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Electrical activities of sulfur dopants in GaAs introduced by self-assembled molecular monolayers | |
2025-03-28 | |
发表期刊 | JOURNAL OF APPLIED PHYSICS (IF:2.7[JCR-2023],2.6[5-Year]) |
ISSN | 0021-8979 |
EISSN | 1089-7550 |
卷号 | 137期号:12 |
发表状态 | 已发表 |
DOI | 10.1063/5.0243124 |
摘要 | Self-assembled molecular monolayer doping remains as a research focus for its nature of being conformal, nondestructive, and self-limiting. However, the carrying molecules may contaminate the substrate and electrically deactivate the dopants. In this work, we investigate the electrical activities of sulfur dopants in GaAs introduced by the self-assembled molecular monolayer doping technique. The results from secondary ion mass spectrometry and low-temperature Hall measurements show that the activation energy of sulfur dopants is 68 meV, and that 91% of these dopants introduced into GaAs by the self-assembled molecular monolayer doping technique are electrically active. The impact of the carrying molecular contamination is minimal. We employ this monolayer doping technique to create a PN junction diode on a p-type GaAs substrate. The PN junction diode exhibits an outstanding performance with an ideality factor of 1.26 and a rectification ratio up to 104 within the bias of +/- 0.6 V. |
关键词 | Electric rectifiers Gallium arsenide Molecular docking Molecules Secondary ion mass spectrometry Self assembled monolayers Semiconducting gallium arsenide Semiconductor doping Silicon wafers Surface discharges Doping techniques Electrical activities GaAs Hall measurements Junction diode Lows-temperatures Molecular monolayer Non destructive Research focus Secondary ion-mass spectrometry |
URL | 查看原文 |
收录类别 | SCI ; EI |
语种 | 英语 |
资助项目 | National Science Foundation of China (NSFC)[ |
WOS研究方向 | Physics |
WOS类目 | Physics, Applied |
WOS记录号 | WOS:001451321000012 |
出版者 | AIP Publishing |
EI入藏号 | 20251318127374 |
EI主题词 | III-V semiconductors |
EI分类号 | 208.4 Thin films ; 701.1 Electricity: Basic Concepts and Phenomena ; 704.2 Electric Equipment ; 712.1 Semiconducting Materials ; 712.1.2 Compound Semiconducting Materials ; 714.2 Semiconductor Devices and Integrated Circuits ; 804 Chemical Products ; 805 Chemical Engineering ; 1106.1 Computer Programming ; 1301.1.3 Atomic and Molecular Physics ; 1301.1.3.1 Spectroscopy |
原始文献类型 | Journal article (JA) |
文献类型 | 期刊论文 |
条目标识符 | https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/514078 |
专题 | 生物医学工程学院 物质科学与技术学院_本科生 生物医学工程学院_PI研究组_赖晓春组 |
通讯作者 | Dan, Yaping |
作者单位 | 1.Univ Michigan, Shanghai Jiao Tong Univ, Joint Inst, Shanghai 200240, Peoples R China 2.Shanghai Jiao Tong Univ, Sch Elect Informat & Elect Engn, Dept Micro Nano Elect, Shanghai 200240, Peoples R China 3.Shanghai United Imaging Healthcare Adv Technol Res, Shanghai 201807, Peoples R China 4.ShanghaiTech Univ, Sch Biomed Engn, Photon Sensing & Imaging Lab, Shanghai 201210, Peoples R China 5.Shanghai Polytech Univ, Sch Energy & Mat, Shanghai 201209, Peoples R China 6.Chinese Acad Sci, Inst Semicond, State Key Lab Superlatt & Microstruct, Beijing 100083, Peoples R China 7.Shanghai Clin Res & Trial Ctr, Shanghai 201210, Peoples R China |
推荐引用方式 GB/T 7714 | Fan, Zhengfang,Liu, Yumeng,Wang, Yizhuo,et al. Electrical activities of sulfur dopants in GaAs introduced by self-assembled molecular monolayers[J]. JOURNAL OF APPLIED PHYSICS,2025,137(12). |
APA | Fan, Zhengfang.,Liu, Yumeng.,Wang, Yizhuo.,Wei, Hao.,Li, He.,...&Dan, Yaping.(2025).Electrical activities of sulfur dopants in GaAs introduced by self-assembled molecular monolayers.JOURNAL OF APPLIED PHYSICS,137(12). |
MLA | Fan, Zhengfang,et al."Electrical activities of sulfur dopants in GaAs introduced by self-assembled molecular monolayers".JOURNAL OF APPLIED PHYSICS 137.12(2025). |
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