KMS

浏览/检索结果: 共5条,第1-5条 帮助

已选(0)清除 条数/页:   排序方式:
Understanding the mechanism of plasma etching of carbon-doped GeSbTe phase change material 期刊论文
APPLIED SURFACE SCIENCE, 2024, 卷号: 671
作者:  Liu, Jin;  Zhang, Jiarui;  Wan, Ziqi;  Chen, Yuqing;  Zheng, Jia
Adobe PDF(2695Kb)  |  收藏  |  浏览/下载:470/4  |  提交时间:2024/08/09
Piezoelectric Micromachined Ultrasonic Transducers with Micro-Hole Inter-Etch and Sealing Process on (111) Silicon Wafer 期刊论文
MICROMACHINES, 2024, 卷号: 15, 期号: 4
作者:  Wang, Yunhao
Adobe PDF(5053Kb)  |  收藏  |  浏览/下载:429/55  |  提交时间:2024/05/11
The study and optimization of ICP deep etching at a low-temperature for InP solid-immersion metalens fabrication 期刊论文
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2023, 卷号: 166
作者:  Zhu, Yicheng;  Wang, Wenjuan;  Zhou, Min;  Qu, Huidan;  Li, Guanhai
Adobe PDF(6984Kb)  |  收藏  |  浏览/下载:482/1  |  提交时间:2023/07/28
PMUT Structure Design with a Scar-Free Minimally Invasive Surgery Process on (111) Silicon Wafer 会议论文
2022 IEEE INTERNATIONAL ULTRASONICS SYMPOSIUM (IEEE IUS), null,Venice,ITALY, OCT 10-13, 2022
作者:  Wu, Sheng;  Li, Wei;  Shao, Shuai;  Yang, Heng;  Wu, Tao
Adobe PDF(372Kb)  |  收藏  |  浏览/下载:530/4  |  提交时间:2023/02/10
A comparative study of selective dry and wet etching of germanium tin (Ge1-xSnx) on germanium 期刊论文
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2018, 卷号: 33, 期号: 8
作者:  Han, Yi;  Li, Yaoyao;  Song, Yuxin;  Chi, Chaodan;  Zhang, Zhenpu
Adobe PDF(1895Kb)  |  收藏  |  浏览/下载:560/1  |  提交时间:2018/08/09
  • 首页
  • 上一页
  • 1
  • 下一页
  • 末页