Stress and optical constants in thin films of BaF2-PrF3: A potential Th-free infrared low-index evaporation material

doi:10.1016/j.ijleo.2018.08.020

	Stress and optical constants in thin films of BaF2-PrF3: A potential Th-free infrared low-index evaporation material
	Lva, Xuwen 1,3; Zheng, Weimin 2; Xie, Ping 3; Li, Bin 3; He, Weixiang 1,3; Jing, Chao 1; Liu, Dingquan3,4
	2018
发表期刊	OPTIK (IF:3.100[JCR-2022],2.600[5-Year])
ISSN	0030-4026
卷号	173 页码:174-179
发表状态	已发表
DOI	10.1016/j.ijleo.2018.08.020
摘要	Although PrF3 can be regarded as a potential infrared low-index evaporation material used in infrared antireflection to substitute for radioactive ThF4 because its thin films have a good transparency, the lower refractive index n and extinction coefficient k in the spectral range of thermal infrared, the greater tensile stress emerging in its layers will deteriorate the reliability and durability of antireflection coatings. In our investigation, BaF2-PrF3 thin films were deposited using electron beam evaporation from the sintered pellets of PrF3 admixed with BaF2. Stress in thin films was calculated from Stoney's equation on the basis of measuring the changes of radius of curvature of thin silicon strips. The stoichiometry of thin films was determined using the energy dispersive X-ray analysis (EDX). The optical constants of thin films were determined by fitting the measured spectral transmittance curves using Lorentz oscillators as a dispersion model. It can be observed that stress in BaF2-PrF3 thin films is obviously reduced with the increasing of the concentration of BaF2 in thin films and the sintered pellets. Moreover, it was also demonstrated that incorporation of BaF2 into PrF3 can reduce the refractive index of thin films, although BaF2-PrF3 thin films have a greater dispersion than that of PrF3 thin films. In addition, the lower value of extinction coefficient is also presented in thin films, like those of rare-earth fluorides.
关键词	Antireflection coatings Infrared Praseodymium fluoride Barium fluoride Electron beam evaporation Stress Optical constant
收录类别	SCI ; SCIE ; EI
语种	英语
资助项目	Innovation Program in Shanghai Institute of Technical Physics, Chinese Academy of Sciences[CX-173]
WOS研究方向	Optics
WOS类目	Optics
WOS记录号	WOS:000447247600021
出版者	ELSEVIER GMBH, URBAN & FISCHER VERLAG
EI入藏号	20183405723016
EI主题词	Antireflection coatings ; Barium compounds ; Curve fitting ; Dispersion (waves) ; Dispersions ; Electron beams ; Energy dispersive X ray analysis ; Evaporation ; Infrared radiation ; Optical constants ; Optical films ; Pelletizing ; Physical vapor deposition ; Praseodymium compounds ; Rare earths ; Refractive index ; Sintering ; Stresses ; Thin films ; Thorium compounds ; X ray diffraction analysis
EI分类号	Light/Optics:741.1 ; Optical Devices and Systems:741.3 ; Chemistry:801 ; Chemical Operations:802.3 ; Inorganic Compounds:804.2 ; Coating Materials:813.2 ; Numerical Methods:921.6 ; Materials Science:951
WOS关键词	ERBIUM FLUORIDE FILMS ; COATINGS ; EVOLUTION ; LAYERS
原始文献类型	Article
引用统计	正在获取...
文献类型	期刊论文
条目标识符	https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/28151
专题	物质科学与技术学院_特聘教授组_刘定权组
通讯作者	Li, Bin; Jing, Chao
作者单位	1.Shanghai Univ, Dept Phys, Shanghai 200444, Peoples R China 2.Shandong Univ, Sch Space Sci & Phys, Weihai 264209, Peoples R China 3.Chinese Acad Sci, Shanghai Inst Tech Phys, Shanghai 200083, Peoples R China 4.Shanghai Tech Univ, Sch Phys Sci & Technol, Shanghai 200031, Peoples R China
推荐引用方式 GB/T 7714	Lva, Xuwen,Zheng, Weimin,Xie, Ping,et al. Stress and optical constants in thin films of BaF2-PrF3: A potential Th-free infrared low-index evaporation material[J]. OPTIK,2018,173:174-179.
APA	Lva, Xuwen.,Zheng, Weimin.,Xie, Ping.,Li, Bin.,He, Weixiang.,...&Liu, Dingquan.(2018).Stress and optical constants in thin films of BaF2-PrF3: A potential Th-free infrared low-index evaporation material.OPTIK,173,174-179.
MLA	Lva, Xuwen,et al."Stress and optical constants in thin films of BaF2-PrF3: A potential Th-free infrared low-index evaporation material".OPTIK 173(2018):174-179.