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Dopant-mediated carrier tunneling in short-channel two-dimensional transistors
2024-08-01
发表期刊MATERIALS CHEMISTRY FRONTIERS (IF:6.0[JCR-2023],6.0[5-Year])
ISSN2052-1537
EISSN2052-1537
卷号8期号:20页码:3300-3307
发表状态已发表
DOI10.1039/d4qm00494a
摘要

["Substitutional doping has played a pivotal role in silicon-based electronics and holds equivalent importance for emerging two-dimensional (2D) semiconductors, which show promise for advanced node technologies. However, the intricate role of dopant atoms in 2D transistors, particularly in short-channel cases, remains elusive and poses a challenging task for experimental exploration. In this study, using density functional theory (DFT) calculations and quantum transport simulations, we reveal the dual functionalities of V dopants in short-channel 2D transistors constructed with lateral VS2-MoS2-VS2 heterostructures. Depending on the channel length, the V dopant in the MoS2 channel, manifested by localized density of states (LDOS), can serve as either a \"relay station\" to facilitate carrier tunneling or as a scattering center that reduces source-drain currents. This work hence provides valuable insights into the doping effect of short-channel 2D transistors, and opens up possibilities for new electronic applications that harness the delicate properties of these substitutional dopants.","Electronic effects of dopant atoms in short-channel 2D transistors have been unraveled by quantum transport simulation, featuring channel length-dependent functionalities of assisted tunneling and charge scattering."]

关键词Heterojunctions Layered semiconductors MOS devices Quantum electronics Short circuit currents Silicon wafers Surface discharges Transistors Carrier tunnelling Density-functional theory calculations Dopant atoms MoS 2 Node technology Quantum transport simulations Short channels Silicon-based electronics Two-dimensional Two-dimensional semiconductors
URL查看原文
收录类别SCI ; EI
语种英语
资助项目National Natural Science Foundation of China[22205142] ; Science and Technology Commission of Shanghai Municipality[
WOS研究方向Chemistry ; Materials Science
WOS类目Chemistry, Multidisciplinary ; Materials Science, Multidisciplinary
WOS记录号WOS:001293029600001
出版者ROYAL SOC CHEMISTRY
EI入藏号20243516938625
EI主题词Semiconductor doping
EI分类号1301.1.4 ; 701.1 Electricity: Basic Concepts and Phenomena ; 712.1 Semiconducting Materials ; 712.1.2 Compound Semiconducting Materials ; 714.2 Semiconductor Devices and Integrated Circuits
原始文献类型Article in Press
文献类型期刊论文
条目标识符https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/414185
专题物质科学与技术学院
物质科学与技术学院_硕士生
物质科学与技术学院_博士生
物质科学与技术学院_PI研究组_纪清清组
共同第一作者Li, Chenyu
通讯作者Ji, Qingqing
作者单位
1.ShanghaiTech Univ, Sch Phys Sci & Technol, Shanghai 201210, Peoples R China
2.Hongzhiwei Technol Shanghai Co Ltd, Shanghai 201206, Peoples R China
第一作者单位物质科学与技术学院
通讯作者单位物质科学与技术学院
第一作者的第一单位物质科学与技术学院
推荐引用方式
GB/T 7714
Lu, Yue,Li, Chenyu,Yang, Shenbo,et al. Dopant-mediated carrier tunneling in short-channel two-dimensional transistors[J]. MATERIALS CHEMISTRY FRONTIERS,2024,8(20):3300-3307.
APA Lu, Yue,Li, Chenyu,Yang, Shenbo,Yuan, Mingxuan,Qiao, Shuo,&Ji, Qingqing.(2024).Dopant-mediated carrier tunneling in short-channel two-dimensional transistors.MATERIALS CHEMISTRY FRONTIERS,8(20),3300-3307.
MLA Lu, Yue,et al."Dopant-mediated carrier tunneling in short-channel two-dimensional transistors".MATERIALS CHEMISTRY FRONTIERS 8.20(2024):3300-3307.
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