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Passivation of the Buried Interface via Preferential Crystallization of 2D Perovskite on Metal Oxide Transport Layers
2021-10
发表期刊ADVANCED MATERIALS (IF:27.4[JCR-2023],30.2[5-Year])
ISSN0935-9648
EISSN1521-4095
卷号33期号:41
发表状态已发表
DOI10.1002/adma.202103394
摘要

The open-circuit voltage (V-oc) of perovskite solar cells is limited by non-radiative recombination at perovskite/carrier transport layer (CTL) interfaces. 2D perovskite post-treatments offer a means to passivate the top interface; whereas, accessing and passivating the buried interface underneath the perovskite film requires new material synthesis strategies. It is posited that perovskite ink containing species that bind strongly to substrates can spontaneously form a passivating layer with the bottom CTL. The concept using organic spacer cations with rich -NH2 groups is implemented, where readily available hydrogens have large binding affinity to under-coordinated oxygens on the metal oxide substrate surface, inducing preferential crystallization of a thin 2D layer at the buried interface. The passivation effect of this 2D layer is examined using steady-state and time-resolved photoluminescence spectroscopy: the 2D interlayer suppresses non-radiative recombination at the buried perovskite/CTL interface, leading to a 72% reduction in surface recombination velocity. This strategy enables a 65 mV increase in V-oc for NiOx based p-i-n devices, and a 100 mV increase in V-oc for SnO2-based n-i-p devices. Inverted solar cells with 20.1% power conversion efficiency (PCE) for 1.70 eV and 22.9% PCE for 1.55 eV bandgap perovskites are demonstrated.

关键词interface passivation perovskites solar cells
收录类别EI ; SCIE
语种英语
WOS研究方向Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics
WOS类目Chemistry, Multidisciplinary ; Chemistry, Physical ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter
WOS记录号WOS:000687340300001
出版者WILEY-V C H VERLAG GMBH
原始文献类型Article; Early Access
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文献类型期刊论文
条目标识符https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/127978
专题物质科学与技术学院_博士生
物质科学与技术学院_PI研究组_宁志军组
物质科学与技术学院_硕士生
通讯作者Sargent, Edward H.
作者单位
1.Univ Toronto, Dept Elect & Comp Engn, 35 St George St, Toronto, ON M5S 1A4, Canada;
2.ShanghaiTech Univ, Sch Phys Sci & Technol, Shanghai 201210, Peoples R China
推荐引用方式
GB/T 7714
Chen, Bin,Chen, Hao,Hou, Yi,et al. Passivation of the Buried Interface via Preferential Crystallization of 2D Perovskite on Metal Oxide Transport Layers[J]. ADVANCED MATERIALS,2021,33(41).
APA Chen, Bin.,Chen, Hao.,Hou, Yi.,Xu, Jian.,Teale, Sam.,...&Sargent, Edward H..(2021).Passivation of the Buried Interface via Preferential Crystallization of 2D Perovskite on Metal Oxide Transport Layers.ADVANCED MATERIALS,33(41).
MLA Chen, Bin,et al."Passivation of the Buried Interface via Preferential Crystallization of 2D Perovskite on Metal Oxide Transport Layers".ADVANCED MATERIALS 33.41(2021).
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