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Measuring Band Modulation of MoS2 with Ferroelectric Gates
2023-03-22
发表期刊NANO LETTERS (IF:9.6[JCR-2023],10.1[5-Year])
ISSN1530-6984
EISSN1530-6992
卷号23期号:6页码:2114–2120
发表状态已发表
DOI10.1021/acs.nanolett.2c04326
摘要

Electronic properties of two-dimensional (2D) materials can be significantly tuned by an external electric field. Ferroelectric gates can provide a strong polarization electric field. Here, we report the measurements of the band structure of few-layer MoS2 modulated by a ferroelectric P(VDF-TrFE) gate with contact-mode scanning tunneling spectroscopy. When P(VDF-TrFE) is fully polarized, an electric field up to ∼0.62 V/nm through the MoS2 layers is inferred from the measured band edges, which affects the band structure significantly. First, strong band bending in the vertical direction signifies the Franz-Keldysh effect and a large extension of the optical absorption edge. Photons with energy of half the band gap are still absorbed with 20% of the absorption probability of photons at the band gap. Second, the electric field greatly enlarges the energy separations between the quantum-well subbands. Our study intuitively demonstrates the great potential of ferroelectric gates in band structure manipulation of 2D materials.

关键词ferroelectrics two-dimensional material scanning tunneling spectroscopy contact-mode scanning tunneling spectroscopy
学科领域低维物理
学科门类理学::物理学
收录类别SCI ; SCIE ; EI
语种英语
出版者American Chemical Society
EI入藏号20231113694334
EI主题词Electronic properties
EI分类号701.1 Electricity: Basic Concepts and Phenomena ; 708.1 Dielectric Materials ; 712.1 Semiconducting Materials ; 714.2 Semiconductor Devices and Integrated Circuits ; 741.1 Light/Optics ; 931.3 Atomic and Molecular Physics
原始文献类型Journal article (JA)
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文献类型期刊论文
条目标识符https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/290007
专题物质科学与技术学院
物质科学与技术学院_PI研究组_薛加民组
物质科学与技术学院_博士生
共同第一作者Chen, Yan
通讯作者Wang, Jianlu; Xue, Jiamin
作者单位
1.School of Physical Science and Technology, ShanghaiTech University, Shanghai 201210, China
2.Shanghai Frontiers Science Research Base of Intelligent Optoelectronics and Perception, Institute of Optoelectronics, Fudan University, Shanghai 200433, China
3.Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 20083, China
4.International Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
5.Research Center for Functional Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
第一作者单位物质科学与技术学院
通讯作者单位物质科学与技术学院
第一作者的第一单位物质科学与技术学院
推荐引用方式
GB/T 7714
Sun, Xinzuo,Chen, Yan,Zhao, Dongyang,et al. Measuring Band Modulation of MoS2 with Ferroelectric Gates[J]. NANO LETTERS,2023,23(6):2114–2120.
APA Sun, Xinzuo.,Chen, Yan.,Zhao, Dongyang.,Takshi, Taniguchi.,Kenji, Watanabe.,...&Xue, Jiamin.(2023).Measuring Band Modulation of MoS2 with Ferroelectric Gates.NANO LETTERS,23(6),2114–2120.
MLA Sun, Xinzuo,et al."Measuring Band Modulation of MoS2 with Ferroelectric Gates".NANO LETTERS 23.6(2023):2114–2120.
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