ShanghaiTech University Knowledge Management System
| The Impact of Manufacturing Imperfections on the Performance of Metalenses and a Manufacturing-Tolerant Design Method | |
| 2022-09 | |
| Source Publication | MICROMACHINES
 |
| EISSN | 2072-666X |
| Volume | 13Issue:9 |
| Status | 已发表 |
| DOI | 10.3390/mi13091531 |
| Abstract | Metalenses play an important role in optoelectronic integrated devices, given their advantages in miniaturization and integration. Due to its high aspect ratio subwavelength structure, fabricating metalenses requires a high-level dry etching technology. Consequently, structure deformation of the metalens will exist if the etching process of the material is not mature enough, which will impair the metalens' performance. In this paper, a polarization-independent InP dielectric metalens is designed to focus the incident light from air into the substrate, which is used for monolithically integrating with the InGaAs/InP photodetector in the future. Subsequently, with the simulation method, we investigated the impact of the structure deformation on the metalens' performance, which was found in our InP dry etching process development. We have found that the sidewall slope and aspect ratio-dependent etching effect greatly impaired the focusing efficiency because of the phase modulation deviation. To solve this problem, we proposed a manufacturing-tolerant design method, which effectively improved the performance of the device with structural deformation. Our work is instructive for developing metalenses and can accelerate their integration application. |
| Keyword | optoelectronic integrated devices metalens dry etching |
| URL | 查看原文 |
| Indexed By | SCI ; EI ; SCIE |
| Language | 英语 |
| Funding Project | National Natural Science Foundation of China (NSFC)["62174166","11991063","12027805","61874069"] ; Science and Technology Commission of Shanghai Municipality["2019SHZDZX01","22JC1402902"] ; Strategic Priority Research Program of the Chinese Academy of Sciences[XDB43010200] |
| WOS Research Area | Chemistry ; Science & Technology - Other Topics ; Instruments & Instrumentation ; Physics |
| WOS Subject | Chemistry, Analytical ; Nanoscience & Nanotechnology ; Instruments & Instrumentation ; Physics, Applied |
| WOS ID | WOS:000857766100001 |
| Publisher | MDPI |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/235571 |
| Collection | 物质科学与技术学院_博士生 物质科学与技术学院_特聘教授组_陆卫组 |
| Corresponding Author | Wang, Wenjuan; Lu, Wei |
| Affiliation | 1.Chinese Acad Sci, Shanghai Inst Tech Phys, State Key Lab Infrared Phys, 500 Yu Tian Rd, Shanghai 200083, Peoples R China 2.Univ Chinese Acad Sci, 19A Yuquan Rd, Beijing 100049, Peoples R China 3.Shanghai Res Ctr Quantum Sci, Shanghai 201315, Peoples R China 4.ShanghaiTech Univ, Sch Phys Sci & Technol, Shanghai 201210, Peoples R China |
| Corresponding Author Affilication | School of Physical Science and Technology |
| Recommended Citation GB/T 7714 | Zhu, Yicheng,Wang, Wenjuan,Yu, Feilong,et al. The Impact of Manufacturing Imperfections on the Performance of Metalenses and a Manufacturing-Tolerant Design Method[J]. MICROMACHINES,2022,13(9). |
| APA | Zhu, Yicheng.,Wang, Wenjuan.,Yu, Feilong.,Liu, Qingquan.,Guo, Zilu.,...&Lu, Wei.(2022).The Impact of Manufacturing Imperfections on the Performance of Metalenses and a Manufacturing-Tolerant Design Method.MICROMACHINES,13(9). |
| MLA | Zhu, Yicheng,et al."The Impact of Manufacturing Imperfections on the Performance of Metalenses and a Manufacturing-Tolerant Design Method".MICROMACHINES 13.9(2022). |
| Files in This Item: | Download All | |||||
| File Name/Size | DocType | Version | Access | License | ||
Edit Comment
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.