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Growth, coalescence, and etching of two-dimensional overlayers on metals modulated by near-surface Ar nanobubbles
2022-03
发表期刊NANO RESEARCH (IF:9.5[JCR-2023],9.0[5-Year])
ISSN1998-0124
EISSN1998-0000
发表状态已发表
DOI10.1007/s12274-021-3731-2
摘要

The synthesis of high-quality ultrathin overlayers is critically dependent on the surface structure of substrates, especially involving the overlayer-substrate interaction. By using in situ surface measurements, we demonstrate that the overlayer-substrate interaction can be tuned by doping near-surface Ar nanobubbles. The interfacial coupling strength significantly decreases with near-surface Ar nanobubbles, accompanying by an anisotropic to isotropic growth transformation. On the substrate containing near-surface Ar, the growth front crosses entire surface atomic steps in both uphill and downhill directions with no difference, and thus, the morphology of the two-dimensional (2D) overlayer exhibits a round-shape. Especially, the round-shaped 2D overlayers coalesce seamlessly with a growth acceleration in the approaching direction, which is barely observed in the synthesis of 2D materials. This can be attributed to the immigration lifetime and diffusion rate of growth species, which depends on the overlayer-substrate interaction and the surface catalysis. Furthermore, the round to hexagon morphological transition is achieved by etching-regrowth, revealing the inherent growth kinetics under quasi-freestanding conditions. These findings provide a novel promising way to modulate the growth, coalescence, and etching dynamics of 2D materials on solid surfaces by adjusting the strength of overlayer-substrate interaction, which contributes to optimization of large-scale production of 2D material crystals.

关键词two dimensional materials overlayer-substrate interaction near-surface Ar nanobubbles evolution behavior surface dynamics
收录类别SCIE ; EI
语种英语
WOS研究方向Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics
WOS类目Chemistry, Physical ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied
WOS记录号WOS:000679292900001
出版者TSINGHUA UNIV PRESS
原始文献类型Article; Early Access
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文献类型期刊论文
条目标识符https://kms.shanghaitech.edu.cn/handle/2MSLDSTB/127816
专题物质科学与技术学院_PI研究组_王竹君组
通讯作者Wang, Zhujun; Fu, Qiang; Cui, Yi
作者单位
1.Chinese Acad Sci, Suzhou Inst Nanotech & Nanobion, Vacuum Interconnected Nanotech Workstn, Suzhou 215123, Peoples R China;
2.Soochow Univ, Inst Funct Nano & Soft Mat FUNSOM, Suzhou 215123, Peoples R China;
3.Synchrotron Light Res Inst, Nakhon Ratchasima 30000, Thailand;
4.Shanghai Tech Univ, Sch Phys Sci & Technol, Shanghai 200031, Peoples R China;
5.Swiss Fed Inst Technol, Sci Ctr Opt & Electron Microscopy, CH-8093 Zurich, Switzerland;
6.Chinese Acad Sci, Dalian Inst Chem Phys, State Key Lab Catalysis, iChEM, Dalian 116023, Peoples R China
通讯作者单位物质科学与技术学院
推荐引用方式
GB/T 7714
Wei, Wei,Pan, Jiaqi,Lin, Haiping,et al. Growth, coalescence, and etching of two-dimensional overlayers on metals modulated by near-surface Ar nanobubbles[J]. NANO RESEARCH,2022.
APA Wei, Wei.,Pan, Jiaqi.,Lin, Haiping.,Euaruksakul, Chanan.,Li, Zhiyun.,...&Cui, Yi.(2022).Growth, coalescence, and etching of two-dimensional overlayers on metals modulated by near-surface Ar nanobubbles.NANO RESEARCH.
MLA Wei, Wei,et al."Growth, coalescence, and etching of two-dimensional overlayers on metals modulated by near-surface Ar nanobubbles".NANO RESEARCH (2022).
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