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ShanghaiTech University Knowledge Management System
Passivation of the Buried Interface via Preferential Crystallization of 2D Perovskite on Metal Oxide Transport Layers | |
2021-10 | |
发表期刊 | ADVANCED MATERIALS (IF:27.4[JCR-2023],30.2[5-Year]) |
ISSN | 0935-9648 |
EISSN | 1521-4095 |
卷号 | 33期号:41 |
发表状态 | 已发表 |
DOI | 10.1002/adma.202103394 |
摘要 | The open-circuit voltage (V-oc) of perovskite solar cells is limited by non-radiative recombination at perovskite/carrier transport layer (CTL) interfaces. 2D perovskite post-treatments offer a means to passivate the top interface; whereas, accessing and passivating the buried interface underneath the perovskite film requires new material synthesis strategies. It is posited that perovskite ink containing species that bind strongly to substrates can spontaneously form a passivating layer with the bottom CTL. The concept using organic spacer cations with rich -NH2 groups is implemented, where readily available hydrogens have large binding affinity to under-coordinated oxygens on the metal oxide substrate surface, inducing preferential crystallization of a thin 2D layer at the buried interface. The passivation effect of this 2D layer is examined using steady-state and time-resolved photoluminescence spectroscopy: the 2D interlayer suppresses non-radiative recombination at the buried perovskite/CTL interface, leading to a 72% reduction in surface recombination velocity. This strategy enables a 65 mV increase in V-oc for NiOx based p-i-n devices, and a 100 mV increase in V-oc for SnO2-based n-i-p devices. Inverted solar cells with 20.1% power conversion efficiency (PCE) for 1.70 eV and 22.9% PCE for 1.55 eV bandgap perovskites are demonstrated. |
关键词 | interface passivation perovskites solar cells |
收录类别 | EI ; SCIE |
语种 | 英语 |
WOS研究方向 | Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics |
WOS类目 | Chemistry, Multidisciplinary ; Chemistry, Physical ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter |
WOS记录号 | WOS:000687340300001 |
出版者 | WILEY-V C H VERLAG GMBH |
原始文献类型 | Article; Early Access |
引用统计 | 正在获取...
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文献类型 | 期刊论文 |
条目标识符 | https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/127978 |
专题 | 物质科学与技术学院_博士生 物质科学与技术学院_PI研究组_宁志军组 物质科学与技术学院_硕士生 |
通讯作者 | Sargent, Edward H. |
作者单位 | 1.Univ Toronto, Dept Elect & Comp Engn, 35 St George St, Toronto, ON M5S 1A4, Canada; 2.ShanghaiTech Univ, Sch Phys Sci & Technol, Shanghai 201210, Peoples R China |
推荐引用方式 GB/T 7714 | Chen, Bin,Chen, Hao,Hou, Yi,et al. Passivation of the Buried Interface via Preferential Crystallization of 2D Perovskite on Metal Oxide Transport Layers[J]. ADVANCED MATERIALS,2021,33(41). |
APA | Chen, Bin.,Chen, Hao.,Hou, Yi.,Xu, Jian.,Teale, Sam.,...&Sargent, Edward H..(2021).Passivation of the Buried Interface via Preferential Crystallization of 2D Perovskite on Metal Oxide Transport Layers.ADVANCED MATERIALS,33(41). |
MLA | Chen, Bin,et al."Passivation of the Buried Interface via Preferential Crystallization of 2D Perovskite on Metal Oxide Transport Layers".ADVANCED MATERIALS 33.41(2021). |
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