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Silane-catalysed fast growth of large single-crystalline graphene on hexagonal boron nitride | |
2015-03 | |
发表期刊 | NATURE COMMUNICATIONS |
ISSN | 2041-1723 |
卷号 | 6 |
发表状态 | 已发表 |
DOI | 10.1038/ncomms7499 |
摘要 | The direct growth of high-quality, large single-crystalline domains of graphene on a dielectric substrate is of vital importance for applications in electronics and optoelectronics. Traditionally, graphene domains grown on dielectrics are typically only B1 mm with a growth rate of B1 nmmin similar to 1 or less, the main reason is the lack of a catalyst. Here we show that silane, serving as a gaseous catalyst, is able to boost the graphene growth rate to B1 mm min similar to 1, thereby promoting graphene domains up to 20 mm in size to be synthesized via chemical vapour deposition (CVD) on hexagonal boron nitride (h-BN). Hall measurements show that the mobility of the sample reaches 20,000 cm(2)V(-1) s(-1) at room temperature, which is among the best for CVD-grown graphene. Combining the advantages of both catalytic CVD and the ultra-flat dielectric substrate, gaseous catalyst-assisted CVD paves the way for synthesizing high-quality graphene for device applications while avoiding the transfer process. |
收录类别 | SCI |
语种 | 英语 |
资助项目 | Science and Technology Commission of Shanghai Municipality[12JC1410100] ; Science and Technology Commission of Shanghai Municipality[12JC1403900] |
WOS研究方向 | Science & Technology - Other Topics |
WOS类目 | Multidisciplinary Sciences |
WOS记录号 | WOS:000352719700001 |
出版者 | NATURE PUBLISHING GROUP |
WOS关键词 | CHEMICAL-VAPOR-DEPOSITION ; HIGH-QUALITY ; MONOLAYER GRAPHENE ; DIRAC FERMIONS ; FILMS ; NUCLEATION ; GRAINS ; BN ; CU |
原始文献类型 | Article |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/2251 |
专题 | 物质科学与技术学院_特聘教授组_谢晓明组 物质科学与技术学院 |
通讯作者 | Wang, Haomin |
作者单位 | 1.Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China 2.Chinese Acad Sci, Grad Univ, Beijing 100049, Peoples R China 3.Cent S Univ, Sch Phys & Elect, Changsha 410083, Hunan, Peoples R China 4.Hong Kong Polytech Univ, Inst Text & Clothing, Kowloon 999077, Hong Kong, Peoples R China 5.Nanyang Technol Univ, Sch Phys & Math Sci, Div Phys & Appl Phys, Singapore 637371, Singapore 6.Chinese Acad Sci, Shanghai Inst Tech Phys, Natl Lab Infrared Phys, Shanghai 200083, Peoples R China 7.Chinese Acad Sci, Shanghai Inst Ceram, Key Lab Mat Energy Convers, Shanghai 200050, Peoples R China 8.ShanghaiTech Univ, Sch Phys Sci & Technol, Shanghai 200031, Peoples R China |
推荐引用方式 GB/T 7714 | Tang, Shujie,Wang, Haomin,Wang, Hui Shan,et al. Silane-catalysed fast growth of large single-crystalline graphene on hexagonal boron nitride[J]. NATURE COMMUNICATIONS,2015,6. |
APA | Tang, Shujie.,Wang, Haomin.,Wang, Hui Shan.,Sun, Qiujuan.,Zhang, Xiuyun.,...&Jiang, Mianheng.(2015).Silane-catalysed fast growth of large single-crystalline graphene on hexagonal boron nitride.NATURE COMMUNICATIONS,6. |
MLA | Tang, Shujie,et al."Silane-catalysed fast growth of large single-crystalline graphene on hexagonal boron nitride".NATURE COMMUNICATIONS 6(2015). |
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