An improved soft-thresholding exit wave reconstruction for imaging beam-sensitive materials
2025-08
发表期刊ULTRAMICROSCOPY (IF:2.1[JCR-2023],2.3[5-Year])
ISSN0304-3991
EISSN1879-2723
卷号274
发表状态已发表
DOI10.1016/j.ultramic.2025.114154
摘要

High-resolution transmission electron microscopy (HRTEM) is a widely-used technique for atomic-scale characterization. However, the conventional dose of HRTEM can destroy beam-sensitive materials such as organic-inorganic halide perovskites. CH3NH3PbI3 (MAPbI(3)), a typical perovskite, will be easily damaged after irradiated with the dose of similar to 10(2) e-/& Aring;(2). Low-dose imaging techniques can protect the specimen but it is difficult to achieve an image which is both directly interpreted and atomically clear. Exit wave reconstruction (EWR), as one of phase retrieval methods, can recover an interpretable phase image at the atomic scale but its signal-to-noise ratio (SNR) is limited by low electron doses. Here, we improve the iterative wave function reconstruction (IWFR) method and present a soft-thresholding L-1-IWFR. Results from both simulated and experimental focal-series dataset at the extremely low dose show that L-1-IWFR improves the SNR effectively and has better performance on low-dose datasets than IWFR. Combined with low-dose imaging techniques and various alignment strategies, an atomically clear image of CH3NH3PbI3 (MAPbI(3)) is successfully achieved at the total dose of similar to 45 e(-)/& Aring;(2).

关键词High-resolution transmission electron microscopy Exit wave reconstruction Phase retrieval Low-dose imaging Organic-inorganic halide perovskites
URL查看原文
收录类别SCI ; EI
语种英语
资助项目National Natural Science Foundation of China[52222311]
WOS研究方向Microscopy
WOS类目Microscopy
WOS记录号WOS:001491278400001
出版者ELSEVIER
EI入藏号20251918389166
EI主题词Electron microscopy
EI分类号1301.3.1 Microscopy
原始文献类型Journal article (JA)
文献类型期刊论文
条目标识符https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/533645
专题物质科学与技术学院
物质科学与技术学院_PI研究组_于奕组
物质科学与技术学院_博士生
通讯作者Yu, Yi
作者单位
1.ShanghaiTech Univ, Sch Phys Sci & Technol, Shanghai 201210, Peoples R China
2.ShanghaiTech Univ, Shanghai Key Lab High Resolut Electron Microscopy, Shanghai 201210, Peoples R China
3.Univ Sci & Technol China, Sch Chem & Mat Sci, Key Lab Precis & Intelligent Chem, Dept Mat Sci & Engn, Hefei 230026, Peoples R China
第一作者单位物质科学与技术学院;  上海科技大学
通讯作者单位物质科学与技术学院;  上海科技大学
第一作者的第一单位物质科学与技术学院
推荐引用方式
GB/T 7714
Shi, Hongsheng,Lu, Yuan,Wang, Zeyu,et al. An improved soft-thresholding exit wave reconstruction for imaging beam-sensitive materials[J]. ULTRAMICROSCOPY,2025,274.
APA Shi, Hongsheng,Lu, Yuan,Wang, Zeyu,Zhang, Shuchen,&Yu, Yi.(2025).An improved soft-thresholding exit wave reconstruction for imaging beam-sensitive materials.ULTRAMICROSCOPY,274.
MLA Shi, Hongsheng,et al."An improved soft-thresholding exit wave reconstruction for imaging beam-sensitive materials".ULTRAMICROSCOPY 274(2025).
条目包含的文件
文件名称/大小 文献类型 版本类型 开放类型 使用许可
个性服务
查看访问统计
谷歌学术
谷歌学术中相似的文章
[Shi, Hongsheng]的文章
[Lu, Yuan]的文章
[Wang, Zeyu]的文章
百度学术
百度学术中相似的文章
[Shi, Hongsheng]的文章
[Lu, Yuan]的文章
[Wang, Zeyu]的文章
必应学术
必应学术中相似的文章
[Shi, Hongsheng]的文章
[Lu, Yuan]的文章
[Wang, Zeyu]的文章
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。