The Impact of Manufacturing Imperfections on the Performance of Metalenses and a Manufacturing-Tolerant Design Method

doi:10.3390/mi13091531

	The Impact of Manufacturing Imperfections on the Performance of Metalenses and a Manufacturing-Tolerant Design Method
	Zhu, Yicheng 1,2; Wang, Wenjuan 1,3; Yu, Feilong 1,2; Liu, Qingquan 1,2; Guo, Zilu1,2,4 ; Li, Guanhai 1; Chen, Pingping 1; Lu, Wei1,3,4
	2022-09
发表期刊	MICROMACHINES
EISSN	2072-666X
卷号	13 期号:9
发表状态	已发表
DOI	10.3390/mi13091531
摘要	Metalenses play an important role in optoelectronic integrated devices, given their advantages in miniaturization and integration. Due to its high aspect ratio subwavelength structure, fabricating metalenses requires a high-level dry etching technology. Consequently, structure deformation of the metalens will exist if the etching process of the material is not mature enough, which will impair the metalens' performance. In this paper, a polarization-independent InP dielectric metalens is designed to focus the incident light from air into the substrate, which is used for monolithically integrating with the InGaAs/InP photodetector in the future. Subsequently, with the simulation method, we investigated the impact of the structure deformation on the metalens' performance, which was found in our InP dry etching process development. We have found that the sidewall slope and aspect ratio-dependent etching effect greatly impaired the focusing efficiency because of the phase modulation deviation. To solve this problem, we proposed a manufacturing-tolerant design method, which effectively improved the performance of the device with structural deformation. Our work is instructive for developing metalenses and can accelerate their integration application.
关键词	optoelectronic integrated devices metalens dry etching
URL	查看原文
收录类别	SCI ; EI ; SCIE
语种	英语
资助项目	National Natural Science Foundation of China (NSFC)["62174166","11991063","12027805","61874069"] ; Science and Technology Commission of Shanghai Municipality["2019SHZDZX01","22JC1402902"] ; Strategic Priority Research Program of the Chinese Academy of Sciences[XDB43010200]
WOS研究方向	Chemistry ; Science & Technology - Other Topics ; Instruments & Instrumentation ; Physics
WOS类目	Chemistry, Analytical ; Nanoscience & Nanotechnology ; Instruments & Instrumentation ; Physics, Applied
WOS记录号	WOS:000857766100001
出版者	MDPI
引用统计
文献类型	期刊论文
条目标识符	https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/235571
专题	物质科学与技术学院_博士生物质科学与技术学院_特聘教授组_陆卫组
通讯作者	Wang, Wenjuan; Lu, Wei
作者单位	1.Chinese Acad Sci, Shanghai Inst Tech Phys, State Key Lab Infrared Phys, 500 Yu Tian Rd, Shanghai 200083, Peoples R China 2.Univ Chinese Acad Sci, 19A Yuquan Rd, Beijing 100049, Peoples R China 3.Shanghai Res Ctr Quantum Sci, Shanghai 201315, Peoples R China 4.ShanghaiTech Univ, Sch Phys Sci & Technol, Shanghai 201210, Peoples R China
通讯作者单位	物质科学与技术学院
推荐引用方式 GB/T 7714	Zhu, Yicheng,Wang, Wenjuan,Yu, Feilong,et al. The Impact of Manufacturing Imperfections on the Performance of Metalenses and a Manufacturing-Tolerant Design Method[J]. MICROMACHINES,2022,13(9).
APA	Zhu, Yicheng.,Wang, Wenjuan.,Yu, Feilong.,Liu, Qingquan.,Guo, Zilu.,...&Lu, Wei.(2022).The Impact of Manufacturing Imperfections on the Performance of Metalenses and a Manufacturing-Tolerant Design Method.MICROMACHINES,13(9).
MLA	Zhu, Yicheng,et al."The Impact of Manufacturing Imperfections on the Performance of Metalenses and a Manufacturing-Tolerant Design Method".MICROMACHINES 13.9(2022).