1 has been achieved. The proposed double heterojunction PIBL mechanism adds to the techniques available for the fabrication of 2D material-based phototransistors with an ultrahigh photosensitivity. Here, the authors exploit a photo-induced barrier-lowering mechanism in MoS2/ alpha -MoO3-x heterojunctions to realize two-dimensional phototransistors with enhanced performance and fast response at low bias voltage.

关键词研究论文
学科门类理学 ; 工学
URL查看原文
收录类别SCI ; SCIE
语种英语
WOS研究方向Science & Technology - Other Topics
WOS类目Multidisciplinary Sciences
WOS记录号WOS:000672164300007
出版者NATURE RESEARCH
原始文献类型Article
引用统计
文献类型期刊论文
条目标识符https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/127731
专题物质科学与技术学院_博士生
共同第一作者Liu, Chi
通讯作者Yin, Lichang; Wang, Xiaomu; Cheng, Hui-Ming; Sun, Dong-Ming
作者单位
1.Chinese Acad Sci, Shenyang Natl Lab Mat Sci, Inst Met Res, Shenyang, Peoples R China;
2.ShanghaiTech Univ, Sch Phys Sci & Technol, Shanghai, Peoples R China;
3.Univ Sci & Technol China, Sch Mat Sci & Engn, Hefei, Peoples R China;
4.Nanjing Univ, Natl Lab Solid State Microstruct, Sch Elect Sci & Engn, Collaborat Innovat Ctr Adv Microstruct,Sch Phys, Nanjing, Peoples R China;
5.Henan Univ, Henan Key Lab Photovolta Mat, Kaifeng, Peoples R China;
6.Tsinghua Univ, Shenzhen Geim Graphene Ctr, Tsinghua Berkeley Shenzhen Inst, Shenzhen, Peoples R China
第一作者单位物质科学与技术学院
推荐引用方式
GB/T 7714
Feng, Shun,Liu, Chi,Zhu, Qianbing,et al. An ultrasensitive molybdenum-based double-heterojunction phototransistor[J]. NATURE COMMUNICATIONS,2021,12(1).
APA Feng, Shun.,Liu, Chi.,Zhu, Qianbing.,Su, Xin.,Qian, Wangwang.,...&Sun, Dong-Ming.(2021).An ultrasensitive molybdenum-based double-heterojunction phototransistor.NATURE COMMUNICATIONS,12(1).
MLA Feng, Shun,et al."An ultrasensitive molybdenum-based double-heterojunction phototransistor".NATURE COMMUNICATIONS 12.1(2021).
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