ShanghaiTech University Knowledge Management System
Water-assisted rapid growth of monolayer graphene films on SiO2/Si substrates | |
2019-07 | |
发表期刊 | CARBON |
ISSN | 0008-6223 |
卷号 | 148页码:241-248 |
发表状态 | 已发表 |
DOI | 10.1016/j.carbon.2019.03.083 |
摘要 | Metal-free growth of high-quality monolayer graphene films by chemical vapor deposition (CVD) on dielectric substrates is of great significance for the development of high-performance graphene-based electronic and optoelectronic devices. However, the existing CVD processes suffer from poor structural uniformity (or growth quality) and/or a slow growth rate due to the negligible catalytic activity of dielectric substrates. Here, we report a water-assisted CVD process for rapid growth of monolayer graphene film on SiO2/Si substrate without using metal catalysts or ultra-high temperature. Even trace amount of water enables the preferential formation of monolayer graphene films with significantly reduced structural defects. Particularly, this strategy enables the rapid growth of monolayer graphene by effectively lowering the growth kinetic barrier. We attribute the benefits of water on simultaneously improving the structural uniformity and growth rate to its mild oxidative effect and the role in accelerating the release of oxygen from the SiO2/Si substrate, respectively. Our work provides helpful information for efficient and controllable CVD growth of high-quality graphene on dielectric substrates. (C) 2019 Elsevier Ltd. All rights reserved. |
收录类别 | SCI ; SCIE ; EI |
资助项目 | Strategic Priority Research Programof Chinese Academy of Sciences[XDB30000000] |
WOS研究方向 | Chemistry ; Materials Science |
WOS类目 | Chemistry, Physical ; Materials Science, Multidisciplinary |
WOS记录号 | WOS:000468421900026 |
出版者 | PERGAMON-ELSEVIER SCIENCE LTD |
EI入藏号 | 20191506762256 |
EI主题词 | Catalyst activity ; Chemical vapor deposition ; Film growth ; Graphene ; Growth rate ; Low-k dielectric ; Monolayers ; Optoelectronic devices ; Silica |
EI分类号 | Optical Devices and Systems:741.3 ; Nanotechnology:761 ; Chemical Reactions:802.2 ; Chemical Agents and Basic Industrial Chemicals:803 ; Chemical Products Generally:804 |
WOS关键词 | BILAYER GRAPHENE ; HIGH-QUALITY |
原始文献类型 | Article |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/45588 |
专题 | 物质科学与技术学院_特聘教授组_成会明组 物质科学与技术学院_博士生 |
共同第一作者 | Ma, Lai-Peng |
通讯作者 | Cheng, Hui-Ming; Ren, Wencai |
作者单位 | 1.Chinese Acad Sci, Shenyang Natl Lab Mat Sci, Inst Met Res, Shenyang 110016, Liaoning, Peoples R China 2.ShanghaiTech Univ, Sch Phys Sci & Technol, Shanghai 200031, Peoples R China 3.Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China 4.Univ Chinese Acad Sci, Beijing 100049, Peoples R China 5.Univ Sci & Technol China, Sch Mat Sci & Engn, Shenyang 110016, Liaoning, Peoples R China 6.Tsinghua Univ, Shenzhen Geim Graphene Ctr, TBSI, Shenzhen 518055, Peoples R China |
第一作者单位 | 物质科学与技术学院 |
通讯作者单位 | 物质科学与技术学院 |
推荐引用方式 GB/T 7714 | Wei, Shijing,Ma, Lai-Peng,Chen, Mao-Lin,et al. Water-assisted rapid growth of monolayer graphene films on SiO2/Si substrates[J]. CARBON,2019,148:241-248. |
APA | Wei, Shijing.,Ma, Lai-Peng.,Chen, Mao-Lin.,Liu, Zhibo.,Ma, Wei.,...&Ren, Wencai.(2019).Water-assisted rapid growth of monolayer graphene films on SiO2/Si substrates.CARBON,148,241-248. |
MLA | Wei, Shijing,et al."Water-assisted rapid growth of monolayer graphene films on SiO2/Si substrates".CARBON 148(2019):241-248. |
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