The Microscopic Mechanisms of Nonlinear Rectification on Si-MOSFETs Terahertz Detector
2023-06
发表期刊SENSORS (IF:3.4[JCR-2023],3.7[5-Year])
ISSN1424-8220
卷号23期号:12
发表状态已发表
DOI10.3390/s23125367
摘要

Studying the nonlinear photoresponse of different materials, including III-V semiconductors, two-dimensional materials and many others, is attracting burgeoning interest in the terahertz (THz) field. Especially, developing field-effect transistor (FET)-based THz detectors with preferred nonlinear plasma-wave mechanisms in terms of high sensitivity, compactness and low cost is a high priority for advancing performance imaging or communication systems in daily life. However, as THz detectors continue to shrink in size, the impact of the hot-electron effect on device performance is impossible to ignore, and the physical process of THz conversion remains elusive. To reveal the underlying microscopic mechanisms, we have implemented drift-diffusion/hydrodynamic models via a self-consistent finite-element solution to understand the dynamics of carriers at the channel and the device structure dependence. By considering the hot-electron effect and doping dependence in our model, the competitive behavior between the nonlinear rectification and hot electron-induced photothermoelectric effect is clearly presented, and it is found that the optimized source doping concentrations can be utilized to reduce the hot-electron effect on the devices. Our results not only provide guidance for further device optimization but can also be extended to other novel electronic systems for studying THz nonlinear rectification. © 2023 by the authors.

关键词Electrons Field effect transistors III-V semiconductors Plasma oscillations Plasma waves Semiconductor doping Structure (composition) Terahertz waves Hot electron effects Hydrodynamic modeling Microscopic mechanisms Non-resonant plasma oscillation regime Nonlinear rectification Nonresonant Photoresponses Si MOSFET Tera Hertz Terahertz detectors
收录类别EI
语种英语
出版者MDPI
EI入藏号20232714362420
EI主题词Hot electrons
EI分类号701.1 Electricity: Basic Concepts and Phenomena ; 711 Electromagnetic Waves ; 712.1 Semiconducting Materials ; 714.2 Semiconductor Devices and Integrated Circuits ; 932.3 Plasma Physics ; 951 Materials Science
原始文献类型Journal article (JA)
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文献类型期刊论文
条目标识符https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/316854
专题物质科学与技术学院
物质科学与技术学院_特聘教授组_陈效双组
物质科学与技术学院_特聘教授组_陆卫组
物质科学与技术学院_硕士生
物质科学与技术学院_博士生
通讯作者Wang, Lin; Chen, Xiaoshuang
作者单位
1.State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 500 Yu Tian Road, Shanghai; 200083, China;
2.School of Physical Science and Technology, ShanghaiTech University, Shanghai; 201210, China;
3.Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, No.1 SubLane Xiangshan, Hangzhou; 310024, China
第一作者单位物质科学与技术学院
通讯作者单位物质科学与技术学院
推荐引用方式
GB/T 7714
Wei, Yingdong,Yao, Chenyu,Han, Li,et al. The Microscopic Mechanisms of Nonlinear Rectification on Si-MOSFETs Terahertz Detector[J]. SENSORS,2023,23(12).
APA Wei, Yingdong.,Yao, Chenyu.,Han, Li.,Zhang, Libo.,Chen, Zhiqingzi.,...&Chen, Xiaoshuang.(2023).The Microscopic Mechanisms of Nonlinear Rectification on Si-MOSFETs Terahertz Detector.SENSORS,23(12).
MLA Wei, Yingdong,et al."The Microscopic Mechanisms of Nonlinear Rectification on Si-MOSFETs Terahertz Detector".SENSORS 23.12(2023).
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