Robust Topological Interface States in a Lateral Magnetic-Topological Heterostructure
2024
发表期刊SMALL (IF:13.0[JCR-2023],13.5[5-Year])
ISSN1613-6810
EISSN1613-6829
卷号21期号:8
发表状态已发表
DOI10.1002/smll.202409979
摘要Introducing uniform magnetic order in two-dimensional (2D) topological insulators by constructing heterostructures of TI and magnet is a promising way to realize the high-temperature Quantum Anomalous Hall effect. However, the topological properties of 2D materials are susceptible to several factors that make them difficult to maintain, and whether topological interface states (TISs) can exist at magnetic-topological heterostructure interfaces is largely unknown. Here, it is experimentally shown that TISs in a lateral heterostructure of CrTe2/Bi(110) are robust against disorder, defects, high magnetic fields (time-reversal symmetry-breaking perturbations), and elevated temperature (77 K). The lateral heterostructure is realized by lateral epitaxial growth of bilayer (BL) Bi to monolayer CrTe2 grown on graphite. Scanning Tunneling Microscopy and non-contact Atomic Force Microscopy demonstrate a black phosphorus-like structure with low atomic buckling (less than 0.1 Å) of the BL Bi(110), indicating the presence of its topological properties. Scanning tunneling spectroscopy and energy-dependent dI/dV mapping further confirm the existence of topologically induced one-dimensional in-gap states localized at the interface. These results demonstrate the robustness of TISs in lateral magnetic-topological heterostructures, which is competitive with those in vertically stacked magnetic-topological heterostructures and provides a promising route for constructing planar high-density non-dissipative devices using TISs. © 2024 Wiley-VCH GmbH.
关键词Layered semiconductors Nanocrystals Quantum Hall effect Topological insulators Bi-layer Interfaces state Lateral heterostructure Magnetic orders Scanning tunneling microscopy/spectroscopy Topological Topological insulators Topological properties Two-dimensional Bi(110) CrTe2 lateral heterostructure topological scanning tunneling microscopy/spectroscopy (STM/S)
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收录类别EI ; PPRN.PPRN ; SCI
语种英语
WOS研究方向Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics
WOS类目Physics, Condensed Matter
WOS记录号PPRN:118758632
出版者John Wiley and Sons Inc
EI入藏号20245017519698
EI主题词Scanning tunneling microscopy
EI分类号1004 ; 1301.3.1 ; 1301.4 ; 1301.4.1 ; 712.1.2 Compound Semiconducting Materials ; 761 Nanotechnology
原始文献类型Article in Press
文献类型期刊论文
条目标识符https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/461505
专题物质科学与技术学院
物质科学与技术学院_博士生
物质科学与技术学院_PI研究组_赵爱迪组
物质科学与技术学院_PI研究组_翟晓芳组
通讯作者Zhao, Aidi
作者单位
1.School of Physical Science and Technology, ShanghaiTech University, Shanghai; 201210, China;
2.Department of Chemical Physics, University of Science and Technology of China, Anhui, Hefei; 230026, China
第一作者单位物质科学与技术学院
通讯作者单位物质科学与技术学院
第一作者的第一单位物质科学与技术学院
推荐引用方式
GB/T 7714
Niu, Qun,Yao, Jie,Song, Quanchao,et al. Robust Topological Interface States in a Lateral Magnetic-Topological Heterostructure[J]. SMALL,2024,21(8).
APA Niu, Qun.,Yao, Jie.,Song, Quanchao.,Akber, Humaira.,Zhou, Qin.,...&Zhao, Aidi.(2024).Robust Topological Interface States in a Lateral Magnetic-Topological Heterostructure.SMALL,21(8).
MLA Niu, Qun,et al."Robust Topological Interface States in a Lateral Magnetic-Topological Heterostructure".SMALL 21.8(2024).
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