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Heavy Boron-Doped Silicon Tunneling Inter-layer Enables Efficient Silicon Heterojunction Solar Cells | |
2024 | |
发表期刊 | ACS APPLIED MATERIALS AND INTERFACES (IF:8.3[JCR-2023],8.7[5-Year]) |
ISSN | 1944-8244 |
EISSN | 1944-8252 |
卷号 | 16期号:35页码:46889-46896 |
发表状态 | 已发表 |
DOI | 10.1021/acsami.4c07897 |
摘要 | P-type hydrogenated nanocrystalline silicon (nc-Si:H) has been used as a hole-selective layer for efficient n-type crystalline silicon heterojunction (SHJ) solar cells. However, the presence of an additional valence band offset at the interface between intrinsic amorphous hydrogenated silicon and p-type nc-Si:H films will limit the hole carrier transportation. In this work, it has been found that when a heavily boron-doped silicon oxide layer deposited with high hydrogen dilution to silane (pB) was inserted into their interface, the fill factor of SHJ solar cells increases 3% absolutely because of the reduced valence band offset and the increased opportunity to provide a hopping tunnel assisted by the doping energy level and valence band tail states. Furthermore, the additional boron incorporation in intrinsic amorphous silicon adjacent to pB helps to enhance the built-in electric field, thus increasing the hole selectivity. By these means, the power conversion efficiency was improved from 23.9% to approximately 25%. © 2024 American Chemical Society. |
关键词 | Amorphous films Hard facing Hole concentration Hole mobility Hydrogenation Nanocrystalline materials Silicon wafers Surface discharges Valence bands Bandtail state Carrier collection Heterojunction solar cells Hole carrier collection Hole carriers Hydrogenated nanocrystalline silicon Multi-level valence band tail state Multilevels Silicon heterojunction solar cell Silicon heterojunctions Valence-band offset |
URL | 查看原文 |
收录类别 | EI ; SCI |
语种 | 英语 |
资助项目 | National Natural Science Foundation of China["62074153","T2322028","62004208"] ; Science and Technology Commission of Shanghai Municipality["22ZR1473200","20dz1207103"] ; China National Key RD Program[2022YFC2807104] ; Talent plan of Shanghai Branch, Chinese Academy of Sciences[CASSHB-QNPD-2023-001] ; Shanghai Rising-Star Program[23QA1411100] ; Foundation of the Key Laboratory of National Defense for Science and Technology of China[61428040202] |
WOS研究方向 | Science & Technology - Other Topics ; Materials Science |
WOS类目 | Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary |
WOS记录号 | WOS:001306481900001 |
出版者 | American Chemical Society |
EI入藏号 | 20243516930091 |
EI主题词 | Nanocrystals |
EI分类号 | 1301.4.1 ; 1301.4.2 ; 1301.4.3 ; 201.1.1 ; 208.1 ; 701.1 Electricity: Basic Concepts and Phenomena ; 712.1 Semiconducting Materials ; 714.2 Semiconductor Devices and Integrated Circuits ; 761 Nanotechnology ; 802.2 Chemical Reactions |
原始文献类型 | Article in Press |
引用统计 | 正在获取...
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文献类型 | 期刊论文 |
条目标识符 | https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/415581 |
专题 | 物质科学与技术学院 物质科学与技术学院_特聘教授组_刘正新组 物质科学与技术学院_博士生 2060研究院 |
通讯作者 | Liu, Zhengxin; Zhang, Liping |
作者单位 | 1.Research Center for New Energy Technology, State Key Laboratory of Materials for Integrated Circuits, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Changning, Shanghai; 200050, China 2.Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Shijingshan, Beijing; 100049, China 3.School of Physical Science and Technology, ShanghaiTech University, Shanghai; 201210, China 4.Tongwei New Energy (Chengdu) Company, Ltd., Sichuan, Chengdu; 610200, China |
通讯作者单位 | 物质科学与技术学院 |
推荐引用方式 GB/T 7714 | Zhou, Yinuo,Zhang, Honghua,Li, Zhenfei,et al. Heavy Boron-Doped Silicon Tunneling Inter-layer Enables Efficient Silicon Heterojunction Solar Cells[J]. ACS APPLIED MATERIALS AND INTERFACES,2024,16(35):46889-46896. |
APA | Zhou, Yinuo.,Zhang, Honghua.,Li, Zhenfei.,Huang, Shenglei.,Du, Junlin.,...&Zhang, Liping.(2024).Heavy Boron-Doped Silicon Tunneling Inter-layer Enables Efficient Silicon Heterojunction Solar Cells.ACS APPLIED MATERIALS AND INTERFACES,16(35),46889-46896. |
MLA | Zhou, Yinuo,et al."Heavy Boron-Doped Silicon Tunneling Inter-layer Enables Efficient Silicon Heterojunction Solar Cells".ACS APPLIED MATERIALS AND INTERFACES 16.35(2024):46889-46896. |
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