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Study on area-dependent multiplication region width and optimization of HgCdTe avalanche focal plane | |
2025-06-01 | |
发表期刊 | INFRARED PHYSICS & TECHNOLOGY (IF:3.1[JCR-2023],3.0[5-Year]) |
ISSN | 1350-4495 |
EISSN | 1879-0275 |
卷号 | 147 |
发表状态 | 已发表 |
DOI | 10.1016/j.infrared.2025.105781 |
摘要 | Linear-mode HgCdTe avalanche photodiodes (APDs) have attracted significant attention due to their exceptionally low excess noise, operational bias ranging from-12 to 0 V, and linearly tunable gain. These characteristics suggest promising future applications in optical observations. The design of the multiplication region based on the PIN structure is critical, as it directly influences the photoelectric properties of the device, including gain and excess noise. This paper primarily investigates the effect of implanted areas on the multiplication region and examines area-related gain and noise characteristics of mid-wavelength infrared (MWIR) HgCdTe APDs at a temperature of 80 K. Studies conducted on diodes with varying implanted areas indicate that those with larger implanted areas create a wider multiplication region, which leads to lower gain and higher excess noise factors. Finally, 30 mu m pitch 640 x 512 array HgCdTe APDs for cut-off wavelengths 4.8 mu m at 80 K corresponding to compositions xCd = 0.31 were fabricated. The number of noise bad pixels and the band-to-band tunneling (BBT) current have been significantly reduced due to the optimized the multiplication region width. Consequently, high-definition imaging under short integration times has been successfully achieved. |
关键词 | HgCdTe APD Multiplication region Implanted area Focal plane |
URL | 查看原文 |
收录类别 | SCI ; EI |
语种 | 英语 |
资助项目 | National Natural Science Foundation of China[ |
WOS研究方向 | Instruments & Instrumentation ; Optics ; Physics |
WOS类目 | Instruments & Instrumentation ; Optics ; Physics, Applied |
WOS记录号 | WOS:001433381600001 |
出版者 | ELSEVIER |
EI入藏号 | 20250817932468 |
EI主题词 | Avalanche photodiodes |
EI分类号 | 202.9.3 Others, including Bismuth, Boron, Cadmium, Cobalt, Mercury, Niobium, Selenium, Silicon, Tellurium and Zirconium - 701.1 Electricity: Basic Concepts and Phenomena - 712.1.2 Compound Semiconducting Materials - 714.2 Semiconductor Devices and Integrated Circuits - 741.1 Light/Optics |
原始文献类型 | Journal article (JA) |
文献类型 | 期刊论文 |
条目标识符 | https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/496863 |
专题 | 信息科学与技术学院 信息科学与技术学院_特聘教授组_何力组 |
通讯作者 | Xie, Hao; Chen, Lu |
作者单位 | 1.Chinese Acad Sci, Shanghai Inst Tech Phys, Natl Key Lab Infrared Detect Technol, 500 Yu Tian Rd, Shanghai 200083, Peoples R China 2.ShanghaiTech Univ, Sch Informat Sci & Technol, 393 Middle Huaxia Rd, Shanghai 201210, Peoples R China |
推荐引用方式 GB/T 7714 | Xie, Hao,Li, Hui,Yang, Liao,et al. Study on area-dependent multiplication region width and optimization of HgCdTe avalanche focal plane[J]. INFRARED PHYSICS & TECHNOLOGY,2025,147. |
APA | Xie, Hao.,Li, Hui.,Yang, Liao.,Guo, Huijun.,Shen, Chuan.,...&He, Li.(2025).Study on area-dependent multiplication region width and optimization of HgCdTe avalanche focal plane.INFRARED PHYSICS & TECHNOLOGY,147. |
MLA | Xie, Hao,et al."Study on area-dependent multiplication region width and optimization of HgCdTe avalanche focal plane".INFRARED PHYSICS & TECHNOLOGY 147(2025). |
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