Synthesis of High-Quality Graphene and Hexagonal Boron Nitride Monolayer In-Plane Heterostructure on Cu-Ni Alloy
2017-09
发表期刊ADVANCED SCIENCE (IF:14.3[JCR-2023],16.3[5-Year])
ISSN2198-3844
卷号4期号:9
发表状态已发表
DOI10.1002/advs.201700076
摘要Graphene/hexagonal boron nitride (h-BN) monolayer in-plane heterostructure offers a novel material platform for both fundamental research and device applications. To obtain such a heterostructure in high quality via controllable synthetic approaches is still challenging. In this work, in-plane epitaxy of graphene/h-BN heterostructure is demonstrated on Cu-Ni substrates. The introduction of nickel to copper substrate not only enhances the capability of decomposing polyaminoborane residues but also promotes graphene growth via isothermal segregation. On the alloy surface partially covered by h-BN, graphene is found to nucleate at the corners of the as-formed h-BN grains, and the high growth rate for graphene minimizes the damage of graphene-growth process on h-BN lattice. As a result, high-quality graphene/h-BN in-plane heterostructure with epitaxial relationship can be formed, which is supported by extensive characterizations. Photodetector device applications are demonstrated based on the in-plane heterostructure. The success will have important impact on future research and applications based on this unique material platform.
关键词chemical vapor deposition Cu-Ni alloy graphene and h-BN in-plane heterostructures high quality
收录类别SCI
语种英语
资助项目Air Force Office of Scientific Research (AFOSR)[FA9550-14-1-0268]
WOS研究方向Chemistry ; Science & Technology - Other Topics ; Materials Science
WOS类目Chemistry, Multidisciplinary ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary
WOS记录号WOS:000411148100015
出版者WILEY
WOS关键词CHEMICAL-VAPOR-DEPOSITION ; BAND-GAP ; ATMOSPHERIC-PRESSURE ; STACKED GRAPHENE ; GROWTH ; FILMS ; INTERFACE ; DOMAINS ; LAYERS ; FOILS
原始文献类型Article
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文献类型期刊论文
条目标识符https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/4640
专题物质科学与技术学院_特聘教授组_谢晓明组
物质科学与技术学院
通讯作者Lou, Jun
作者单位
1.Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
2.CAS Ctr Excellence Superconducting Elect CENSE, Shanghai 200050, Peoples R China
3.Rice Univ, Dept Mat Sci & NanoEngn, Houston, TX 77005 USA
4.Univ Chinese Acad Sci, Sch Elect Elect & Commun Engn, Beijing 100049, Peoples R China
5.Cent S Univ, Sch Phys & Elect, Changsha 410083, Hunan, Peoples R China
6.Chinese Acad Sci, Dalian Inst Chem Phys, State Key Lab Mol React Dynam, Dalian 116023, Peoples R China
7.ShanghaiTech Univ, Sch Phys Sci & Technol, Shanghai 200031, Peoples R China
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GB/T 7714
Lu, Guangyuan,Wu, Tianru,Yang, Peng,et al. Synthesis of High-Quality Graphene and Hexagonal Boron Nitride Monolayer In-Plane Heterostructure on Cu-Ni Alloy[J]. ADVANCED SCIENCE,2017,4(9).
APA Lu, Guangyuan.,Wu, Tianru.,Yang, Peng.,Yang, Yingchao.,Jin, Zehua.,...&Jiang, Mianheng.(2017).Synthesis of High-Quality Graphene and Hexagonal Boron Nitride Monolayer In-Plane Heterostructure on Cu-Ni Alloy.ADVANCED SCIENCE,4(9).
MLA Lu, Guangyuan,et al."Synthesis of High-Quality Graphene and Hexagonal Boron Nitride Monolayer In-Plane Heterostructure on Cu-Ni Alloy".ADVANCED SCIENCE 4.9(2017).
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