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Wafer-Scale Epitaxial Growth of the Thickness-Controllable Van Der Waals Ferromagnet CrTe2 for Reliable Magnetic Memory Applications
2023
发表期刊ADVANCED FUNCTIONAL MATERIALS (IF:18.5[JCR-2023],19.6[5-Year])
ISSN1616-301X
EISSN1616-3028
卷号33期号:50
发表状态已发表
DOI10.1002/adfm.202304454
摘要

To harness the intriguing properties of 2D van der Waals (vdW) ferromagnets (FMs) for versatile applications, the key challenge lies in the reliable material synthesis for scalable device production. Here, the epitaxial growth of single-crystalline 1T-CrTe2 thin films on 2-inch sapphire substrates are demonstrated. Benefiting from the uniform surface energy of the dangling bond-free Al2O3(0001) surface, the layer-by-layer vdW growth mode is observed right from the initial growth stage, which warrants precise control of the sample thickness beyond three monolayer and homogeneous surface morphology across the entire wafer. Moreover, the presence of the Coulomb interaction at the CrTe2/Al2O3 interface plays an important role in tailoring the anomalous Hall response, and the structural optimization of the CrTe2-based spin-orbit torque device leads to a substantial switching power reduction by 54%. The results may lay out a general framework for the design of energy-efficient spintronics based on configurable vdW FMs. © 2023 Wiley-VCH GmbH.

关键词Alumina Aluminum oxide Energy efficiency Epitaxial growth Ferromagnetic materials Ferromagnetism Magnetization Sapphire Structural optimization Surface morphology Van der Waals forces 2d ferromagnet Ferromagnets Interface engineering Magnetic memory Spin orbits Spin-orbit torque switch Van der Waal Van der waal heterostructure Wafer scale Wafer-scale epitaxial growth
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收录类别SCI ; EI
语种英语
资助项目National Key R&D Program of China[2021YFA0715503] ; National Natural Science Foundation of China["92164104","61874172","11904230"] ; Major Project of Science and Technology Commission of Shanghai Municipality[2018SHZDZX02] ; Shanghaitech Quantum Device and Soft Matter Nano-fabrication Labs[SMN180827] ; Shanghai RisingStar program[21QA1406000] ; Shanghai Sailing Program[19YF1433200]
WOS研究方向Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics
WOS类目Chemistry, Multidisciplinary ; Chemistry, Physical ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter
WOS记录号WOS:001064025900001
出版者John Wiley and Sons Inc
EI入藏号20233614697490
EI主题词Morphology
EI分类号482.2.1 Gems ; 525.2 Energy Conservation ; 701.2 Magnetism: Basic Concepts and Phenomena ; 708.4 Magnetic Materials ; 801.4 Physical Chemistry ; 802.3 Chemical Operations ; 804.2 Inorganic Compounds ; 921.5 Optimization Techniques ; 931.2 Physical Properties of Gases, Liquids and Solids ; 931.3 Atomic and Molecular Physics ; 933.1.2 Crystal Growth ; 951 Materials Science
原始文献类型Article in Press
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文献类型期刊论文
条目标识符https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/329004
专题物质科学与技术学院
信息科学与技术学院
物质科学与技术学院_PI研究组_柳仲楷组
物质科学与技术学院_PI研究组_李刚组
信息科学与技术学院_PI研究组_寇煦丰组
物质科学与技术学院_特聘教授组_陈宇林
物质科学与技术学院_博士生
信息科学与技术学院_硕士生
信息科学与技术学院_博士生
物质科学与技术学院_公共科研平台_拓扑物理实验室
信息科学与技术学院_PI研究组_杨雨梦组
大科学中心_公共科研平台_大科学装置建设部
通讯作者Li, Gang; Yao, Qi; Kou, Xufeng
作者单位
1.ShanghaiTech Univ, ShanghaiTech Lab Topol Phys, Shanghai 201210, Peoples R China
2.ShanghaiTech Univ, Sch Phys Sci & Technol, Shanghai 201210, Peoples R China
3.ShanghaiTech Univ, Sch Informat Sci & Technol, Shanghai 201210, Peoples R China
4.Lanzhou Univ, Sch Mat & Energy, Lanzhou 730000, Peoples R China
5.Tsinghua Univ, Beijing Innovat Ctr Future Chips, Sch Mat Sci & Engn, Key Lab Adv Mat MOE, Beijing 100084, Peoples R China
6.Songshan Lake Mat Lab, Dongguan 523808, Guangdong, Peoples R China
7.Diamond Light Source, Harwell Sci & Innovat Campus, Didcot OX11 0DE, Oxon, England
8.Univ Oxford, Dept Phys, Oxford OX1 3PU, England
9.Chinese Acad Sci, Beijing Natl Lab Condensed Matter Phys, Inst Phys, Beijing 100190, Peoples R China
第一作者单位上海科技大学;  物质科学与技术学院
通讯作者单位上海科技大学;  物质科学与技术学院;  信息科学与技术学院
第一作者的第一单位上海科技大学
推荐引用方式
GB/T 7714
Liu, Xinqi,Huang, Puyang,Xia, Yunyouyou,et al. Wafer-Scale Epitaxial Growth of the Thickness-Controllable Van Der Waals Ferromagnet CrTe2 for Reliable Magnetic Memory Applications[J]. ADVANCED FUNCTIONAL MATERIALS,2023,33(50).
APA Liu, Xinqi.,Huang, Puyang.,Xia, Yunyouyou.,Gao, Lei.,Liao, Liyang.,...&Kou, Xufeng.(2023).Wafer-Scale Epitaxial Growth of the Thickness-Controllable Van Der Waals Ferromagnet CrTe2 for Reliable Magnetic Memory Applications.ADVANCED FUNCTIONAL MATERIALS,33(50).
MLA Liu, Xinqi,et al."Wafer-Scale Epitaxial Growth of the Thickness-Controllable Van Der Waals Ferromagnet CrTe2 for Reliable Magnetic Memory Applications".ADVANCED FUNCTIONAL MATERIALS 33.50(2023).
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