Systematic investigation of electrical contact barriers between different electrode metals and layered GeSe
Li, Ranran1,2,3; Xia, Wei1; Guo, Yanfeng1; Xue, Jiamin1
2019-01-07
Source PublicationAPPLIED PHYSICS LETTERS
ISSN0003-6951
Volume114Issue:1
Status已发表
DOI10.1063/1.5042821
Abstract

For electronic and photoelectronic devices based on GeSe, an emergent two dimensional monochalcogenide with many exciting properties predicted, good electrical contacts are of great importance for achieving high device performances and exploring the intrinsic physics of GeSe. In this article, we use temperature-dependent transport measurements and thermionic emission theory for systematic investigation of the contact-barrier heights between GeSe and six common electrode metals, Al, Ag, Ti, Au, Pt, and Pd. These metals cover a wide range of work functions (from similar to 3.6 eV to similar to 5.7 eV). Our study indicates that Au forms the best contact with the valence band of GeSe even though Au does not possess the highest work function among the metals studied. This behavior clearly deviates from the expectation of Schottky-Mott theory and indicates the importance of the details at the interfaces between metals and GeSe. Published. under license by ALP Publishing.

Indexed BySCI ; EI
Language英语
Funding ProjectShanghai Pujiang Program[17PJ1406200]
WOS Research AreaPhysics
WOS SubjectPhysics, Applied
WOS IDWOS:000455893000040
PublisherAMER INST PHYSICS
EI Accession Number20190206357222
EI KeywordsAluminum compounds ; Electric contacts ; Electrodes ; Gold ; Selenium compounds ; Silver compounds ; Thermionic emission ; Work function
EI Classification NumberPrecious Metals:547.1 ; Electric Components:704.1 ; Atomic and Molecular Physics:931.3
WOS KeywordSINGLE ; PERFORMANCE
Original Document TypeArticle
Citation statistics
Cited Times:2[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttps://kms.shanghaitech.edu.cn/handle/2MSLDSTB/30195
Collection物质科学与技术学院_博士生
物质科学与技术学院_PI研究组_薛加民组
物质科学与技术学院_PI研究组_郭艳峰组
Corresponding AuthorXue, Jiamin
Affiliation1.ShanghaiTech Univ, Sch Phys Sci & Technol, Shanghai 201210, Peoples R China
2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China
3.Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
First Author AffilicationSchool of Physical Science and Technology
Corresponding Author AffilicationSchool of Physical Science and Technology
First Signature AffilicationSchool of Physical Science and Technology
Recommended Citation
GB/T 7714
Li, Ranran,Xia, Wei,Guo, Yanfeng,et al. Systematic investigation of electrical contact barriers between different electrode metals and layered GeSe[J]. APPLIED PHYSICS LETTERS,2019,114(1).
APA Li, Ranran,Xia, Wei,Guo, Yanfeng,&Xue, Jiamin.(2019).Systematic investigation of electrical contact barriers between different electrode metals and layered GeSe.APPLIED PHYSICS LETTERS,114(1).
MLA Li, Ranran,et al."Systematic investigation of electrical contact barriers between different electrode metals and layered GeSe".APPLIED PHYSICS LETTERS 114.1(2019).
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