Damage resistance of B4C reflective mirror irradiated by X-ray free-electron laser

doi:10.3788/COL202321.023401

	Damage resistance of B4C reflective mirror irradiated by X-ray free-electron laser
	Cao, Jinyu 1,2; Li, Shuhui 1,2; Tong, Yajun3 ; Tang, Ming 1,2; Li, Wenbin 1,2; Huang, Qiushi 1,2; Jiang, Huaidong3 ; Wang, Zhanshan 1,2
	2023-02-10
发表期刊	CHINESE OPTICS LETTERS (IF:3.3[JCR-2023],2.1[5-Year])
ISSN	1671-7694
卷号	21 期号:2
发表状态	已发表
DOI	10.3788/COL202321.023401
摘要	In this paper, a simple theoretical model combining Monte Carlo simulation with the enthalpy method is provided to simulate the damage resistance of B4C/Si-sub mirror under X-ray free-electron laser irradiation. Two different damage mechanisms are found, dependent on the photon energy. The optimum B4C film thickness is determined by studying the dependence of the damage resistance on the film thickness. Based on the optimized film thickness, the damage thresholds are simulated at photon energy of 0.4-25 keV and a grazing incidence angle of 2 mrad. It is recommended that the energy range around the Si K-edge should be avoided for safety reasons.
关键词	B4C film XFEL damage mechanism damage threshold enthalpy method
URL	查看原文
收录类别	SCI ; EI
语种	英语
资助项目	National Natural Science Foundation of China (NSFC)[11875203]
WOS研究方向	Optics
WOS类目	Optics
WOS记录号	WOS:000942342500014
出版者	Optica Publishing Group
EI入藏号	20231513870452
EI主题词	Monte Carlo methods
EI分类号	641.1 Thermodynamics ; 723.4 Artificial Intelligence ; 741.3 Optical Devices and Systems ; 744.5 Free Electron Lasers ; 744.7 Laser Components ; 922.2 Mathematical Statistics ; 931.3 Atomic and Molecular Physics
原始文献类型	Journal article (JA)
引用统计	正在获取...
文献类型	期刊论文
条目标识符	https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/287885
专题	大科学中心_PI研究组_江怀东组大科学中心_公共科研平台_大科学装置建设部
通讯作者	Li, Wenbin; Wang, Zhanshan
作者单位	1.MOE Key Lab Adv Microstruct Mat, Shanghai 200092, Peoples R China 2.Tongji Univ, Inst Precis Opt Engn, Sch Phys Sci & Engn, Shanghai 200092, Peoples R China 3.ShanghaiTech Univ, Ctr Transformat Sci, Shanghai 201210, Peoples R China
推荐引用方式 GB/T 7714	Cao, Jinyu,Li, Shuhui,Tong, Yajun,et al. Damage resistance of B4C reflective mirror irradiated by X-ray free-electron laser[J]. CHINESE OPTICS LETTERS,2023,21(2).
APA	Cao, Jinyu.,Li, Shuhui.,Tong, Yajun.,Tang, Ming.,Li, Wenbin.,...&Wang, Zhanshan.(2023).Damage resistance of B4C reflective mirror irradiated by X-ray free-electron laser.CHINESE OPTICS LETTERS,21(2).
MLA	Cao, Jinyu,et al."Damage resistance of B4C reflective mirror irradiated by X-ray free-electron laser".CHINESE OPTICS LETTERS 21.2(2023).