High-sensitivity inspection of the ultra-low-density defects in thin films using dark-field spatial correlation spectrum
2025-04-01
发表期刊PHYSICA SCRIPTA (IF:2.6[JCR-2023],2.3[5-Year])
ISSN0031-8949
EISSN1402-4896
卷号100期号:4
DOI10.1088/1402-4896/adbf6b
摘要A high-sensitivity inspection method for ultra-low-density defects in the thin films is presented by performing spatial correlation calculations on the x-ray dark-field scattering. The sensitivity of defect inspection is theoretically analyzed under varying exposure times and defect thicknesses. The simulation results demonstrate a 25 times increase in inspection sensitivity compared to scanning scattering contrast microscopy (SSCM). An experiment was performed at the Shanghai Synchrotron Radiation Facility and a 56 nm particle defect was successfully inspected with the sensitivity of 8.3. Both theoretical and experimental results indicate that the dark-field spatial correlation spectrum method holds significant potential for advanced defect inspection.
关键词thin film defect defect inspection correlation spectrum
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收录类别SCI
语种英语
资助项目Key R&D Program of China[2021YFA1601003]
WOS研究方向Physics
WOS类目Physics, Multidisciplinary
WOS记录号WOS:001451749600001
出版者IOP Publishing Ltd
文献类型期刊论文
条目标识符https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/503630
专题物质科学与技术学院_硕士生
作者单位
1.中国科学院上海高等研究院
2.上海科技大学
第一作者单位上海科技大学
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Li XL. High-sensitivity inspection of the ultra-low-density defects in thin films using dark-field spatial correlation spectrum[J]. PHYSICA SCRIPTA,2025,100(4).
APA Li XL.(2025).High-sensitivity inspection of the ultra-low-density defects in thin films using dark-field spatial correlation spectrum.PHYSICA SCRIPTA,100(4).
MLA Li XL."High-sensitivity inspection of the ultra-low-density defects in thin films using dark-field spatial correlation spectrum".PHYSICA SCRIPTA 100.4(2025).
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