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Interfacial Resonance States-Induced Negative Tunneling Magneto-Resistance in Orthogonally Magnetized CoFeB/MgO/CoFeB | |
2024-03 | |
发表期刊 | IEEE TRANSACTIONS ON MAGNETICS (IF:2.1[JCR-2023],2.0[5-Year]) |
ISSN | 1941-0069 |
EISSN | 1941-0069 |
卷号 | 60期号:3页码:1-6 |
发表状态 | 已发表 |
DOI | 10.1109/TMAG.2024.3354258 |
摘要 | Magnetic tunnel junctions (MTJs) are essential for non-volatile magneto-resistive random access memory (MRAM) applications. Here, we report the observation of a negative tunneling magneto-resistance (TMR) in the CoFeB/MgO/CoFeB system with an orthogonally magnetized configuration. Through the modulation of the MgO thickness, the negative TMR component is up to 20% under a large negative voltage bias. Moreover, the tunneling anisotropic magneto-resistance (TAMR) measurements unveil that the negative TMR component likely arises from the interfacial resonance states (IRSs) in the minority band of the bottom ferromagnetic layer. Complementary first-principle calculations further quantify the IRS location and strength with respect to the Fermi-level position. Our work not only confirms the vital role of IRS in the electrical transport of MTJ but also provides valuable insights for the design of new-generation voltage-controlled MRAM and related spintronic applications. © 2023 IEEE. |
关键词 | First-principle calculation interfacial resonant state magnetic tunnel junction (MTJ) negative tunneling magneto-resistance (TMR) Cobalt compounds Iron compounds Magnesia Magnetic anisotropy MRAM devices Tunnel junctions Tunnelling magnetoresistance First principle calculations Interfacial resonant state Magnetic tunneling Magnetic tunneling junctions Magnetic-field Negative tunneling magneto-resistance Perpendicular magnetic anisotropy Resistance Resonant state Tunneling magnetoresistance |
URL | 查看原文 |
收录类别 | SCI |
语种 | 英语 |
出版者 | Institute of Electrical and Electronics Engineers Inc. |
EI入藏号 | 20240415429605 |
EI主题词 | Magnetic resonance |
EI分类号 | 701.2 Magnetism: Basic Concepts and Phenomena ; 722.1 Data Storage, Equipment and Techniques ; 804.2 Inorganic Compounds ; 931.2 Physical Properties of Gases, Liquids and Solids |
原始文献类型 | Journal article (JA) |
来源库 | IEEE |
文献类型 | 期刊论文 |
条目标识符 | https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/330467 |
专题 | 信息科学与技术学院_本科生 信息科学与技术学院_PI研究组_寇煦丰组 物质科学与技术学院_本科生 物质科学与技术学院_博士生 信息科学与技术学院_硕士生 信息科学与技术学院_博士生 |
通讯作者 | Xi-Xiang Zhang; Xufeng Kou |
作者单位 | 1.School of Information Science and Technology, ShanghaiTech University 2.Physical Science and Engineering Division, King Abdullah University of Science and Technology 3.School of Physics and Wuhan National High Magnetic Field Center, Huazhong University of Science and Technology 4.Suzhou Inston Technology Co., Ltd. 5.ShanghaiTech Laboratory for Topological Physics, ShanghaiTech University |
第一作者单位 | 信息科学与技术学院 |
通讯作者单位 | 信息科学与技术学院; 上海科技大学 |
第一作者的第一单位 | 信息科学与技术学院 |
推荐引用方式 GB/T 7714 | Puyang Huang,Aitian Chen,Jianting Dong,et al. Interfacial Resonance States-Induced Negative Tunneling Magneto-Resistance in Orthogonally Magnetized CoFeB/MgO/CoFeB[J]. IEEE TRANSACTIONS ON MAGNETICS,2024,60(3):1-6. |
APA | Puyang Huang.,Aitian Chen.,Jianting Dong.,Di Wu.,Xinqi Liu.,...&Xufeng Kou.(2024).Interfacial Resonance States-Induced Negative Tunneling Magneto-Resistance in Orthogonally Magnetized CoFeB/MgO/CoFeB.IEEE TRANSACTIONS ON MAGNETICS,60(3),1-6. |
MLA | Puyang Huang,et al."Interfacial Resonance States-Induced Negative Tunneling Magneto-Resistance in Orthogonally Magnetized CoFeB/MgO/CoFeB".IEEE TRANSACTIONS ON MAGNETICS 60.3(2024):1-6. |
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