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ShanghaiTech University Knowledge Management System
Dopant-mediated carrier tunneling in short-channel two-dimensional transistors | |
2024-08-01 | |
发表期刊 | MATERIALS CHEMISTRY FRONTIERS (IF:6.0[JCR-2023],6.0[5-Year]) |
ISSN | 2052-1537 |
EISSN | 2052-1537 |
卷号 | 8期号:20页码:3300-3307 |
发表状态 | 已发表 |
DOI | 10.1039/d4qm00494a |
摘要 | ["Substitutional doping has played a pivotal role in silicon-based electronics and holds equivalent importance for emerging two-dimensional (2D) semiconductors, which show promise for advanced node technologies. However, the intricate role of dopant atoms in 2D transistors, particularly in short-channel cases, remains elusive and poses a challenging task for experimental exploration. In this study, using density functional theory (DFT) calculations and quantum transport simulations, we reveal the dual functionalities of V dopants in short-channel 2D transistors constructed with lateral VS2-MoS2-VS2 heterostructures. Depending on the channel length, the V dopant in the MoS2 channel, manifested by localized density of states (LDOS), can serve as either a \"relay station\" to facilitate carrier tunneling or as a scattering center that reduces source-drain currents. This work hence provides valuable insights into the doping effect of short-channel 2D transistors, and opens up possibilities for new electronic applications that harness the delicate properties of these substitutional dopants.","Electronic effects of dopant atoms in short-channel 2D transistors have been unraveled by quantum transport simulation, featuring channel length-dependent functionalities of assisted tunneling and charge scattering."] |
关键词 | Heterojunctions Layered semiconductors MOS devices Quantum electronics Short circuit currents Silicon wafers Surface discharges Transistors Carrier tunnelling Density-functional theory calculations Dopant atoms MoS 2 Node technology Quantum transport simulations Short channels Silicon-based electronics Two-dimensional Two-dimensional semiconductors |
URL | 查看原文 |
收录类别 | SCI ; EI |
语种 | 英语 |
资助项目 | National Natural Science Foundation of China[22205142] ; Science and Technology Commission of Shanghai Municipality[ |
WOS研究方向 | Chemistry ; Materials Science |
WOS类目 | Chemistry, Multidisciplinary ; Materials Science, Multidisciplinary |
WOS记录号 | WOS:001293029600001 |
出版者 | ROYAL SOC CHEMISTRY |
EI入藏号 | 20243516938625 |
EI主题词 | Semiconductor doping |
EI分类号 | 1301.1.4 ; 701.1 Electricity: Basic Concepts and Phenomena ; 712.1 Semiconducting Materials ; 712.1.2 Compound Semiconducting Materials ; 714.2 Semiconductor Devices and Integrated Circuits |
原始文献类型 | Article in Press |
文献类型 | 期刊论文 |
条目标识符 | https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/414185 |
专题 | 物质科学与技术学院 物质科学与技术学院_硕士生 物质科学与技术学院_博士生 物质科学与技术学院_PI研究组_纪清清组 |
共同第一作者 | Li, Chenyu |
通讯作者 | Ji, Qingqing |
作者单位 | 1.ShanghaiTech Univ, Sch Phys Sci & Technol, Shanghai 201210, Peoples R China 2.Hongzhiwei Technol Shanghai Co Ltd, Shanghai 201206, Peoples R China |
第一作者单位 | 物质科学与技术学院 |
通讯作者单位 | 物质科学与技术学院 |
第一作者的第一单位 | 物质科学与技术学院 |
推荐引用方式 GB/T 7714 | Lu, Yue,Li, Chenyu,Yang, Shenbo,et al. Dopant-mediated carrier tunneling in short-channel two-dimensional transistors[J]. MATERIALS CHEMISTRY FRONTIERS,2024,8(20):3300-3307. |
APA | Lu, Yue,Li, Chenyu,Yang, Shenbo,Yuan, Mingxuan,Qiao, Shuo,&Ji, Qingqing.(2024).Dopant-mediated carrier tunneling in short-channel two-dimensional transistors.MATERIALS CHEMISTRY FRONTIERS,8(20),3300-3307. |
MLA | Lu, Yue,et al."Dopant-mediated carrier tunneling in short-channel two-dimensional transistors".MATERIALS CHEMISTRY FRONTIERS 8.20(2024):3300-3307. |
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