Intrinsically shunted NbN/TaN/NbN Josephson junctions on Si substrates for large-scale integrated circuits applications
2022-06-01
发表期刊SUPERCONDUCTOR SCIENCE & TECHNOLOGY (IF:3.7[JCR-2023],3.5[5-Year])
ISSN0953-2048
EISSN1361-6668
卷号35期号:6
发表状态已发表
DOI10.1088/1361-6668/ac591d
摘要

Superconducting circuits based on Josephson junctions have the potential to achieve high speed and ultra-low power consumption, but their integration is limited by the low controllability of Nb-based tunnel junction and the existence of shunt resistors. In this work, we report the fabrication of superconductor/normal metal/superconductor (SNS) Josephson junctions with high reproducibility on oxidized Si substrates. The junctions based on NbN/TaN/NbN trilayers measured at 4.2 K show excellent Josephson properties with a wide range of critical current (I (c)) from 227 to 2000 mu A. The variations of critical current density (J (c)) and characteristic voltage (V (c)) are respectively less than 7.1% and 7.5% in the 2 inch region. The standard deviation of I (c) is calculated to be less than 1.7% for Josephson arrays with the number of junctions up to 10 000 occupying an area of 0.34 mm(2). The results provide a guarantee for the applications of NbN-SNS Josephson junctions in superconducting large-scale integrated circuits.

关键词NbN TaN NbN SNS Josephson junctions high uniformity and reproducibility
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收录类别SCI ; SCIE ; EI
语种英语
资助项目'Strategic Priority Research Program (A)' of the Chinese Academy of Sciences (CAS)[XDA18010200] ; Frontier Science Key Programs of CAS[QYZDY-SSW-JSC033] ; Young Investigator Program of the CAS[2016217] ; National Natural Science Foundation of China[61801462,62071458,11827805]
WOS研究方向Physics
WOS类目Physics, Applied ; Physics, Condensed Matter
WOS记录号WOS:000787638200001
出版者IOP Publishing Ltd
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文献类型期刊论文
条目标识符https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/180880
专题物质科学与技术学院_硕士生
物质科学与技术学院_特聘教授组_王镇组
通讯作者Zhang, Lu; Chen, Lei
作者单位
1.Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
2.Chinese Acad Sci, Ctr Excellence Superconducting Elect, Shanghai 200050, Peoples R China
3.ShanghaiTech Univ, Sch Phys Sci & Technol, Shanghai 201210, Peoples R China
4.Univ Chinese Acad Sci, Beijing 100049, Peoples R China
推荐引用方式
GB/T 7714
Yan, Kaixin,Zhang, Lu,Zhong, Yulong,et al. Intrinsically shunted NbN/TaN/NbN Josephson junctions on Si substrates for large-scale integrated circuits applications[J]. SUPERCONDUCTOR SCIENCE & TECHNOLOGY,2022,35(6).
APA Yan, Kaixin.,Zhang, Lu.,Zhong, Yulong.,Shi, Jiasheng.,Shi, Weifeng.,...&Wang, Zhen.(2022).Intrinsically shunted NbN/TaN/NbN Josephson junctions on Si substrates for large-scale integrated circuits applications.SUPERCONDUCTOR SCIENCE & TECHNOLOGY,35(6).
MLA Yan, Kaixin,et al."Intrinsically shunted NbN/TaN/NbN Josephson junctions on Si substrates for large-scale integrated circuits applications".SUPERCONDUCTOR SCIENCE & TECHNOLOGY 35.6(2022).
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