Electrochromic behavior of WO3 thin films prepared by GLAD

doi:10.1016/j.apsusc.2018.03.248

	Electrochromic behavior of WO3 thin films prepared by GLAD
	Yuan, Jiali1,2,3 ; Wang, Bin 1; Wang, Hu 1; Chai, Yingjie 1; Jin, Yaxue 1,2; Qi, Hongji 1; Shao, Jianda1
	2018-07-31
发表期刊	APPLIED SURFACE SCIENCE (IF:6.3[JCR-2023],5.9[5-Year])
ISSN	0169-4332
卷号	447 页码:471-478
发表状态	已发表
DOI	10.1016/j.apsusc.2018.03.248
摘要	WO3 thin films fabricated by glancing angle deposition (GLAD) are proposed as excellent electrochromic coatings with favorable ion diffusion. A similar to 500-nm film prepared by GLAD had a relatively large transmittance modulation. The crystallization structure, surface morphology, chemical state, optical and electrochromic properties of WO3 thin films were systematically characterized upon annealing treatment. Compared with annealed WO3 porous nanostructured films, the amorphous as-deposited films exhibited a high coloration efficiency and stable reversibility. Furthermore, the GLAD WO3 films exhibit the tunable angular selectivity under illumination with p-polarized light because of the birefringence, which could extend the application range of nanostructured films in the electrochromic field. (C) 2018 Elsevier B.V. All rights reserved.
关键词	GLAD Annealing treatment Electrochromic property Tunable angular selectivity
收录类别	SCI ; SCIE ; EI
语种	英语
资助项目	National Natural Science Foundation of China[11535010]
WOS研究方向	Chemistry ; Materials Science ; Physics
WOS类目	Chemistry, Physical ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter
WOS记录号	WOS:000432795500057
出版者	ELSEVIER SCIENCE BV
EI入藏号	20181504992756
EI主题词	Amorphous films ; Annealing ; Deposition ; Diffusion coatings ; Electrochromic devices ; Electrochromism ; Film preparation ; Nanostructured materials ; Tungsten compounds
EI分类号	Heat Treatment Processes:537.1 ; Electricity: Basic Concepts and Phenomena:701.1 ; Electronic Components and Tubes:714 ; Nanotechnology:761 ; Chemical Operations:802.3 ; Coating Materials:813.2 ; Amorphous Solids:933.2
WOS关键词	NANOSTRUCTURED TUNGSTEN ; OPTICAL-PROPERTIES ; DEPOSITION ; MORPHOLOGY
原始文献类型	Article
引用统计	正在获取...
文献类型	期刊论文
条目标识符	https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/20195
专题	物质科学与技术学院物质科学与技术学院_特聘教授组_邵建达组物质科学与技术学院_硕士生
通讯作者	Wang, Bin; Shao, Jianda
作者单位	1.Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China 2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China 3.ShanghaiTech Univ, Shanghai 201210, Peoples R China
第一作者单位	上海科技大学
推荐引用方式 GB/T 7714	Yuan, Jiali,Wang, Bin,Wang, Hu,et al. Electrochromic behavior of WO3 thin films prepared by GLAD[J]. APPLIED SURFACE SCIENCE,2018,447:471-478.
APA	Yuan, Jiali.,Wang, Bin.,Wang, Hu.,Chai, Yingjie.,Jin, Yaxue.,...&Shao, Jianda.(2018).Electrochromic behavior of WO3 thin films prepared by GLAD.APPLIED SURFACE SCIENCE,447,471-478.
MLA	Yuan, Jiali,et al."Electrochromic behavior of WO3 thin films prepared by GLAD".APPLIED SURFACE SCIENCE 447(2018):471-478.