Study on area-dependent multiplication region width and optimization of HgCdTe avalanche focal plane
2025-06-01
发表期刊INFRARED PHYSICS & TECHNOLOGY (IF:3.1[JCR-2023],3.0[5-Year])
ISSN1350-4495
EISSN1879-0275
卷号147
发表状态已发表
DOI10.1016/j.infrared.2025.105781
摘要

Linear-mode HgCdTe avalanche photodiodes (APDs) have attracted significant attention due to their exceptionally low excess noise, operational bias ranging from-12 to 0 V, and linearly tunable gain. These characteristics suggest promising future applications in optical observations. The design of the multiplication region based on the PIN structure is critical, as it directly influences the photoelectric properties of the device, including gain and excess noise. This paper primarily investigates the effect of implanted areas on the multiplication region and examines area-related gain and noise characteristics of mid-wavelength infrared (MWIR) HgCdTe APDs at a temperature of 80 K. Studies conducted on diodes with varying implanted areas indicate that those with larger implanted areas create a wider multiplication region, which leads to lower gain and higher excess noise factors. Finally, 30 mu m pitch 640 x 512 array HgCdTe APDs for cut-off wavelengths 4.8 mu m at 80 K corresponding to compositions xCd = 0.31 were fabricated. The number of noise bad pixels and the band-to-band tunneling (BBT) current have been significantly reduced due to the optimized the multiplication region width. Consequently, high-definition imaging under short integration times has been successfully achieved.

关键词HgCdTe APD Multiplication region Implanted area Focal plane
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收录类别SCI ; EI
语种英语
资助项目National Natural Science Foundation of China[
WOS研究方向Instruments & Instrumentation ; Optics ; Physics
WOS类目Instruments & Instrumentation ; Optics ; Physics, Applied
WOS记录号WOS:001433381600001
出版者ELSEVIER
EI入藏号20250817932468
EI主题词Avalanche photodiodes
EI分类号202.9.3 Others, including Bismuth, Boron, Cadmium, Cobalt, Mercury, Niobium, Selenium, Silicon, Tellurium and Zirconium - 701.1 Electricity: Basic Concepts and Phenomena - 712.1.2 Compound Semiconducting Materials - 714.2 Semiconductor Devices and Integrated Circuits - 741.1 Light/Optics
原始文献类型Journal article (JA)
文献类型期刊论文
条目标识符https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/496863
专题信息科学与技术学院
信息科学与技术学院_特聘教授组_何力组
通讯作者Xie, Hao; Chen, Lu
作者单位
1.Chinese Acad Sci, Shanghai Inst Tech Phys, Natl Key Lab Infrared Detect Technol, 500 Yu Tian Rd, Shanghai 200083, Peoples R China
2.ShanghaiTech Univ, Sch Informat Sci & Technol, 393 Middle Huaxia Rd, Shanghai 201210, Peoples R China
推荐引用方式
GB/T 7714
Xie, Hao,Li, Hui,Yang, Liao,et al. Study on area-dependent multiplication region width and optimization of HgCdTe avalanche focal plane[J]. INFRARED PHYSICS & TECHNOLOGY,2025,147.
APA Xie, Hao.,Li, Hui.,Yang, Liao.,Guo, Huijun.,Shen, Chuan.,...&He, Li.(2025).Study on area-dependent multiplication region width and optimization of HgCdTe avalanche focal plane.INFRARED PHYSICS & TECHNOLOGY,147.
MLA Xie, Hao,et al."Study on area-dependent multiplication region width and optimization of HgCdTe avalanche focal plane".INFRARED PHYSICS & TECHNOLOGY 147(2025).
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